• Title/Summary/Keyword: Porous thin film

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Preparation of Polystyrene Thin Films Containing Bragg Structure and Investigation of Their Photonic Characteristics (Bragg 구조를 갖는 Polystyrene 박막필름의 제조방법과그들의 광학적 특성 조사)

  • Cho, Sungdong
    • Journal of Integrative Natural Science
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    • v.3 no.3
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    • pp.138-142
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    • 2010
  • Polystyrene thin films containing Bragg structures have been successfully obtained by the removal of DBR porous silicon films from the DBR structured porous silicon/polystyrene composite film in HF/$H_2O$ mixture solution and by replicating the nano-structures of porous silicon containing Bragg structure. Polystyrene thin films containing Bragg structures displayed unique optical reflection resonances in optical reflection spectrum. This optical reflection band was resulted from the interference of reflection wavelength at Bragg structure of polystyrene thin films. The wavelength of reflection resonances could be modified by the change of Bragg structure of the master. Polystyrene thin films containing Bragg structures were flexible and maintained their optical characteristics upon bending. The Polystyrene thin films replicate the photonic features and the nanostructure of the master.

Electrodeposited Porous Tungsten Oxides as Anode Materials for Lithium Secondary Batteries

  • Lee, Du-Young;Choi, Woo-Sung;Shin, Heon-Cheol
    • Journal of Electrochemical Science and Technology
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    • v.7 no.2
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    • pp.161-169
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    • 2016
  • Porous tungsten oxide thin films were prepared by electrodeposition and tested as anodes of lithium secondary batteries. The synthesized films were composed of nanoparticles of 60-140 nm size, with porosities of 30-40 %. Increasing the temperature turned out to be a more effective approach to introduce porosity in the structure than increasing the electrolyte viscosity. The assessment of the synthesized films as anodes of lithium secondary batteries revealed a much higher initial discharge capacity for the porous than the dense samples. The discharge capacity retention significantly increased with increasing porosity and was further enhanced by heat treatment. In particular, a thin film composed of particles of about 140 nm in size and with a porosity of 40 % exhibited an initial discharge capacity higher than 600 mAh/g and a remaining capacity above 300 mAh/g after 30 cycles. Following heat treatment, the remaining capacity of this sample after 30 cycles increased to about 500 mA h/g.

Fabrication of Porous Polytetrafluoroethylene thin Film from Powder Dispersion-solution for Energy Nanogenerator Applications (Polytetrafluoroethylene 분말 현탁액을 통한 다공성 박막 제조 및 에너지 발생소자 응용)

  • Park, Il-Kyu
    • Journal of Powder Materials
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    • v.24 no.2
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    • pp.102-107
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    • 2017
  • Porous polytetrafluoroethylene (PTFE) thin films are fabricated by spin-coating using a dispersion solution containing PTFE powders, and their crystalline properties are investigated after thermal annealing at various temperatures ranging from 300 to $500^{\circ}C$. Before thermal annealing, the film is densely packed and consists of many granular particles 200-300 nm in diameter. However, after thermal annealing, the film contains many voids and fibrous grains on the surface. In addition, the film thickness decreases after thermal annealing owing to evaporation of the surfactant, binder, and solvent composing the PTFE dispersion solution. The film thickness is systematically controlled from 2 to $6.5{\mu}m$ by decreasing the spin speed from 1,500 to 500 rpm. A triboelectric nanogenerator is fabricated by spin-coating PTFE thin films onto polished Cu foils, where they act as an active layer to convert mechanical energy to electrical energy. A triboelectric nanogenerator consisting of a PTFE layer and Al metal foil pair shows typical output characteristics, exhibiting positive and negative peaks during applied strain and relief cycles due to charging and discharging of electrical charge carriers. Further, the voltage and current outputs increase with increasing strain cycle owing to accumulation of electrical charge carriers during charge-discharge.

Deposition and Photoluminescence Characteristics of Silicon Carbide Thin Films on Porous Silicon (다공성실리콘 위의 탄화규소 박막의 증착 및 발광특성)

  • 전희준;최두진;장수경;심은덕
    • Journal of the Korean Ceramic Society
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    • v.35 no.5
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    • pp.486-492
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    • 1998
  • Silicon carbide (SiC) thin films were deposited on the porous silicon substrates by chemical vapour de-position(CVD) using MTS as a source material. The deposited films were ${\beta}$-SiC with poor crystallity con-firmed by XRD measurement. It was considered that the films showed the mixed characteistics of cry-stalline and amorphous SiC where amorphous SiC where amorphous SiC played a role of buffer layer in interface between as-dep films and Si substrate. The buffer layer reduced lattice mismatch to some extent the generally occurs when SiC films are deposited on Si. The low temperature (10K) PL (phtoluminescence) studies showed two broad bands with peaks at 600 and 720 for the films deposited at 1100$^{\circ}C$ The maximum PL peak of the crystalline SiC was observed at 600 nm and the amrophous SiC of 720 nm was also confirmed. PL peak due the amorphous SiC was smaller than that of the crystalline SiC, PL of porous Si might be disapperared due to densification during heat treatment.

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Fabrication of $Cu_xSe$ thin films by selenization of $Cu_xSe$ nanoparticles prepared by a colloidal process (CIS 태양전지용 이원 화합물 $Cu_xSe$ 나노입자를 이용한 $Cu_xSe$ 박막 제조)

  • Kim, Kyun-Hwan;Ahn, Se-Jin;Yun, Jae-Ho;Gwak, Ji-Hye;Kim, Do-Jin;Yoon, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.96-98
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    • 2009
  • This report summarizes our recent efforts to produce large-grained CIGS materials from porous nanoparticle thin films. In our approach, a $Cu_xSe$ nanoparticle colloid were first prepared by reacting a mixture of CuI in pyridine with $Na_2Se$ in methanol at reduced temperature. purified colloid was sprayed onto heated molybdenum-coated sodalime glass substrates to form thin film. After thermal processing of the thin film under a selenium ambient. $Cu_xSe$ colloid and thin film were characterized by scanning electron microscopy, x-ray diffraction. The optical(direct) band gap energy of $Cu_xSe$ thin films is 1.5 eV.

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Synthesis of Three-Dimensional Graphene Using Porous Nickel Nanostructure (다공성 니켈 나노 구조체를 이용한 3차원 그래핀의 합성)

  • Song, Wooseok;Myung, Sung;Lee, Sun Sook;Lim, Jongsun;An, Ki-Seok
    • Composites Research
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    • v.29 no.4
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    • pp.151-155
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    • 2016
  • Graphene has been a valuable candidate for use as electrodes for supercapacitors. In order to improve the surface area of graphene, three-dimensional graphene was synthesized on porous Ni nanostructure using thermal chemical vapor deposition and microwave plasma chemical vapor deposition. The structural and chemical characterization of synthesized graphene was performed by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy. It was confirmed that three-dimensional and high-crystalline multilayer graphene onto various substrates was synthesized successfully.

Sensing Properties of $\alpha$-Fe$_2$O$_3$ Thin Film Gas Sensor to Reducing Gases ($\alpha$-Fe$_2$O$_3$ 박막 센서의 환원성 가스감지특성)

  • 이은태;장건익;이덕동
    • Journal of the Korean Ceramic Society
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    • v.36 no.5
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    • pp.465-470
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    • 1999
  • Sensing properties of $\alpha$-Fe2O3 thin film to reducing gases such as CHx and CO were systematically examined after deposition on Al2O3 substrate by PECVD(Plasma Enhanced Chemical Vapor Deposition)technique. Microstructure of deposited $\alpha$-Fe2O3 thin film showed the porous island structure. This specimen was annealed at 450, 550, $650^{\circ}C$ to enhance the gas sensing properties and investigated in terms of CO and C4H10 concentration from 500ppm to 3,000 ppm at operating temperature of 35$0^{\circ}C$ The gas sensitivity(%) to C4H10 measured at the operating temperature of 35$0^{\circ}C$ was 98.24 (highest sensitivity) 69.51 to CO and 2% to CH4 respectviely.

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Fabrication and Properties of Porous Ni Thin Films

  • Choi, Sun-Hee;Kim, Woo-Sik;Kim, Sung-Moon;Lee, Jong-Ho;Son, Ji-Won;Kim, Joo-Sun
    • Journal of the Korean Ceramic Society
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    • v.43 no.5 s.288
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    • pp.265-269
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    • 2006
  • We have deposited NiO films by RF sputtering on $Al_2O_3/SiO_2/Si$ and 100 nm-thick Gd doped $CeO_2$ covered $Al_2O_3/SiO_2/Si$ substrates at various $Ar/O_2$ ratios. The deposited films were reduced to form porous Ni thin fllms in 4% $H_2\;at\;400^{\circ}C$. For the films deposited in pure Ar, the reduction was retarded due to the thickness and the orientation of the NiO films. On the other hand, the films deposited in oxygen mixed ambient were reduced and formed porous Ni films after 20 min of reduction. We also investigated the possibility of using the films for the single chamber operation by studying the electrical property of the films in the fuel/air mixed environment. It is shown that the resistance of the Ni film increases quickly in the mixed gas environment and thus further improvements of Ni-base anodes are required for using them in the single chamber operation.