• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.846-848
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• 2002

A large-area (830mm ${\times}$ 1,020mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. By employing the magnetic fields perpendicular to the six straight antenna currents using permanent magnets, improved plasma characteristics such as increase of the ion density and decrease of both electron temperature and plasma potential could be achieved in addition to the stability of the plasma possibly due to the reduction of the electron loss. However, the application of the magnetic field decreased the plasma uniformity slightly even though the uniformity within 10% could be maintained in the 800mm processing area.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.11
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• pp.566-571
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• 2004

Pulse modulation technique provide additional controling method for electron temperature and density in rf and microwave processing plasma. Transient characteristics of electron density and temperature have been measured in pulse modulated rf inductively coupled argon plasma using simple probe circuit. Electron temperature relaxation is clearly identified in the after glow stage. Controllability of average electron temperature and density depends on the modulation frequency and duty ratio. Numerical calculation of time-dependent electron density and temperature have been performed based on the global model. It has been shown that simple langmuir probe measurement method used for continuous plasma is also applicable to time-dependent measurement of pulse modulated plasma.

• Journal of Surface Science and Engineering
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• v.43 no.3
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• pp.154-158
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• 2010

Numerical analysis is done to investigate the effects of pulse bias on the plasma processing characteristics like ion doping and ion nitriding by using fluid dynamic code with a 2D axi-symmetric model. For 10 mTorr of Ar plasma, -1 kV of pulse bias was simulated. Maximum sheath thickness was around 20 mm based on the electric potential profile. The peak electron temperature was about 20 eV, but did not affect the averaged plasma characteristics of the whole chamber. Maximum ion current density incident on the substrate was 200 $A/m^2$ at the center, but was decreased down to 1/10th at radius 100 mm, giving poor radial uniformity.

• Journal of Surface Science and Engineering
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• v.50 no.6
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• pp.504-509
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• 2017

In order to improve corrosion resistance for cast stainless steel in seawater, the characteristics of corrosion resistance after plasma ion nitriding was investigated. Plasma ion nitriding process was conducted in a mixture of nitrogen of 25% and hydrogen of 75% at substrate temperature ranging from 350 to $500^{\circ}C$ for 10 hours using pulsed-DC glow discharge plasma with working pressure of 250 Pa in vacuum condition. Corrosion tests were carried out for as-received and plasma ion nitrided specimens. The corrosion characteristics were investigated by measurement of weight loss and observation of surface morphology. In anodic polarization experiment, relatively less damage depth and weight loss were presented at a nitrided temperature of $400^{\circ}C$, attributing to the formation of S-phase.

• Laser Solutions
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• v.5 no.1
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• pp.33-42
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• 2002

In order to investigate the characteristics of the plasma induced by lap-joint CO$_2$ laser welding of automotive steel sheets, the effects of welding speed, shield gas flow rate, gap size, and laser beam defocus to plasma intensity emitted from keyhole have been investigated. The plasma light is measured by fiber and photodiode. Also, the plasma images were captured by the high speed digital camera in 1000frames/sec in order to correlate the plasma light signal with plasma pattern. From the results, it is observed that the difference of the plasma intensity for between the deep penetration and partial penetration exists from 1.2 to 2 times. The plasma light intensity decreased in case of the deep penetration Is observed due to the exhausting of the plasma gas under the sheet. On the other hand, under the conditions of the deep penetration, the plasma intensity is significantly increased by controling the conditions decreasing the penetration depth. It was specially founded that the effect of 0.3mm gap size at partial penetration condition is approximately similar to deep penetration in 0mm gap. It is concluded that the plasma intensity is able to evaluate the penetration depth in lap-joint welding and appears to offer the most straightforward correlation to the welding process.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.04a
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• pp.67-68
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• 2008

A simple bi-layer structure of organic light emitting diode (OLED) was used to study the characteristics of anode preparation. Indium tin oxide (ITO) anode surface treatment of OLEDs was performed to get the optimum condition for the ITO anode. The ITO surface was treated by $O_2$ or $O_2$ / Ar mixed gas plasma with different processing time. The electrical characteristics of OLED were improved by plasma treatment. The operating voltage of OLED with $O_2$ or $O_2$/Ar mixed gas plasma treated anodes decreases from 8.2 to 3.4 V and 3.2V, respectively. The $O_2$ /Ar mixed gas plasma treatment results in better electrical property.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.25 no.4
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• pp.65-70
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• 2011

Perfluorocompounds (PFCs) gases were decomposed by gliding arc plasma generated by AC pulse power. $N_2$ gas of 10 LPM flow rate and $H_2$ gas of 0.5 LPM were introduced into the gliding arc plasma generated between a pair of electrodes with SUS 303 material, and the PFCs gases were injected in the plasma and thereby were decomposed. The PFCs gas-decomposition-characteristics through the gliding arc plasma were analyzed by FT-IR, where pure $N_2$ and $H_2$-added $N_2$ environment were used to generate the gliding arc plasma. The PFCs gas-decomposition-properties were changed by electric power for gliding arc plasma generation and the H2 gas addition was effective to enhance the PFCs decomposition rate.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.364-366
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• 1997

An experimental helical resonator plasma system that can be applied to the next generation semiconductor processing was fabricated and its characteristics was investigated. Helical resonator plasma can operate both in a capacitive and an inductive mode. Such sources will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. Plasma parameters were measured with Double Langmuir Probes. Plasma densities of $10^{11}{\sim}10^{12}cm^{-3}$ were produced in argon for pressure in the $2{\sim}120\;mTorr$ range. From the results, we conclude that helical resonator plasma can be applied to the next generation semiconductor processing.

• Journal of Hydrogen and New Energy
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• v.22 no.6
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• pp.934-941
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• 2011

Characteristics of low NOx burner is investigated. Low NOx burner introduced in this paper adopts two staged combustion with plasma burner for the 1st stage combustion. Extensive parametric tests were done to figure out the effect of burner stoichiometry, staged thermal load, electric power for plasma generation. Overall NOx production by burner shows effective reduction by adopting plasma staged burner. and the aspects depends on the fuel stoichiometry of 1st stage burner or operating condition of plasma burner. It is promising to use plasma burner as an alternative tools of low NOx burner technology.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1195-1198
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• 2005

The improvement of efficiency is the one of the most important part in AC PDPs . To achieve high efficiency, high VUV emission efficiency and High ion induces secondary electron emission coefficient are needed. We have measured the emission spectra of vacuum ultraviolet rays and ion induced secondary electron emission coefficient of MgO protective layer in surface discharge AC-PDP with binary and ternary gas mixtures. We have investigated electro-optical characteristics of AC-PDPs to optimum gas mixture for high efficient.