• Title/Summary/Keyword: Process Chamber

Search Result 987, Processing Time 0.027 seconds

CHARACTERISTICS OF DIAMONDLIKE CARBON COATED ALUMINA SEALS AT TEMPERATURES UP TO $400^{\circ}C$ (플라즈마 증착방식에 의해 DLC코팅된 알루미나 세라믹의 코팅박막 특성에 관한 연구)

  • Ok, Chul-Ho;Kim, Byoung-Yong;Kang, Dong-Hun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2007.11a
    • /
    • pp.397-397
    • /
    • 2007
  • Diamondlike carbon (DLC) coatings were deposited on alumina ceramic seals using a plasma immersion ion deposition technique (PIID). Then they were subjected to tribological tests using a pin-on-disc tribometer under a high load (1.3 GPa) and under elevated temperatures up to 400C. Coefficients of friction (COFs) were recorded and compared with that of the untreated alumina while the wear tracks were analyzed using SEM with EDS to characterize the DLC films. To enhance the DLC adhesion to the substrate, various interlayers including Si and Cr were deposited using the PIID process or an ion beam assisted deposition (IBAD) method. It was observed that the DLC coating, if adhering well to the substrate, reduced the COFs significantly, from 0.4-0.8 for the uncoated alumina to about 0.05-0.1, within the tested temperature range. The adhesion was determined by the interlayer type and possibly by the application method. Cr interlayer did not perform as well as the Si interlayer. This could also be due to the fact that the Cr interlayer and the subsequent DLC coating had to be done in two different processing systems, while both the Si interlayer and the subsequent DLC film were deposited in one system without breaking the chamber. The coating failure mode was found to be delamination between the Cr and the alumina substrate. In contrast, the Si interlayer with proper DLC deposition procedures resulted in very good adhesion and hence excellent tribological performance. Further study may lead to future DLC applications of ceramic seals.

  • PDF

Fabrication of SmBCO coated conductor using $CeO_2$ single buffer layer ($CeO_2$ 단일 완충층을 이용한 SmBCO 초전도테이프 제조)

  • Kim, T.H.;Kim, H.S.;Oh, S.S.;Yang, J.S.;Ko, R.K.;Ha, D.W.;Song, K.J.;Ha, H.S.;Jung, K.D.;Pa, K.C.;Cho, S.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2006.06a
    • /
    • pp.261-262
    • /
    • 2006
  • High temperature superconducting coated conductor has multi-layer structure of protecting layer/superconducting layer/buffer layer/metallic substrate. The buffer layer consists of multi layer, and the architecture most widely used in RABiTS approach is $CeO_2$(cap layer)/YSZ(diffusion barrier layer)/$CeO_2$(seed layer). Multi-buffer layer deposition required many times and process. Therefore single buffer layer deposition study reduce 2G HTS manufacture efforts. Evaporation technique for single buffer deposition method is used for the $CeO_2$ layer. $CeO_2$ single buffer film could be achieved in the chamber. Detailed deposition conditions (temperature and partial gas pressure of deposition) were investigated for the rapid growth of high quality $CeO_2$ single buffer film.

  • PDF

Characterizations of Oxide Film Grown by $NH_3/O_2$ Oxidation Method ($NH_3/O_2$산화법으로 성장한 산화막의 특성평가)

    • Journal of the Korean Vacuum Society
    • /
    • v.7 no.2
    • /
    • pp.82-87
    • /
    • 1998
  • In the oxidation process of the $NH_3/O_2$ oxidation method, adding $NH_3$ gas to $O_2$ gas, the detected outlet gases in the reaction quartz chamber are N2, $O_2$ and $H_2O$ and in addition, a very small quantity of $CO_2$, NO and $NO_2$ are detected. Two kinds of species ($O_2$ and H2O) contribute to oxidation, so the growth rate is determined by oxidation temperature and by also partial pressure of the NH3 and $O_2$ gases. The slop of growth rate is identified to be medial and in parallel between that of the dry and wet oxidation. Auger electron spectroscopy (AES) indicates that $NH_3/O_2$ oxide film has a certain stoichiomerty of $SiO_2$, this oxidation method restrains the generation of defects in the $SiO_2/Si$ interface, minimizing fixed charges. The breakdown voltage of $NH_3/O_2$ oxide film (470$\AA$) is 57.5 volts, and the profile of the C-V curve including flat band voltage (0.29 volts) agree with the ideal curve.

  • PDF

Reactive Ion Etching of InP Using $CH_4/H_2$ Inductively Coupled Plasma ($CH_4/H_2$유도결합 플라즈마를 이용한 InP의 건식 식각에 관한 연구)

  • 박철희;이병택;김호성
    • Journal of the Korean Vacuum Society
    • /
    • v.7 no.2
    • /
    • pp.161-168
    • /
    • 1998
  • Reactive ion etching process for InGaAs/InP using the CH4/H2 high density inductively coupled plasma was investigated. The experimental design method proposed by Taguchi was utilized to cover the whole parameter range while maintaining reasonable number of actual experiments. Results showed that the ICP power mainly affects surface roughness and verticality of the sidewall, bias power does etch rate and verticality, CH4 gas concentraion does the verticality and etch rate, and the distance between the induction coil and specimen mostly affects the surface roughness. It was also observed that the chamber pressure is the dominant parameter for the etch rate and verticality of the sidewall. The optimum condition was ICP power 700W, bias power 150 W, 15% $CH_4$, 7.5 mTorr, and 14 cm distance, resulting in about 3 $\mu\textrm{m}$/hr etch rate with smooth surfaces and vertical mesa sidewalls.

  • PDF

On-Chip Process and Characterization of the Hermetic MEMS Packaging Using a Closed AuSn Solder-Loop (사각고리형상의 AuSn 합금박막을 이용한 MEMS 밀봉 패키징 및 특성 시험)

  • Seo, Young-Ho;Kim, Seong-A;Cho, Young-Ho;Kim, Geun-Ho;Bu, Jong-Uk
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.28 no.4
    • /
    • pp.435-442
    • /
    • 2004
  • This paper presents a hermetic MEMS on-chip package bonded by a closed-loop AuSn solder-line. We design three different package specimens, including a substrate heated specimen without interconnection-line (SHX), a substrate heated specimen with interconnection-line (SHI) and a locally heated specimen with interconnection-line (LHI). Pressurized helium leak test has been carried out for hermetic seal evaluation in addition to the critical pressure test for bonding strength measurement. Substrate heating method (SHX, SHI) requires the bonding time of 40min. at 400min, while local heating method (LHI) requires 4 min. at the heating power of 6.76W. In the hermetic seal test. SHX, SHI and LHI show the leak rates of 5.4$\pm$6.7${\times}$$^{-10}$ mbar-l/s, 13.5$\pm$9.8${\times}$$^{-10}$ mbar-l/s and 18.5$\pm$9.9${\times}$$^{-10}$ mbar-l/s, respectively, for an identical package chamber volume of 6.89$\pm$0.2${\times}$$^{-10}$. In the critical pressure test, no fracture is found in the bonded specimens up to the applied pressure of 1$\pm$0.1MPa, resulting in the minimum bonding strength of 3.53$\pm$0.07MPa. We find that the present on-chip packaging using a closed AuSn solder-line shows strong potential for hermetic MEMS packaging with interconnection-line due to the hermetic seal performance and the shorter bonding time for mass production.

Interaction of $HfCl_4$ with Two Hydroxyl's on Si (001) Surface: A First Principles Study ($HfCl_4$와 Si (001) 표면에 결합된 두 개의 수산화기와의 상호작용: 제일원리 연구)

  • Kim, Dae-Hyun;Kim, Dae-Hee;Seo, Hwa-Il;Kim, Yeong-Cheol
    • Journal of the Semiconductor & Display Technology
    • /
    • v.8 no.2
    • /
    • pp.55-58
    • /
    • 2009
  • Density functional theory was used to investigate the adsorption and reaction of $HfCl_4$ with two hydroxyls on Si (001)-$2{\times}1$ surface in atomic layer deposition (ALD) process. We prepared a reasonable Si substrate which consisted of six inter-dimer dissociated $H_2O$ molecules and two intra-dimer dissociated $H_2O$ molecules. The $HfCl_4$must react with two hydroxyls to be a bulk-like structure. When $HfCl_4$ was adsorbed on a hydroxyl, there was energy benefit of -0.55 eV. Though there was energy loss for $HfCl_4$ to react with H of hydroxyl, thermal energy of ALD chamber would be enough to pass the energy barriers. There were five reaction pathways for $HfCl_4$ to react with two hydroxyls; inter-dimer, intra-dimer, cross-dimer, inter-row, and cross-row. Inter-row, inter-dimer and intra-dimer were relatively favorable among the five reaction pathways based on the energy difference. The electron densities between O and Hf in these three reactions were higher than the others and they had shorter Hf-O and O-O bond lengths than the other two reaction pathways.

  • PDF

Improved structures of stainless steel current collector increase power generation of microbial fuel cells by decreasing cathodic charge transfer impedance

  • Nam, Taehui;Son, Sunghoon;Kim, Eojn;Tran, Huong Viet Hoa;Koo, Bonyoung;Chai, Hyungwon;Kim, Junhyuk;Pandit, Soumya;Gurung, Anup;Oh, Sang-Eun;Kim, Eun Jung;Choi, Yonghoon;Jung, Sokhee P.
    • Environmental Engineering Research
    • /
    • v.23 no.4
    • /
    • pp.383-389
    • /
    • 2018
  • Microbial fuel cell (MFC) is an innovative environmental and energy system that converts organic wastewater into electrical energy. For practical implementation of MFC as a wastewater treatment process, a number of limitations need to be overcome. Improving cathodic performance is one of major challenges, and introduction of a current collector can be an easy and practical solution. In this study, three types of current collectors made of stainless steel (SS) were tested in a single-chamber cubic MFC. The three current collectors had different contact areas to the cathode (P $1.0cm^2$; PC $4.3cm^2$; PM $6.5cm^2$) and increasing the contacting area enhanced the power and current generations and coulombic and energy recoveries by mainly decreasing cathodic charge transfer impedance. Application of the SS mesh to the cathode (PM) improved maximum power density, optimum current density and maximum current density by 8.8%, 3.6% and 6.7%, respectively, comparing with P of no SS mesh. The SS mesh decreased cathodic polarization resistance by up to 16%, and cathodic charge transfer impedance by up to 39%, possibly because the SS mesh enhanced electron transport and oxygen reduction reaction. However, application of the SS mesh had little effect on ohmic impedance.

Fake News in Social Media: Bad Algorithms or Biased Users?

  • Zimmer, Franziska;Scheibe, Katrin;Stock, Mechtild;Stock, Wolfgang G.
    • Journal of Information Science Theory and Practice
    • /
    • v.7 no.2
    • /
    • pp.40-53
    • /
    • 2019
  • Although fake news has been present in human history at any time, nowadays, with social media, deceptive information has a stronger effect on society than before. This article answers two research questions, namely (1) Is the dissemination of fake news supported by machines through the automatic construction of filter bubbles, and (2) Are echo chambers of fake news manmade, and if yes, what are the information behavior patterns of those individuals reacting to fake news? We discuss the role of filter bubbles by analyzing social media's ranking and results' presentation algorithms. To understand the roles of individuals in the process of making and cultivating echo chambers, we empirically study the effects of fake news on the information behavior of the audience, while working with a case study, applying quantitative and qualitative content analysis of online comments and replies (on a blog and on Reddit). Indeed, we found hints on filter bubbles; however, they are fed by the users' information behavior and only amplify users' behavioral patterns. Reading fake news and eventually drafting a comment or a reply may be the result of users' selective exposure to information leading to a confirmation bias; i.e. users prefer news (including fake news) fitting their pre-existing opinions. However, it is not possible to explain all information behavior patterns following fake news with the theory of selective exposure, but with a variety of further individual cognitive structures, such as non-argumentative or off-topic behavior, denial, moral outrage, meta-comments, insults, satire, and creation of a new rumor.

Characteristics of Internal and External Exposure of Radon and Thoron in Process Handling Monazite (모나자이트 취급공정에서의 라돈 및 토론 노출 특성)

  • Chung, Eun Kyo
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.29 no.2
    • /
    • pp.167-175
    • /
    • 2019
  • Objectives: The purpose of this study was to evaluate airborne radon and thoron levels and estimate the effective doses of workers who made household goods and mattresses using monazite. Methods: Airborne radon and thoron concentrations were measured using continuous monitors (Rad7, Durridge Company Inc., USA). Radon and thoron concentrations in the air were converted to radon doses using the dose conversion factor recommended by the Nuclear Safety and Security Commission in Korea. External exposure to gamma rays was measured at the chest height of a worker from the source using real-time radiation instruments, a survey meter (RadiagemTM 2000, Canberra Industries, Inc., USA), and an ion chamber (OD-01 Hx, STEP Co., Germany). Results: When using monazite, the average concentration range of radon was $13.1-97.8Bq/m^3$ and thoron was $210.1-841.4Bq/m^3$. When monazite was not used, the average concentration range of radon was $2.6-10.8Bq/m^3$ and the maximum was $1.7-66.2Bq/m^3$. Since monazite has a higher content of thorium than uranium, the effects of thoron should be considered. The effective doses of radon and thoron as calculated by the dose conversion factor based on ICRP 115 were 0.26 mSv/yr and 0.76 mSv/yr, respectively, at their maximum values. The external radiation dose rate was $6.7{\mu}Sv/hr$ at chest height and the effective dose was 4.3 mSv/yr at the maximum. Conclusions: Regardless of the use of monazite, the total annual effective doses due to internal and external exposure were 0.03-4.42 mSv/yr. Exposures to levels higher than this value are indicated if dose conversion factors based on the recently published ICRP 137 are applied.

Advanced Biological Treatment of Industrial Wastewater using Food Waste Leachate as an External Carbon Source: Full-Scale Experiment (음식물쓰레기 탈리액을 이용한 산업폐수의 생물학적 고도처리 실증실험)

  • Lee, Byeongcheol;Ahn, Johwan;Lee, Junghun;Bae, Wookeun
    • Journal of Korean Society on Water Environment
    • /
    • v.27 no.4
    • /
    • pp.461-466
    • /
    • 2011
  • The feasibility of utilizing food waste leachate as an external carbon source was tested to enhance biological nutrient removal from an industrial wastewater with an average flow rate of $164,800m^3/d$ and a low carbon/nitrogen ratio of 2.8. A considerable improvement in the removal of nitrogen and phosphorus was observed when a certain amount of the leachate, ranging from 70 to $142m^3/d$, was supplemented to the biological industrial wastewater treatment process. The addition of the leachate led to an increase in the BOD/N ratio (4.5) and the removal efficiency of nutritents from 29.7% to 71.7% for nitrogen and from 34.8% to 65.6% for phosphorus. However, an excessive dose of the leachate that significantly exceeded $120m^3/d$ caused serious operational problems, like oil-layer formation in the grit chamber and scum layer in the primary clarifier. Thus, an supplement of food waste leachate at a dose acceptable to an existing facilities can be a practical and effective means to enhance the nutrient removal from industrial wastewater and to dispose of the food waste leachate.