• 제목/요약/키워드: Powder target

검색결과 164건 처리시간 0.033초

Ti-Mo 코어-쉘 분말 제조 및 소결 특성 연구 (Fabrication of Ti-Mo Core-shell Powder and Sintering Properties for Application as a Sputtering Target)

  • 이원희;박천웅;김희연;하윤철;변종민;김영도
    • 한국분말재료학회지
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    • 제31권1호
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    • pp.43-49
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    • 2024
  • In this study, a core-shell powder and sintered specimens using a mechanically alloyed (MAed) Ti-Mo powder fabricated through high-energy ball-milling are prepared. Analysis of sintering, microstructure, and mechanical properties confirms the applicability of the powder as a sputtering target material. To optimize the MAed Ti-Mo powder milling process, phase and elemental analyses of the powders are performed according to milling time. The results reveal that 20 h of milling time is the most suitable for the manufacturing process. Subsequently, the MAed Ti-Mo powder and MoO3 powder are milled using a 3-D mixer and heat-treated for hydrogen reduction to manufacture the core-shell powder. The reduced core-shell powder is transformed to sintered specimens through molding and sintering at 1300 and 1400℃. The sintering properties are analyzed through X-ray diffraction and scanning electron microscopy for phase and porosity analyses. Moreover, the microstructure of the powder is investigated through optical microscopy and electron probe microstructure analysis. The Ti-Mo core-shell sintered specimen is found to possess high density, uniform microstructure, and excellent hardness properties. These results indicate that the Ti-Mo core-shell sintered specimen has excellent sintering properties and is suitable as a sputtering target material.

ZnO 분말 타겟을 스퍼터링하여 Glass 기판위에 증착한 ZnO 박막의 구조적, 광학적 특성 (Structural and Optical Properties of ZnO/Glass Thin Films Grown by Radio-Frequency Magnetron Sputtering with a Powder Target)

  • 선정호;강현철
    • 한국진공학회지
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    • 제18권5호
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    • pp.394-401
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    • 2009
  • 본 논문은 ZnO 분말 타겟을 스퍼터링하여 glass 기판 위에 증착한 ZnO 박막의 구조적, 광학적 특성을 보고한다. 소결된 ZnO ceramic target을 사용하는 보통의 radio-frequency magnetron sputtering과 달리 본 연구에서는 전처리과정이 필요하지 않은 ZnO 분말 target을 사용하였다. ZnO 박막은 wurtzite (0002) 우선배향면으로 성장하였다. 초기의 ZnO 박막은 매우 평평한 층구조로 증착되었고, 두께가 증가함에 따라 섬구조로 전이하였다. 400-1000 nm 광원에 대하여 평균 88% 이상의 광투과도를 나타내었으며, 220 nm 시편의 경우, 3.23 eV의 near bandedge emission 흡수단을 측정하였다.

분말 타겟을 이용하여 증착된 ITO 박막의 열처리 특성 (Effects of Heat Treatment on the Properties of ITO Films Deposited with Powder Target)

  • 이재형
    • 한국전기전자재료학회논문지
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    • 제19권2호
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    • pp.109-115
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    • 2006
  • Indium tin oxide (ITO) films have been prepared by DC magnetron sputtering. In order to improve the utilization efficiency of the target and reduce the cost of the film deposition processes, the powder target was used instead of the conventional ceramic target. As-deposited films were annealed at temperatures between $200^{\circ}C$ and $500^{\circ}C$ for 30 min in air. Also, the film was annealed in various atmospheres such as air, $O_2,\;H_2,\;N_2$, and vacuum at $400^{\circ}C$C for 30 min. Effects of the heat treatment conditions on structural, electrical, and optical properties of ITO films were investigated. The annealing temperature of $400^{\circ}C$ and atmospheres of $H_2$ and $N_2$ seem to be the most suitable conditions for post processing.

Enhanced Properties of IZO Thin Film Prepared by Nano-Powder Target

  • Ji, Seung-Hun;Youn, Hyun-Oh;Seo, Sung-Bo;Kim, Mi-Sun;Sohn, Sun-Young;Kim, Jong-Jae;Kim, Hwa-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1428-1429
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    • 2009
  • Compared to the indium zinc oxide (IZO) film fabricated by micro-powder target, the IZO film with nano-powder target exhibited improved optoelectronic properties of wide bandgap, high transmittance, surface uniformity, and low sheet resistance due to the high film density.

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DEVELOPMENT OF HIGH-DENSITY U/AL DISPERSION PLATES FOR MO-99 PRODUCTION USING ATOMIZED URANIUM POWDER

  • Ryu, Ho Jin;Kim, Chang Kyu;Sim, Moonsoo;Park, Jong Man;Lee, Jong Hyun
    • Nuclear Engineering and Technology
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    • 제45권7호
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    • pp.979-986
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    • 2013
  • Uranium metal particle dispersion plates have been proposed as targets for Molybdenum-99 (Mo-99) production to improve the radioisotope production efficiency of conventional low enriched uranium targets. In this study, uranium powder was produced by centrifugal atomization, and miniature target plates containing uranium particles in an aluminum matrix with uranium densities up to 9 $g-U/cm^3$ were fabricated. Additional heat treatment was applied to convert the uranium particles into UAlx compounds by a chemical reaction of the uranium particles and aluminum matrix. Thus, these target plates can be treated with the same alkaline dissolution process that is used for conventional $UAl_x$ dispersion targets, while increasing the uranium density in the target plates.

Fabrication of TiAl Target by Mechanical Alloying and Applications in Physical Vapour Deposition Coating

  • Gabbitas, Brian;Cao, Peng;Raynova, Stiliana;Zhang, Deliang
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part2
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    • pp.729-730
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    • 2006
  • The research involves the development of a powder metallurgical route for producing good quality TiAl targets for making physical vapour deposition (PVD) coatings. Mixtures of elemental titanium and aluminium powders were mechanically milled using a novel discus milling technique under various conditions. Hot isotropic pressing (HIP) was then employed for consolidation of the mechanically alloyed powders. A cathodic arc vapour deposition process was applied to produce a TiAlN coating. Microstructural examination was conducted on the target material and PVD coatings, using X-ray diffractometry (XRD), X-ray photoelectron spectrometry (XPS) and scanning electron microscopy (SEM). It has been found that combining mechanical alloying and HIP enable us to produce fairly good quality of TiAl based target. The PVD coatings obtained from the TiAl target showed very high microhardness values.

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방전 플라즈마 소결에 의한 Ge2Sb2Te5 스퍼터링 타겟 제조 및 특성 (Synthesis and Properties of a Ge2Sb2Te5 Sputtering for Use as a Target by Spark Plasma Sintering)

  • 방창욱;김기범;이진규
    • 한국분말재료학회지
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    • 제21권2호
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    • pp.137-141
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    • 2014
  • In this study, we report the sintering behavior and properties of a $Ge_2Sb_2Te_5$ alloy powders for use as a sputtering target by spark plasma sintering. The effect of various sintering parameters, such as pressure, temperature and time, on the density and hardness of the target has been investigated in detail. Structural characterization was performed by scanning electron microscopy and X-ray diffraction. Hardness and thermal properties were measured by differential scanning calorimetry and micro-vickers hardness tester. The density and hardness of the sintered $Ge_2Sb_2Te_5$ materials were 5.8976~6.3687 $g/cm^3$ and 32~75 Hv, respectively.

펄스전류활성소결법을 이용한 스퍼터링 타겟용 Cu-Mn 소결체 제조 및 특성평가 (Fabrication and Property Evaluation of Cu-Mn Compacts for Sputtering Target Application by a Pulsed Current Activated Sintering Method)

  • 장준호;오익현;임재원;박현국
    • 한국분말재료학회지
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    • 제23권1호
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    • pp.1-7
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    • 2016
  • Cu-Mn compacts are fabricated by the pulsed current activated sintering method (PCAS) for sputtering target application. For fabricating the compacts, optimized sintering conditions such as the temperature, pulse ratio, pressure, and heating rate are controlled during the sintering process. The final sintering temperature and heating rate required to fabricate the target materials having high density are $700^{\circ}C$ and $80^{\circ}C/min$, respectively. The heating directly progresses up to $700^{\circ}C$ with a 3 min holding time. The sputtering target materials having high relative density of 100% are fabricated by employing a uniaxial pressure of 60 MPa and a sintering temperature of $700^{\circ}C$ without any significant change in the grain size. Also, the shrinkage displacement of the Cu-Mn target materials considerably increases with an increase in the pressure at sintering temperatures up to $700^{\circ}C$.

Effects on Heat Treatment Methods in Indium-Tin-Oxide Films by DC Magnetron Sputter of Powder Target

  • Kim, H.H.;Shin, J.H.;Baek, J.Y.;Shin, S.H.;Park, K.J.
    • Transactions on Electrical and Electronic Materials
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    • 제2권1호
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    • pp.22-26
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    • 2001
  • ITO (Indium-tin-oxide) thin films were deposited on glass substrates by a dc magnetron sputtering system using ITO powder target. The methods of heat treatment are important factor to obtain high quality ITO films with low electrical resistivity and good optical transmittance. Therefore, both methods of the substrate temperature and post-deposition annealing temperature have been compared on the film structural, electrical and optical properties. A preferred orientations shifts from (411) to (222) peak at annealing temperature of 200$\^{C}$. Minimum resistivity of ITO film is approximately 8.7$\times$10$\^$-4/ Ωcm at substrate temperature of 450$\^{C}$. Optical transmittances at post annealing temperature above 200$\^{C}$ are 90%. As a result, the minimum value of annealing temperature that is required for the recrystallization of as-deposited ITo thin films is 200$\^{C}$.

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콘크리트의 초기강도 향상을 위한 고로슬래그 미분말의 사용에 관한 실험적 연구 (Improvement of Early age Concrete Strength Using Blast Furnace Slag Powder)

  • 유장원;이주선;박병관;배장춘;한민철;한천구
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2009년도 춘계 학술논문 발표대회 학계
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    • pp.77-80
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    • 2009
  • The purpose of the study was to examine engineering characteristics due to fine particle cement and gypsum contents to improve early strength of concrete substituted blast furnace slag powder. The results were as follows. Above all, For fluidity, generally all mixtures had lower fluidity than Plain mixture and was not satisfied target scope, but for mixture substituted the gypsum showed a little increasing trend. For air content, generally all mixtures compared to Plain mixture had decreasing tendency. However, all mixtures were satisfied target scope. For compressive strength, long-term strength was better than early strength according to ternary blast furnace slag contents was increased. For complex mixture was better than individual use of gypsum and fine particle cement.

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