• Restorative Dentistry and Endodontics
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• 제36권2호
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• pp.119-124
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• 2011

연구목적: 본 실험은 현재 임상에서 사용되고 있는 4가지 복합레진 연마 시스템의 연마 능력과 연마에 걸리는 시간을 평가하여 그 효율성을 알아보고자 하였다. 연구 재료 및 방법: 직경 4 mm, 높이 2 mm 의 테플론 몰드에 Z-250 (3M ESPE) 복합레진을 충전하고 양면을 슬라이드 글라스로 압접한 후 Optilux 501을 이용하여 각 면을 40초씩 중합하였다. 중합된 복합레진 디스크를 분리하고 #320 사포로 연마하여 동일한 거친면을 형성한 후 다음의 4가지 연마시스템을 이용하여 표면을 연마하였다: Sof-Lex (3M ESPE), Jiffy (Ultradent), Enhance (Dentsply/Caulk), and Pogo (Dentsply/Caulk). 연마된 면을 표면조도측정기를 이용하여 거칠기를 측정하고 연마에 소요된 시간을 측정하여 연마도와 효율성을 비교 평가하였다. 통계는 one-way ANOVA후 Duncan's multiple range test를 이용하여 군간의 비교를 하였다. 결과: 연마 후 표면조도는 Pogo에서 가장 낮게 나타났으며 Sof-Lex에서 가장 높게 나타났다. 연마에 소요된 시간은 Pogo에서 가장 짧게 걸렸으며 Sof-Lex, Enhance, Jiffy의 순으로 나타났다. 결론: One-step 연마 시스템인 Pogo는 복합레진의 연마에 있어 매우 짧은 시간에 매우 매끈한 면을 얻을 수 있는 것으로 나타나 수복물의 최종 연마에 매우 효율적으로 사용할 수 있는 것으로 평가되었다.

• 한국세라믹학회지
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• 제44권2호
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• pp.98-102
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• 2007

The stability of slurry and removal rate during recycling of colloidal silica slurry was evaluated in silicon wafer polishing. The particle size distribution, pH, and zeta potential were measured to investigate the stability of colloidal silica. Large particles appeared as recycling time increased while average size of slurry did not change. Large particles were identified by EDS(energy dispersive spectrometer) as foreign substances from pad or abraded silicon flakes during polishing. As the recycling time increased, pH of slurry decreased and removal rate of silicon reduced but zeta potential decreased inversely. Hence, it could be mentioned that decrease of removal rate is related to consumption of $OH^-$ ions during recycling. Attention should be given to the control of pH of slurry during polishing.

• 한국정밀공학회지
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• 제17권4호
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• pp.69-80
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• 2000

Generally, die polishing is a lime consuming process, resulting in 30∼50％ of the whole die manufacturing time. However, die polishing has not been automated yet, since it needs a great deal of experience and skill. This paper describes a new development of automated system for die polishing and focuses on the successful achievements of the element techniques to realize from hand skill to automation, as followings: (1) The 5 axes polishing system by the aid of robot with 2 degrees of freedom, is developed for the application of curved surface die. (2) The CAM system realizes a 5 axes tool path control for polishing and measuring. (3) The conductive elastic tool is able to meet curved surfaces of die and gives a high efficient and quality polishing characteristics. (4) The surface roughness measurement device with noncontact laser is developed and has a high reliability without surface damage.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 춘계학술대회 논문집
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• pp.792-795
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• 2000

The magnetic assisted finishing thought to be one of the potential methods for the automatic polishing process. In this study, magnetic assisted finishing process was experimentally attempted to polish the intrnal surface of the cylindrical tube. The newly developed magnetic tool was used, and its polishing performance exmined. From the experimental results, it is found that i ) the newly developed tool is suitable for intrnal surface finishing of the tube. ii ) the surface roughness of 0.9~1${\mu}{\textrm}{m}$Rmax before polishing is improved to the value of 0.2 ${\mu}{\textrm}{m}$Rmax in the finishing experiment of stainless steel STS3602L tube in 6 minutes finishing time.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.360-361
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• 2005

Rapid progress in IC fabrication technology has strong demand in polishing of silicon wafer to meet the tight specification of nanotopography and surface roughness. One of the important issues in Si CMP is the stabilization of polishing pad. If a polishing pad is not stabilized before main Si wafer polishing process, good polishing result can not be expected. Therefore, new pad must be subjected into break-in process using dummy wafers for a certain period of time to enhance its performance. After the break-in process, the main Si wafer polishing process must be performed. In this study, the characteristics of break-in process were investigated in Si wafer polishing. Viscoelastic behavior, temperature variation of pad and friction were measured to evaluate the break-in phenomenon. Also, it is found that the characteristic of the break-in seems to be related to viscoelastic behavior of pad.

• 한국표면공학회지
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• 제55권4호
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• pp.236-246
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• 2022

Electropolishing is a surface finishing treatment that compensates for the disadvantages of the mechanical polishing process. It not only has a smooth surface, but also improves corrosion resistance. Therefore, the purpose of this investigation is to examine the corrosion resistance and electrochemical characteristics in seawater of UNS S31603 with electropolishing process time. The roughness improvement rate after electropolishing was improved by about 78% compared to before polishing, indicating that the electropolishing is effective. As a result of potential measuring of mechanical polishing and electropolishing, the potential of electropolishing was nobler than the mechanical polishing condition. As a result of calculating the corrosion current density after potentiodynamic polarization experiment with electropolishing conditions, the corrosion current density of mechanical polishing was about 6.4 times higher than that of electropolishing. After potentiodynamic polarization experiment with electropolishing conditions, the maximum damage depth of mechanical polishing was about 2.2 times higher than that of electropolishing(7 minutes). In addition, the charge transfer resistance of the specimen electropolished for 7 minutes was the highest, indicating improved corrosion resistance.

• Corrosion Science and Technology
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• 제21권4호
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• pp.314-324
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• 2022

The objective of this investigation was to indentify major factors affecting surface roughness among various parameters of electropolishing process using the design of an experiment method (full factorial design) for UNS S31603. Factors selected included electrolyte composition ratio, applied current density, and electrolytic polishing time. They were compared through analysis of variance (ANOVA). Results of ANOVA revealed that all parameters could affect surface roughness, with the influence of electrolyte composition ratio being the highest. As a result of surface analysis after electropolishing, the specimen with the deepest surface damage was about 35 times greater than the condition with the smallest surface damage. The largest value of surface roughness after electropolishing was higher than that of mechanical polishing due to excessive processing. On the other hand, the smallest value of surface roughness after electropolishing was 0.159 ㎛, which was improved by more than 80% compared to the previous mechanical polishing. Taken all results together, it is the most appropriate to perform electrolytic polishing with a sulfuric acid and phosphoric acid ratio of 3:7, an applied current density of 300 mA/cm², and anelectrolytic polishing time of 5 minutes.

• 치위생과학회지
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• 제16권2호
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• pp.150-156
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• 2016

이번 연구는 자가중합 임시치관용 레진의 표면 처리와 음식에 따른 색 안정성 확인을 위해 설계되었으며 ethyl methacrylate형의 SNAP 시편에 denture bur polishing, silicone bur polishing, pumice polishing의 3단계 표면 처리 후 커피와 콜라, 된장과 고추장, 레드 와인과 맥주에 침전한 블럭을 분광광도계로 관찰하여 초기 값과 비교한 ${\Delta}E^*$값을 알아보았다. 모든 시편에서 침전 시간과 표면 처리에 따라 나타난 착색의 차이는 시간의 변화에 따라 색 변화가 관찰되었다(p<0.001). 커피는 1일($2.59{\pm}1.08$), 5일($3.89{\pm}0.83$), 7일($4.53{\pm}0.22$) 모두 pumice polishing이 색 변화가 가장 많았다. 콜라는 1일($2.53{\pm}0.55$)과 5일($4.75{\pm}0.94$) pumice polishing이 색 변화가 가장 많았고, 7일($5.28{\pm}0.25$)은 denture bur polishing이 색 변화가 가장 많았다. 고추장은 1일($6.38{\pm}0.61$)과 5일($10.4{\pm}7.58$) silicone bur polishing이 색 변화가 가장 많았고 7일($12.44{\pm}2.82$)은 denture bur polishing이 색 변화가 가장 많았다. 반면 pumice polishing에서는 1일($6.09{\pm}1.03$), 5일($4.9{\pm}2.37$), 7일($5.33{\pm}0.64$) 모두 색 변화가 가장 적게 나타났다. 된장은 1일($1.37{\pm}0.35$)과 7일($4.98{\pm}0.55$)은 pumice polishing이 색 변화가 많았으며, 5일($2.61{\pm}0.38$)은 denture bur polishing이 색 변화가 가장 많았다. 레드 와인은 denture bur polishing이 1일($4.78{\pm}1.10$), 5일($12.69{\pm}3.06$), 7일($13.48{\pm}2.08$) 모두 색 변화가 가장 많았고, pumice polishing에서 1일($2.66{\pm}0.39$), 5일($8.56{\pm}0.16$), 7일($8.77{\pm}0.22$) 모두 색 변화가 가장 적게 나타났다, 맥주는 pumice polishing이 1일($4.15{\pm}0.47$), 5일($4.12{\pm}0.37$), 7일($4.53{\pm}0.89$) 모두 색 변화가 가장 많았으며 반면 silicone bur polishing이 1일($1.27{\pm}1.1$), 5일($2.3{\pm}0.32$), 7일($2.48{\pm}0.46$) 모두 색 변화가 가장 적게 나타났다. 이와 같이 자가중합 레진의 임시치관 색 안정성 제공을 위해 음식 섭취에 대한 주의가 필요하다. 선호 음식의 종류에 따라 표면 처리 방법을 선택할 수 있으며, 장기간의 임시치관 사용 시 주기적인 재제작도 고려할 필요가 있겠다.

• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 1990년도 한국자동제어학술회의논문집(국내학술편); KOEX, Seoul; 26-27 Oct. 1990
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• pp.190-193
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• 1990

Die finishing (polishing and lapping) after NC machining is characterized as one bottleneck process for reducing lead time. For automation of this typical manual work, a flexible polishing tool system using industrial robot has been developed. This tool system has three principal functions in order to achieve reduction of waviness, 3 D.O.F. compliance and constant pressure structure. This polishing tool shows that adaptability to free form surface is increased and programmability to various areas of die surface is also acquired.

• 한국기계가공학회지
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• 제18권7호
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• pp.14-21
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• 2019

Large-diameter hydraulic devices such as the hydraulic reservoir in aircraft that serves to balance the hydraulic pressure in the various hydraulic devices in the cabin and to store hydraulic oil are operated by the internal piston systems. However, since this operates in an environment with high temperature and humidity, it may cause the inner surface to flake during its operation. Therefore, an anodizing surface treatment is applied to improve the corrosion resistance, abrasion resistance, and smooth operation. However, anodizing increases the surface roughness. Accordingly, the polishing process that improves the surface roughness after anodizing is important. However, the existing polishing process is performed manually, which results in an inefficient process. Therefore, in this study, we selected the optimum polishing conditions for effective polishing using the experimental design to improve the polishing process for the $Al_2O_3$ film that forms after anodization. Through experiments, we confirmed that the surface uniformity after polishing was superior as the feed rate was slower when the same polishing time had been applied.