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http://dx.doi.org/10.4313/JKEM.2006.19.2.109

Effects of Heat Treatment on the Properties of ITO Films Deposited with Powder Target  

Lee Jae-Hyeong (군산대학교 전자정보공학부)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.19, no.2, 2006 , pp. 109-115 More about this Journal
Abstract
Indium tin oxide (ITO) films have been prepared by DC magnetron sputtering. In order to improve the utilization efficiency of the target and reduce the cost of the film deposition processes, the powder target was used instead of the conventional ceramic target. As-deposited films were annealed at temperatures between $200^{\circ}C$ and $500^{\circ}C$ for 30 min in air. Also, the film was annealed in various atmospheres such as air, $O_2,\;H_2,\;N_2$, and vacuum at $400^{\circ}C$C for 30 min. Effects of the heat treatment conditions on structural, electrical, and optical properties of ITO films were investigated. The annealing temperature of $400^{\circ}C$ and atmospheres of $H_2$ and $N_2$ seem to be the most suitable conditions for post processing.
Keywords
ITO film; Heat treatment; Magnetron sputtering; Powder target;
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Times Cited By KSCI : 1  (Citation Analysis)
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