Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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PR Coating for Electron Beam Lithography of Cylindrical Mold and Measuring Coating Thickness of It using Measuring Tip

원통금형의 전자빔 가공을 위한 PR 코팅 및 측정 팁을 이용한 두께측정

  • Lee, Seung-Woo (Nano Convergence and System Research Division, Korea Institute of Machinery & Materials) ;
  • Kim, Jeong-O (Nano Convergence and System Research Division, Korea Institute of Machinery & Materials) ;
  • Suh, Jeong (Nano Convergence and System Research Division, Korea Institute of Machinery & Materials)
  • 이승우 (한국기계연구원 나노융합시스템연구본부) ;
  • 김정오 (한국기계연구원 나노융합시스템연구본부) ;
  • 서정 (한국기계연구원 나노융합시스템연구본부)
  • Received : 2011.09.14
  • Accepted : 2012.07.14
  • Published : 2012.10.01
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Abstract

Process conditions for generating nano patterns handle different process according to the pattern characteristics, and different process data according to patterns in questions. To efficiently find optimal process conditions for generating nano patterns, process data by experiment is needed consideration of the pattern characteristics concerning the equipment. In particular, coating methods of a cylindrical mold differ from it of a flat plate because of viscosity of coating materials. Also the coating thickness affects nano process and pattern line width. So coating method of coating thickness for cylindrical mold is very important on nano pattern generating. In this study, a method is proposed for coating Photo Resist through the spray in order to coat cylindrical mold and measuring the thickness of coating using measuring tip considering the size of cylindrical mold because there is no method in the existing SEM. The proposed method is applied to a real printed electronics system to verify its accuracy and efficiency.

Keywords

References

  1. Linden, J., Thanner, C., Schaaf, B., Wolff, S., Lagel, B., and Oesterschulze, E., "Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography," Microelectronic Engineering, Vol. 88, No. 8, pp. 2030-2032, 2011. https://doi.org/10.1016/j.mee.2010.12.106
  2. Han, J. W., Choi, J. H., Yoo, Y. E., Kim, B. H., Lee, J. S., and Kang, S. I., "Nano Replication Technology of Nano Patterns and Application Fields," J. of the KSPE, Vol. 26, No. 6, pp. 30-35, 2009.
  3. Lee, S. W., Kim, J. O., and Seo, J., "Measuring coating thickness of cylindrical mold using measuring tip," Proc. of KSPE Spring Conference, pp. 217-218, 2011.
  4. Weimann, T., Greyer, W., Hinze, P., Stadler, V., Eck, W., and Gölzhöuser, A., "Nanoscale patterning of selfassembled monolayers by e-beam lithography," Microelectronic Engineering, Vol. 57-58, pp. 903-907, 2001. https://doi.org/10.1016/S0167-9317(01)00454-3
  5. Jeong, H. J., Choi, B. K., and So, D. S., "Technologies of Nano Patterning," NANO WEEKLY, Vol. 185, pp. 2-5, 2006.
  6. Kim, J. T. and Hwang, I. K., "Current control in e- Beam lithography based on Scanning Electron Microscope," The Optical Society of Korea Annual Meeting, pp. 237-238, 2009.
  7. MICRO.CHEM, "Products-PMMA," http://www.microchem.com
  8. National NanoFab Center, "NNFC service-equipment," http://www.nnfc.re.kr