• Journal of the Optical Society of Korea
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• 제16권4호
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• pp.354-364
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• 2012

In this paper, a new 2-step quadrature phase-shifting digital holographic optical encryption method using orthogonal polarization is proposed and tolerance errors for this method are analyzed. Unlike the conventional technique using a PZT mirror, the proposed optical setup comprises two input and output polarizers, and one ${\lambda}$/4-plate retarder. This method makes it easier to get a phase shift of ${\pi}$/2 without using a mechanically driven PZT device for phase-shifting and it simplifies the 2-step phase-shifting Mach-Zehnder interferometer setup for optical encryption. The decryption performance and tolerance error analysis for the proposed method are presented. Computer experiments show that the proposed method is an alternate candidate for 2-step quadrature phase-shifting digital holographic optical encryption applications.

• Current Optics and Photonics
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• 제2권5호
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• pp.474-481
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• 2018

We propose a polarization phase-shifting technique to investigate the thickness of $Ta_2O_5$ thin films deposited on BK7 substrates, using a modified Sagnac interferometer. Incident light is split by a polarizing beam splitter into two orthogonal linearly polarized beams traveling in opposite directions, and a quarter-wave plate is inserted into the common path to create an unbalanced phase condition. The linearly polarized light beams are transformed into two circularly polarized beams by transmission through a quarter-wave plate placed at the output of the interferometer. The proposed setup, therefore, yields rotating polarized light that can be used to extract a relative phase via the self-reference system. A thin-film sample inserted into the cyclic path modifies the output signal, in terms of the phase retardation. This technique utilizes three phase-shifted intensities to evaluate the phase retardation via simple signal processing, without manual adjustment of the output polarizer, which subsequently allows the thin film's thickness to be determined. Experimental results show that the thicknesses obtained from the proposed setup are in good agreement with those acquired by a field-emission scanning electron microscope and a spectroscopic ellipsometer. Thus, the proposed interferometric arrangement can be utilized reliably for non-contact thickness measurements of transparent thin films and characterization of optical devices.

• Journal of the Optical Society of Korea
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• 제13권2호
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• pp.245-250
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• 2009

We propose a digital holographic interference analysis method based on a 2-frame phase-shifting technique for measuring an optical mirror surface. The technique using 2-frame phase-shifting digital interferometry is more efficient than multi-frame phase-shifting techniques because the 2-frame method has the advantage of a reduced number of interferograms, and then takes less time to acquire the wanted topography information from interferograms. In this measurement system, 2-frame phase-shifting digital interferograms are acquired by moving the reference flat mirror surface, which is attached to a piezoelectric transducer, with phase step of 0 or $\pi$/2 in the reference beam path. The measurements are recorded on a CCD detector. The optical interferometry is designed on the basis of polarization characteristics of a polarizing beam splitter. Therefore the noise from outside turbulence can be decreased. The proposed 2-frame algorithm uses the relative phase difference of the neighbor pixels. The experiment has been carried out on an optical mirror which flatness is less than $\lambda$/4. The measurement of the optical mirror surface topography using 2-frame phase-shifting interferometry shows that the peak-to-peak value is calculated to be about $0.1779{\mu}m$, the root-mean-square value is about $0.034{\mu}m$. Thus, the proposed method is expected to be used in nondestructive testing of optical components.

• Journal of the Optical Society of Korea
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• 제8권3호
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• pp.122-126
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• 2004

The method to obtain four speckle patterns with relative phase shift of ${\pi}/2$ by passive devices such as two waveplates and a linear polarizer, awl to calculate the phase at each point of the speckle pattern in shearography with a Wollaston prism is presented, and the feasibility of the proposed method is theoretically demonstrated by Jones vector.

• Journal of the Optical Society of Korea
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• 제9권4호
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• pp.145-150
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• 2005

The method to obtain four speckle patterns with relative phase shift of $\pi$/2 by passive devices such as two waveplates and a linear polarizer, and to calculate the phase at each point of the speckle pattern in shearography with a Wollaston prism is described. In this paper, we analyze its potential error sources caused by wave plates.

• 조명전기설비학회논문지
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• 제20권8호
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• pp.1-5
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• 2006

본 논문에서는 편광소자를 이용하는 스펙클패턴 전단간섭법(shearography)에서 스펙클패턴의 각 지점에서의 위상을 얻을 수 있는 방법을 설명하고, 폴리머 시료에 대한 결함 진단 실험을 통하여 제안된 방법의 적용가능성을 입증하였다.