• Title/Summary/Keyword: Plasma Display

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The progress in NF3 destruction efficiencies of electrically heated scrubbers (전기가열방식 스크러버의 NF3 제거 효율)

  • Moon, Dong Min;Lee, Jin Bok;Lee, Jee-Yon;Kim, Dong Hyun;Lee, Suk Hyun;Lee, Myung Gyu;Kim, Jin Seog
    • Analytical Science and Technology
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    • v.19 no.6
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    • pp.535-543
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    • 2006
  • Being used widely in semiconductor and display manufacturing, $NF_3$ is internationally considered as one of the regulated compounds in emission. Numerous companies have been continuously trying to reduce the emissions of $NF_3$ to comply with the global environmental regulation. This work is made to report the destruction and removal efficiency (DRE) of electrically heated scrubbers and the use rate in process chambers installed in three main LCD manufacturing companies in Korea. As the measurement techniques for $NF_3$ emission, mass flow controlled helium gas was continuously supplied into the equipment by which scrubber efficiency is being measured. The partial pressures of $NF_3$ and helium were accurately measured for each sample using a mass spectrometer, as it is emitted from inlet and outlet of the scrubber system. The results show that the DRE value for electrically heated scrubbers installed before 2004 is less than 52 %, while that for the new scrubbers modified based on measurement by scrubber manufacturer has been sigificentely improved upto more than 95 %. In additon, we have confirmed the efficiency depends on such variables as the inlet gas flow rate, water content, heater temperature, and preventative management period. The use rates of $NF_3$ in process chambers were also affected by the process type. The use rate of radio frequency source chambers, built in the $1^{st}$ and $2^{nd}$ generation process lines, was determined to be less than 75 %. In addition, that of remote plasma source chambers for the $3^{rd}$ generation was measured to be aboove 95 %. Therefore, the combined application of improved scrubber and the RPSC process chamber to the semiconductor and display process can reduce $NF_3$ emmision by 99.95 %. It is optimistic that the mission for the reduction of greenhouse gas emission can be realized in these LCD manufacturing companies in Korea.

Spherical-shaped Zn2SiO4:Mn Phosphor Particles with Gd3+/Li+ Codopant (Gd3+/Li+ 부활성제가 첨가된 구형의 Zn2SiO4:Mn 형광체 입자)

  • Roh, Hyun Sook;Lee, Chang Hee;Yoon, Ho Shin;Kang, Yun Chan;Park, Hee Dong;Park, Seung Bin
    • Korean Chemical Engineering Research
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    • v.40 no.6
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    • pp.752-756
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    • 2002
  • Green-emitting $Zn_2SiO_4:Mn$ phosphors for PDP(Plasma Display Panel) application were synthesized by colloidal seed-assisted spray pyrolysis process. The codoping with $Gd^{3+}/Li^+$, which replaces $Si^{4+}$ site in the willemite structure, was performed to improve the luminous properties of the $Zn_2SiO_4:Mn$ phosphors. The particles prepared by spray pyrolysis process using fumed silica colloidal solution had a spherical shape, small particle size, narrow size distribution, and non-aggregation characteristics. The $Gd^{3+}/Li^+$ codoping amount affected the luminous characteristics of $Zn_2SiO_4:Mn$ phosphors. The codoping with proper amounts of $Gd^{3+}/Li^+$ improved both the photoluminescence efficiency and decay time of $Zn_2SiO_4:Mn$ phosphor particles. In spray pyrolysis, the post-treatment temperature is another factor controlling the luminous performance of $Zn_2SiO_4:Mn$ phosphors. The $Zn_{1.9}SiO_4:Mn_{0.1}$ phosphor particles containing 0.1 mol% $Gd^{3+}/Li^+$ co-dopant had a 5% higher PL intensity than the commercial product and 5.7 ms decay time after post-treatment at $1,145^{\circ}C$.

The Silicon Nitride Films according to The Frequency Conditions of Plasma Enhanced Chemical Vapor Deposition (PECVD의 주파수 조건에 따른 $SiN_x$막 증착)

  • Choi, Jeong-Ho;Roh, Si-Cheol;Jung, Jong-Dae;Seo, Hwa-Il
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.4
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    • pp.21-25
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    • 2014
  • The silicon nitride ($SiN_x$) film for surface passivation and anti-reflection coating of crystalline silicon solar cell is very important and it is generally deposited by plasma enhanced chemical vapor deposition (PECVD). PECVD can be divided into low and high frequency method. In this paper, the $SiN_x$ film deposited by low and high frequency PECVD method was studied. First, to optimize the $SiN_x$ film deposited by low frequency PECVD method, the refractive index was measured by varying the process conditions like $SiH_4$, $NH_3$, $N_2$ gas rate, and RF power. When $SiH_4$ gas rate was increased and $NH_3$ gas rate was decreased, the refractive index was increased. The refractive index was also increased with RF power decline. Second, to compare the characteristics of the low and high frequency PECVD $SiN_x$ film, the refractive index was measured by varying $NH_3/SiH_4$ gas ratio and RF power and the minority carrier lifetime of before and after high temperature treatment process was also measured. The refractive index of both low and high frequency PECVD $SiN_x$ film was decreased with increase in $NH_3/SiH_4$ gas ratio and RF power. After high temperature treatment process, the minority carrier lifetime of both low and high frequency PECVD $SiN_x$ film was increased and increased degree was similar. The minority carrier lifetime of low frequency PECVD $SiN_x$ was increased from $11.03{\mu}m$ to $28.24{\mu}m$ and that of high frequency PECVD $SiN_x$ was increased from $11.60{\mu}m$ to $27.10{\mu}m$.

A Study on Etching of Si3N4 Thin Film and the Exhausted Gas Using C3F6 Gas for LCD Process (LCD 공정용 C3F6 가스를 이용한 Si3N4 박막 식각공정 및 배출가스에 관한 연구)

  • Jeon, S.C.;Kong, D.Y.;Pyo, D.S.;Choi, H.Y.;Cho, C.S.;Kim, B.H.;Lee, J.H.
    • Journal of the Korean Vacuum Society
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    • v.21 no.4
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    • pp.199-204
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    • 2012
  • $SF_6$ gas is widely used for dry etching process of semiconductor and display fabrication process. But $SF_6$ gas is considered for typical greenhouse gas for global warming. So it is necessary to research relating to $SF_6$ alternatives reducing greenhouse effect in semiconductor and display. $C_3F_6$ gas is one of the promising candidates for it. We studied about etch characteristics by performing Reactive Ion Etching process of dry etching and reduced gas element exhausted on etching process using absorbent Zeolite 5A. $Si_3N_4$ thin film was deposited to 500 nm with Plasma Enhanced Chemical Vapor Deposition and we performed Reactive Ion Etching process after patterning through photolithography process. It was observed that the etch rate and the etched surface of $Si_3N_4$ thin film with Scanning Electron Microscope pictures. And we measured and compared the exhausted gas before and after the absorbent using Gas Chromatograph-Mass Spectrophotometry.

High Luminance $Zn_2$$SiO_4$:Mn Phosphors for in PDP Application (고상법에 의한 PDP용 고휘도 $Zn_2$$SiO_4$:Mn 형광체 제조)

  • Jeon, Il-Un;Son, Gi-Seon;Jeong, Yang-Seon;Kim, Chang-Hae;Park, Hui-Dong
    • Korean Journal of Materials Research
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    • v.11 no.3
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    • pp.227-235
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    • 2001
  • In this work, Zn$_2$SiO$_4$:Mn phosphors were prepared by solid state reaction. The effect of sintering/reduction temperature, flow rate of H$_2$-5%/$N_2$-95% mix gas, and ball milling conditions have been investigated on the sake of PDP(Plasma Display Panel) application. The characteristics such as particle morphology and photoluminescence of prepared phosphors were compared to those of commercial Zn$_2$SiO$_4$:Mn Phosphors. It was found that the Phosphor synthesized at 130$0^{\circ}C$ with 0.08 Mn concentration had a maximum brightness, This brightness was increased more 20% by reduction treatment under 100me/min flow rate of 5%H$_2$-95%$N_2$ mixed gas. The size of particles decreased under 3$\mu\textrm{m}$ after ball milling. Especially, higher luminescence was obtained in our Zn$_2$SiO$_4$:Mn phosphors than commercial Zn$_2$SiO$_4$:Mn phosphors, so that they are able to be applied for PDP.

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Study of the Effect of the Transmittance of a Diffuser Plate on the Optical Characteristics of High-power Quantum-dot Illumination (확산판의 투과율이 고출력 양자점 조명의 광특성에 미치는 영향에 대한 연구)

  • Kim, Hye-Rin;You, Dong Geun;You, Jae Hwan;Jang, Jun Won;Choi, Moo Kyu;Hong, Seung Chan;Ko, Jae-Hyeon;Joe, Sung-Yoon;Kim, Yongduk;Park, Taehee;Ko, Young Wook
    • Korean Journal of Optics and Photonics
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    • v.32 no.5
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    • pp.220-229
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    • 2021
  • The optical characteristics of high-power direct-lit white light-emitting diode (LED) lighting were investigated, where a quantum dot (QD) film was adopted to enhance the color-rendering index (CRI). The transmittance of the diffuser plate and the concentration of the QD film were varied in this study. The color coordinates and the correlated color temperature (CCT) did not show any appreciable change, while the CRI values increased slightly as the transmittance of the diffuser plate decreased. The investigated optical properties were nearly independent of the viewing angle, and the luminance distribution was close to Lambertian. The CCT decreased from approximately 6000 K to approximately 4000 K as the concentration of the QD film increased from 0 to 7.5 wt%, which was due to the enhanced red component in the emission spectrum. The CRI increased to approximately 95 for some optical configurations of the lighting. These results demonstrate that glare-free, color-changeable, high-rendering LED lighting can be realized by using a combination of a diffuser plate of appropriate transmittance and a red QD film.

A Study on Extraction of text region using shape analysis of text in natural scene image (자연영상에서 문자의 형태 분석을 이용한 문자영역 추출에 관한 연구)

  • Yang, Jae-Ho;Han, Hyun-Ho;Kim, Ki-Bong;Lee, Sang-Hun
    • Journal of the Korea Convergence Society
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    • v.9 no.11
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    • pp.61-68
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    • 2018
  • In this paper, we propose a method of character detection by analyzing image enhancement and character type to detect characters in natural images that can be acquired in everyday life. The proposed method emphasizes the boundaries of the object part using the unsharp mask in order to improve the detection rate of the area to be recognized as a character in a natural image. By using the boundary of the enhanced object, the character candidate region of the image is detected using Maximal Stable Extermal Regions (MSER). In order to detect the region to be judged as a real character in the detected character candidate region, the shape of each region is analyzed and the non-character region other than the region having the character characteristic is removed to increase the detection rate of the actual character region. In order to compare the objective test of this paper, we compare the detection rate and the accuracy of the character region with the existing methods. Experimental results show that the proposed method improves the detection rate and accuracy of the character region over the existing character detection method.

Selection of Vaccinia Virus-Neutralizing Antibody from a Phage-Display Human-Antibody Library

  • Shin, Yong Won;Chang, Ki-Hwan;Hong, Gwang-Won;Yeo, Sang-Gu;Jee, Youngmee;Kim, Jong-Hyun;Oh, Myoung-don;Cho, Dong-Hyung;Kim, Se-Ho
    • Journal of Microbiology and Biotechnology
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    • v.29 no.4
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    • pp.651-657
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    • 2019
  • Although smallpox was eradicated in 1980, it is still considered a potential agent of biowarfare and bioterrorism. Smallpox has the potential for high mortality rates along with a major public health impact, eventually causing public panic and social disruption. Passive administration of neutralizing monoclonal antibodies (mAbs) is an effective intervention for various adverse reactions caused by vaccination and the unpredictable nature of emerging and bioterrorist-related infections. Currently, vaccinia immune globulin (VIG) is manufactured from vaccinia vaccine-boosted plasma; however, this production method is not ideal because of its limited availability, low specific activity, and risk of contamination with blood-borne infectious agents. To overcome the limitations of VIG production from human plasma, we isolated two human single-chain variable fragments (scFvs), (SC34 and SC212), bound to vaccinia virus (VACV), from a scFv phage library constructed from the B cells of VACV vaccine-boosted volunteers. The scFvs were converted to human IgG1 (VC34 and VC212). These two anti-VACV mAbs were produced in Chinese Hamster Ovary (CHO) DG44 cells. The binding affinities of VC34 and VC212 were estimated by competition ELISA to $IC_{50}$ values of $2{\mu}g/ml$ (13.33 nM) and $22{\mu}g/ml$ (146.67 nM), respectively. Only the VC212 mAb was proven to neutralize the VACV, as evidenced by the plaque reduction neutralization test (PRNT) result with a $PRNT_{50}$ of ~0.16 mg/ml (${\sim}1.07{\mu}M$). This VC212 could serve as a valuable starting material for further development of VACV-neutralizing human immunoglobulin for a prophylactic measure against post-vaccination complications and for post-exposure treatment against smallpox.

A Study on the Characteristics of Space Charge for the Plasma Display (플라즈마 디스플레이의 공간전하 특성에 관한 연구)

  • 염정덕
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.15 no.6
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    • pp.1-7
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    • 2001
  • To analyze the driving principle of PDP, the influence on the discharge characteristics of space charge was researched. Space charge generated by the priming discharge shortens delay time of the discharge which happens as follows and shorts response time. Such influences are valid up to about 30㎲ after generating priming discharge. This space charge decreases dicharge ignition voltage of the cell near priming cell and the influences are most greatly alerted on the discharge of cell which is adjacent most. And the dependency to spare charge strengthens because discharge ignition voltage drop grows by narrowing of discharge pulse width. But the influence on space charge was observed very slightly in pulse width 1㎲ or more. Therefore, to cause a steady discharge, pulse width should become 1㎲ or more at least without being influenced for space charge of the adjoining discharge.

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Effects of Carbon Nitride Surface Layers and Thermal Treatment on Field-Emission and Long-Term Stability of Carbon Nanotube Micro-Tips (질화탄소 표면층 및 열처리가 탄소 나노튜브 미세팁의 전계방출 및 장시간 안정성에 미치는 영향)

  • Noh, Young-Rok;Kim, Jong-Pil;Park, Jin-Seok
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.1
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    • pp.41-47
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    • 2010
  • The effects of thermal treatment on CNTs, which were coated with a-$CN_x$ thin film, were investigated and related to variations of chemical bonding and morphologies of CNTs and also properties of field emission induced by thermal treatment. CNTs were directly grown on nano-sized conical-type tungsten tips via the inductively coupled plasma-chemical vapor deposition (ICP-CVD) system, and a-$CN_x$ films were coated on the CNTs using an RF magnetron sputtering system. Thermal treatment on a-$CN_x$ coated CNT-emitters was performed using a rapid thermal annealing (RTA) system by varying temperature ($300-700^{\circ}C$). Morphologies and microstructures of a-$CN_x$/CNTs hetero-structured emitters were analyzed by FESEM and HRTEM. Chemical composition and atomic bonding structures were analyzed by EDX, Raman spectroscopy, and XPS. The field emission properties of the a-$CN_x$/CNTs hetero-structured emitters were measured using a high vacuum (below $10^{-7}$ Torr) field-emission measurement system. For characterization of emission stability, the fluctuation and degradation of the emission current were monitored in terms of operation time. The results were compared with a-$CN_x$ coated CNT-emitters that were not thermally heated as well as with the conventional non-coated CNT-emitters.