• Journal of Fashion Business
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• v.19 no.2
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• pp.149-170
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• 2015

The purpose of this study is to link the Yi tribe's traditional patterns to bag design. Yi tribe is a minor ethic group in China, whose traditional pattern has a high artistic value in that its shapes are diverse and each one has peculiar elegance. Traditional patterns are also indicative of spiritual dept or symbolic stories, rather than being indicative of simple formative beauty. Thus, reorganizing these patterns and applying them artistically to design- in terms of resource utilization- would be significant. Out of all of the Yi tribe's traditional patterns, the cherry blossom_(马樱花), water wave_(水波), sky father and earth mother_(天父地母), pomegranate blossom, triangle, sheep' horn, wisteria vine_(藤条), square and diaper_(四角菱形) and the zigzag_(曲折) patterns were chosen for use during the development of a bag design. This study is based upon document study, including research papers and internet web sites, the point of which was to investigate the form of the traditional patterns, and the creative design process. The design procedure includes these sub-processes: selection, arrangement and color-scheme. In the selection process, the form of the pattern was edited using Adobe Photoshop. The pattern was freely arranged to reflect various emotions. In terms of the color-scheme of the patterns, the colors used by Henri Matisse(1869-1954) in his work were selected and adapted when dyeing the patterns. Subsequently, the final design resulting from these design development processes was applied to the actual production of the bag by using canvas fabric and leather, after which the bag image was proposed using computer simulation. In conclusion, six bag designs were created using traditional patterns from the Yi tribe. Through the processes explained above, this study confirmed that traditional patterns could be widely applied as design motifs and that more sophisticated, modern, and creative designs could be developed based on traditional patterns.

• Journal of the Korea Fashion and Costume Design Association
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• v.23 no.3
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• pp.57-71
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• 2021

When teaching traditional pattern-themed textile design, it has been found that many students struggle during the investigation stage of traditional patterns and complete the development of patterns in relatively simple layout methods, such as block patterns and half drop patterns. Until now, digital textile design textbooks lack content on how to develop patterns. Judging that the current teaching method leads to difficulties in developing a new sense of textile design, this study focused on Heesch-tiling tessellation and software called TESS, a program that can transform patterns themselves. This study is an academic study on the methodology of first developing patterns through TESS, a tessellation program developed for elementary school students in the U.S., and then applying various lines and colors to the complete patterns and textures using Adobe Illustrator. In this study, the concept, formative characteristics, and generative principles of Heesch-tiling tessellation were examined, and the process of developing new patterns using the TESS program, which can be used to create patterns through Heesch-tiling principles, was intended to help in textile design education. Therefore, after analyzing the comprehensive concepts and principles of tessellation, the next step is to understand the principles and the characteristics of pattern making only for Heesch-tiling tessellation, and then ultimately to develop new patterns. While patterns using traditional tessellation layouts have been characterized mainly by repeated geometric shapes, Heesch-tiling tessellation can express surrealistic attributes, such as those by painter M. C. Escher or style elements such as those in neo-pop.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.29 no.2 s.233
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• pp.228-231
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• 2005

In this paper, we present reusable quartz master fabricated by electron-beam lithography and dry etching process of quartz, and results of injection molding based on the reusable quartz master for the manufacturing of nano-scale information media. Since patterned structures of photoresist can be easily damaged by separation (demolding) process of nickel stamper and master, a master with photoresist cannot be reused in stamper fabrication process. In this work, we have made it possible of the repeated use of master by directly patterning on quart in nickel stamper fabrication process. We have designed and fabricated four different specimens including 100nm, 140nm 200nm and 400nm pit patterns. In addition, both intaglio and embossed carving patterns are fabricated for each specimen. In the preliminary test of injection molding, we have fabricated polycarbonate patterns with varying mold temperature. We have experimentally verified the fabrication process of the reusable quart master and possibility of quartz master as direct stamper.

• Journal of the Korean Society for Precision Engineering
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• v.29 no.10
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• pp.1144-1148
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• 2012

Process conditions for generating nano patterns handle different process according to the pattern characteristics, and different process data according to patterns in questions. To efficiently find optimal process conditions for generating nano patterns, process data by experiment is needed consideration of the pattern characteristics concerning the equipment. In particular, coating methods of a cylindrical mold differ from it of a flat plate because of viscosity of coating materials. Also the coating thickness affects nano process and pattern line width. So coating method of coating thickness for cylindrical mold is very important on nano pattern generating. In this study, a method is proposed for coating Photo Resist through the spray in order to coat cylindrical mold and measuring the thickness of coating using measuring tip considering the size of cylindrical mold because there is no method in the existing SEM. The proposed method is applied to a real printed electronics system to verify its accuracy and efficiency.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.6
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• pp.10-16
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• 2013

Ultra-fine planing and micro punching are separately used for improving surface roughness and machining dot patterns, respectively, of metal molds. If these separate machining processes are applied for machining of identical molds, there could be an aligning mismatch between the machine tool and the mold. A hybrid machining system combining ultra-fine planing and micro punching was newly developed in this study in order to solve this mismatch; hybrid process technology was also developed for machining dot patterns on a mirror surface of a metal mold. The hybrid machining system has X, Y, and Z axes, and a cam axis for ultra-fine planing. The cam axis and attachable and removable solenoid actuators for micro punching can make large and small sizes of dot patterns, respectively. Ultra-fine planing was applied in the first place to improve the surface roughness of a metal mold; the measured surface roughness was about 20nm. Then, micro punching was applied to machine dot patterns on the same mold. It was possible to control the diameter of the dot patterns by changing the input voltage of the solenoid actuator. Before machining, severe inhomogeneous plastic deformation around the machined dot patterns was also removed by annealing heat treatment. Therefore, it was verified that metal molds with dots patterns for optical products can be machined using a hybrid machining system and the hybrid process technology developed in this study.

• Journal of Information Processing Systems
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• v.13 no.6
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• pp.1527-1543
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• 2017

MiRNA is a biological short sequence, which plays a crucial role in almost all important biological process. MiRNA patterns are common sequence segments of multiple mature miRNA sequences, and they are of significance in identifying miRNAs due to the functional implication in miRNA patterns. In the proposed approach, the primary miRNA patterns are produced from sequence alignment, and they are then cut into short segment miRNA patterns. From the segment miRNA patterns, the candidate miRNA patterns are selected based on estimated probability, and from which, the potential miRNA patterns are further selected according to the classification performance between authentic and artificial miRNA sequences. Three parameters are suggested that bi-nucleotides are employed to compute the estimated probability of segment miRNA patterns, and top 1% segment miRNA patterns of length four in the order of estimated probabilities are selected as potential miRNA patterns.

• Journal of Information Technology Applications and Management
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• v.11 no.4
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• pp.1-23
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• 2004

This study identifies communication patterns of groups using synchronous text communication medium for their group decision-making, and examines how these patterns are associated with creative solutions to problems. Our research suggests that certain communication behavior of groups, when appropriately organized, can be of help in enhancing creative production of outcomes. A qualitative study was conducted on communication patterns based on an analysis of text-based electronic conversation protocols. Specifically this research tried to overcome existing studies on electronic groups by focusing on interactive process of communication among participants. The major study conclusion; are: (1) The production of creative outcome may depend on the process or sequence of discussion among group members with synchronous text communication medium. That is, proper interactive responses and appropriate control of the discussion process are essential to obtain a high level of performance. (2) It is importantto make discuss rules based on meta-cognitive and interactive protocols in the early stage. Explicit rules relating to internal group processes as well as communication medium use are even more important to groups with electronic communication medium than face-to-face groups.

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.52 no.1
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• pp.35-41
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• 2003

In this paper, a machine vision system for recognizing and classifying the patterns and marks engraved by die molding or laser marking on the glass panels of computer monitors is suggested and evaluated experimentally. The vision system is equipped with a neural network and an NGC pattern classifier including searching process based on normalized grayscale correlation and adaptive binarization. This system is found to be applicable even to the cases in which the segmentation of the pattern area from the background using ordinary blob coloring technique is quite difficult. The inspection process is accomplished by the use of the NGC hypothesis and ANN verification. The proposed pattern recognition system is composed of three parts: NGC matching process and the preprocessing unit for acquiring the best quality of binary image data, a neural network-based recognition algorithm, and the learning algorithm for the neural network. Another contribution of this paper is the method of generating the training patterns from only a few typical product samples in place of real images of all types of good products.

• Transactions on Electrical and Electronic Materials
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• v.5 no.3
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• pp.104-108
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• 2004

Problems of overlap errors and side-lobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Proceedings of the KWS Conference
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• 2000.04a
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• pp.303-306
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• 2000

Quality estimation of the weld has been one of the important issues in RSW which is a main process of the sheep metal fabrication in auto-body industry, It was well known that among the various welding process variables, dynamic resistance has a close relation with nugget formation. With this variable, it is possible to estimate the weld quality in real time. In this study, a new quality estimation algorithm is developed with the primary dynamic resistance measured at welding machine timer. For this, feature recognition method of Hopfield neural network is used. Primary resistance patterns are vectorized and classified with five patterns. The network trained by these patterns recognizes the dynamic resistance pattern and estimates the weld quality Because the process variable monitored at the primary circuit is used, it is possible to apply this system to real time application without any consideration of electrode wear or shunt effect.