• Nuclear Engineering and Technology
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• 제52권11호
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• pp.2535-2542
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• 2020

To understand the fundamental parameters of Alvand tokamak, A Rogowski coil with an active integrator was designed and constructed. Considering the characteristics of the Alvand tokamak, the structural and electrical parameters affecting the sensor function, were designed. Calibration was performed directly in the presence of plasma. The sensor has a high resistance against interference of external magnetic fields. Plasma current was measured in various experiments. Based on the plasma current profile and loop voltage signal, the time evolution of plasma discharge was investigated and plasma behavior was analyzed. Alvand tokamak discharge was divided into several regions that represents different physical phenomena in the plasma. During the plasma discharge time, plasma had significant changes and its characteristic was not uniform. To understand the plasma behavior in each of the phases, the Rogowski sensor should have sufficient time resolution. The Rogowski sensor with a frequency up to 15 kHz was appropriate for this purpose.

• 산업기술연구
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• 제33권A호
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• pp.67-72
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• 2013

CNT(carbon nanotube) humidity sensors with plasma treated electrodes exhibit a much faster response time and a higher sensitivity to humidity, compared to untreated CNT and porous Cr electrodes. These results may be partially due to their percolated pore structure being more accessible for water molecules and for expending the diffusion of moisture to the polyimide sensing film, and partially due to the oxygenated surface of CNT films. This paper shows a plasma process effect and selectivity characteristics of CNT film humidity sensor.

• 한국공작기계학회논문집
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• 제17권1호
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• pp.98-105
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• 2008

In this paper, the system for monitoring process of aluminum laser welding was developed using the light signal emitted from the plasma which comes from interaction between material and laser. Photodiode for monitoring system was selected based on the spectrum analysis of light from plasma and keyhole. Behavior of plasma and keyhole was analyzed through the sensor signals. Value of sensor signal represented the light intensity and fluctuation of signal indicated the stability of plasma and keyhole. For the relation between welding condition and sensor signals, the input power and weld geometry greatly effected on the average of each sensor signals. Using the feature values of signals, estimation model for tensile strength of weld was formulated with neural network algorithm. Performance of this model was verified through coefficient of determination and average error rate.

• Journal of information and communication convergence engineering
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• 제3권4호
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• pp.187-190
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• 2005

High aspect ratio via-hole etching process has emerged as one of the most crucial means to increase component density for ULSI devices. Because of charge accumulation in via-hole, this sophisticated and important process still hold several problems, such as etching stop and loading effects during fabrication of integrated circuits. Indeed, the concern actually depends on accumulated charge. For monitoring accumulated charge during plasma etching process, charge-up monitoring sensor was fabricated and tested under some plasma conditions. This paper presents a neural network-based technique for analyzing and modeling several electrical performance of plasma charge-up monitoring sensor.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2005년도 추계종합학술대회
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• pp.303-306
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• 2005

High aspect ration via-hole etching process has emerged as one of the most crucial means to increase component density for ULSI devices. Because of charge accumulation in via hole, this sophisticated and important process still hold several problems, such as etching stop, loading effects during fabrication of integrated circuits. Indeed, the concern actually depends on accumulated charge. For monitoring accumulated charge during plasma etching process, charge-up monitoring sensor was fabricated and tested under some plasma conditions. This paper presents a neural network-based technique for analyzing and modeling several electrical performance of plasma charge-up monitoring sensor.

• 한국정밀공학회지
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• 제17권7호
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• pp.132-140
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• 2000

Plasma arc cutting is one of the most widely used processes in metal cutting fields and is a process that produces parted metal plates by cutting them with an arc plasma established between the electrode tip and the plate(workpiece). When the tip-to-workpiece distance varies during cutting, the cut quality, for example the kerf width, is deteriorated by the change of plasma arc. The variations of tip-to-workpiece distance are due to the different factors such as inaccuracies in setting the torch or workpiece, thermal distortions during cutting, and uneven surface of workpiece. The control to keep the tip-to-workpiece distance constant is thus indispensable to improve the flexibility of automatic plasma arc cutting system applications. In this study, an arc sensor which utilizes the electrical signal obtained from the plasma arc itself was developed. The arc sensor has an advantage that no particular sensing device is necessary and real-time sensing of the tip-to-workpiece distance is possible directly under the plasma arc. The relationship between plasma arc voltage and tip-to-workpiece distance was determined through the repeated experimental results. The model was used for developing an automatic tip-to-workpiece distance control system of plasma arc cutting. It could be shown that the proposed system has a successful capability of tip-to-workpiece distance control.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.43-43
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• 2010

We have characterized the parametric and functional properties of live cell and cancer cell according to plasma treatment conditions using Atmospheric Pressure (AP) Plasma with uniquely designed low temperature arc-free unit. AP plasma system showed very highly efficient capabilities of reacting and interfacing directly with live and cancer cells. The parametric results with the types of gases, applied power, applied gap, and process times on cells will be presented in accordance with functional studies of the works. The growth of cancer cells is directly influenced by AP plasma exposure with evaluating plasma conditions in several human cancer cells and understanding how plasma exposure alters molecular signaling pathways. The cells exhibit a slower or faster growth rates compared with untreated cells, depending on the cell types. These results strongly support the conclusion that alterations in one or more of each gene are responsible, at least in part, for plasma-induced apoptosis in cancer cells. In addition, it also will be presented that AP plasma has an important role for the improvement of sensor performance due to excellent interface property between enzyme and metal electrode for bio sensor manufacturing process.

• 한국정보통신학회:학술대회논문집
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• 한국정보통신학회 2022년도 춘계학술대회
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• pp.27-30
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• 2022

기존의 공정방식에 비해 효율성이나 환경적 면에서 많은 장점을 가진 플라즈마 공정은 반도체 제작에서 널리 사용되고 있다. Plasma Sheath란 플라즈마 bulk와 그 것을 둘러싸고 있는 챔버 벽면과 전극 사이에서 관찰되는 어두운 영역으로 양이온과 전자의 이동속도 차이로 인해 발생한다. Plasma Sheath Monitoring Sensor (PSMS)는 플라즈마와 전극 사이의 전압(Voltage) 차이와 전극에 걸리는 RF power 등을 실시간으로 측정하는 센서로서 플라즈마 챔버 내에서 플라즈마의 상태와 매우 상관도가 높을 것으로 기대된다. 본 연구에서는 PSMS 데이터를 활용하여 플라즈마 챔버 내의 질소이온의 상태를 예측하는 모형을 딥러닝 기계학습 기법을 이용하여 구축하였다. 연구에 사용된 데이터는 파워와 압력을 달리 셋팅한 실험에서 측정된 PSMS 데이터를 학습데이터로 활용하고 플라즈마 bulk와 Si substrate에서 측정된 질소 이온의 비율, 플럭스, 밀도를 레이블로 활용하였다. 본 연구의 결과는 향후 플라즈마 공정의 최적화 및 실시간 정밀제어를 위한 인공지능 기술의 기초가 될 것으로 기대된다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 심포지엄 논문집 정보 및 제어부문
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• pp.99-101
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• 2006

Auto-Cross Correlated time series (ACTS) model was constructed by using the backpropagation neural network. The performance of ACTS model was evaluated with sensor information collected from a large volume, industrial plasma-enhanced chemical vapor deposition system. A total of 18 sensor information were collected. The effect of inclusion of past and future information were examined. For all but three sensor information with a large data variance demonstrated a prediction error less than 3%. By integrating ACTS model into equipment software, process quality can be more stringently monitored while improving device throughput.

• 대한기계학회논문집A
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• 제27권8호
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• pp.1266-1272
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• 2003

This paper presents a new class of magnetic microsensors based on the Hall effect in AC microplasma. In the theoretical study, we develop a simple model of the plasma Hall sensor and express the plasma Hall voltage as a function of magnetic field, plasma discharge field, pressure, and electrode geometry. On this basis, we have designed and fabricated magnetic microsensors using AC neon plasma. In the experiment, we have measured the Hall voltage output of the plasma microsensors for varying five different conditions, including the frequency and the magnitude of magnetic field, the frequency and the magnitude of plasma discharge voltage, and the neon pressure. The fabricated magnetic microsensors show a magnetic field sensitivity of 8.87${\pm}$0.18㎷/G with 4.48% nonlinearity.