• Title/Summary/Keyword: Plasma

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ECR plasma pretreatment of the TiN films for $RuO_2$ MOCVD ($RuO_2$ MOCVD를 위한 TiN막의 ECR plasma 전처리)

  • 이종무;김대교;엄태종;홍현석
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.163-163
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    • 2003
  • TiN barrier막 위에 metal organic chemical deposition(MOCVD)법으로 RuO$_2$ 를 증착시 TiN막 표면을 세정처리하지 않을 경우 RuO$_2$의 핵생성이 어렵고, 그로 인해 RuO$_2$ 연속막이 형성되기 힘들다. 그러므로 RuO$_2$의 핵생성을 향상시키기 위해 TiN막에 대한 전처리 세정이 필수적이다. TiN막의 전처리 세정방법으로 ECR plasma 세정법을 사용하였으며, $O_2$ plasma와 H$_2$ plasma 그리고 Ai plasma를 이용해 각각의 exposure time을 변화시키며 전처리 세정을 실시하였다. H$_2$ plasma와Ar plasma의 exposure time이 증가됨에 따라 RuO$_2$의 핵생성이 향상되었다. 본 연구에서는 scanning electron microscopy(SEM), Auger electron emission spectrometry(AES), Atomic Force Microscope(AFM), X-ray diffraction (XRD) 등의 분석을 통해 TiN막 표면에 대한 ECR plasma 전처리 세정 이 RuO$_2$의 핵생성과 연속막 성장에 미치는 효과에 대해 조사하였다.

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Plasma treatments of indium tin oxide(ITO) anodes in argon/oxygen to improve the performance and morphological property of organic light-emitting diodes(OLED) ($O_2$ : Ar 혼합가스 플라즈마로 ITO표면 처리한 OLED의 동작특성 향상과 표면개질에 관한 연구)

  • Seo, Yu-Suk;Moon, Dae-Gyu;Jo, Nam-Ihn
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04a
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    • pp.67-68
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    • 2008
  • A simple bi-layer structure of organic light emitting diode (OLED) was used to study the characteristics of anode preparation. Indium tin oxide (ITO) anode surface treatment of OLEDs was performed to get the optimum condition for the ITO anode. The ITO surface was treated by $O_2$ or $O_2$ / Ar mixed gas plasma with different processing time. The electrical characteristics of OLED were improved by plasma treatment. The operating voltage of OLED with $O_2$ or $O_2$/Ar mixed gas plasma treated anodes decreases from 8.2 to 3.4 V and 3.2V, respectively. The $O_2$ /Ar mixed gas plasma treatment results in better electrical property.

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Decomposition Characteristics of Perfluorocompounds(PFCs) Gas through Gliding Arc Plasma with Hydrogen Gas (수소 가스를 첨가한 글라이딩 아크 플라즈마의 과불화화합물(PFCs) 가스 분해 특성)

  • Song, Chang-Ho;Park, Dong-Wha;Shin, Paik-Kyun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.25 no.4
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    • pp.65-70
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    • 2011
  • Perfluorocompounds (PFCs) gases were decomposed by gliding arc plasma generated by AC pulse power. $N_2$ gas of 10 LPM flow rate and $H_2$ gas of 0.5 LPM were introduced into the gliding arc plasma generated between a pair of electrodes with SUS 303 material, and the PFCs gases were injected in the plasma and thereby were decomposed. The PFCs gas-decomposition-characteristics through the gliding arc plasma were analyzed by FT-IR, where pure $N_2$ and $H_2$-added $N_2$ environment were used to generate the gliding arc plasma. The PFCs gas-decomposition-properties were changed by electric power for gliding arc plasma generation and the H2 gas addition was effective to enhance the PFCs decomposition rate.

The Study on Characteristics of N-Doped Ethylcyclohexane Plasma-Polymer Thin Films

  • Seo, Hyeon-Jin;Jo, Sang-Jin;Lee, Jin-U;Jeon, So-Hyeon;Bu, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.540-540
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    • 2013
  • In this studying, we investigated the basic properties of N-doped plasma polymer. The N-doped ethylcyclohexane plasma polymer thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Ethylcyclohexenewas used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, ammonia gas [NH3] was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, FE-SEM, and water contact angle measurement. The ellipsometry results showed the refractive index change of the N-doped ethylcyclohexene plasma polymer film. The FT-IR spectrashowed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.

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Color Depth of Polyamide Fabrics Pretreated with Low-Temperature Plasma under Atmospheric Pressure (상압 저온 플라즈마 전처리한 폴리아미드계 직물의 색농도)

  • 이문철
    • Textile Coloration and Finishing
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    • v.5 no.2
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    • pp.134-138
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    • 1993
  • Wool, silk and nylon 6 fabrics were treated with low-temperature plasma under atmospheric pressure of acetone/argon or helium/argon for 30 and 180 sec, and then dyed with leveling type acid dye, C.I. Acid Red 18 and milling type acid dye, C.I. Acid Blue 83. In spite of short time of the plasma treatment for thirty seconds, the color depth of wool fabrics was increased remarkably with both of the plasma gases, aceton/argon or helium/argon and with the kinds of dyes i.e., levelin type or milling type. But the atmosperic low-temperature plasmas did not increase the depth of silk and nylon 6 fabrics dyed with both of the acid dyes regardless of the teated time and plasma gases. It seems that low-temperature plasma by atmospheric-pressure discharge is effective for improvement of dyeing of wools as is the same way with the low-temperature plasma by glow discharge. The kinds of plasma gases and treated time did not influnce the depth of wool fabric pretreted with the atmosperic low-temperature plasmas.

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Design of Plasma Cutting Torch by Tolerance Propagation Analysis (공차누적해석을 이용한 플라즈마 절단토치의 설계에 관한 연구)

  • 방용우;장희석;장희석;양진승
    • Journal of Welding and Joining
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    • v.18 no.3
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    • pp.122-130
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    • 2000
  • Due to the inherent dimensional uncertainty, the tolerances accumulate in the assembly of plasma cutting torch. Tolerance accumulation has serious effect on the performance of the plasma torch. This study proposes a statistical tolerance propagation model, which is based on matrix transform. This model can predict the final tolerance distributions of the completed plasma torch assembly with the prescribed statistical tolerance distribution of each part to be assembled. Verification of the proposed model was performed by making use of Monte Carlo simulation. Monte Carlo simulation generates a large number of discrete plasma torch assembly instances and randomly selects a point within the tolerance region with the prescribed statistical distribution. Monte Carlo simulation results show good agreement with that of the proposed model. This results are promising in that we can predict the final tolerance distributions in advance before assembly process of plasma torch thus provide great benefit at the assembly design stage of plasma torch.

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Effects of stress on scuticociliate killing activity of olive flounder (Paralichthys olivaceus) plasma in relation to humoral immunity

  • Kwon, Se-Ryun;Kim, Chun-Soo;Kim, Ki-Hong
    • Journal of fish pathology
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    • v.15 no.2
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    • pp.77-82
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    • 2002
  • Effects of stress-induced suppression of humoral immunity on scuticociliate killing activity of olive flounder plasma were investigated. Changes in glucose level. alternative complement activity and Iysozyme activity of plasma by handling stress were analysed in relation to in vitri parasiticidal activity of plasma. The plasma glucose level was about two times higher in fish after a handling stress than in control fish. Plasma lysozyme activity and natural haemolytic activity were decreased in suessed fish.The scuticociliate killing activity of plasma was significantly lower in stressed fish than in non-stressed control fish. The present results indicated that stress-induced immunodepression could be a cause of scuticociliatosis occurrence in olive flounder.

The characteristics of helical resonator plasma (헬리컬 공명 플라즈마의 특성)

  • Jang, Sang-Hun;Kim, Tae-Hyun;Kim, Moon-Young;Tae, Heung-Sik
    • Proceedings of the KIEE Conference
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    • 1997.11a
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    • pp.364-366
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    • 1997
  • An experimental helical resonator plasma system that can be applied to the next generation semiconductor processing was fabricated and its characteristics was investigated. Helical resonator plasma can operate both in a capacitive and an inductive mode. Such sources will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. Plasma parameters were measured with Double Langmuir Probes. Plasma densities of $10^{11}{\sim}10^{12}cm^{-3}$ were produced in argon for pressure in the $2{\sim}120\;mTorr$ range. From the results, we conclude that helical resonator plasma can be applied to the next generation semiconductor processing.

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Effects of Chronic Ethanol Administration on Folate Metabolism and Plasma Homocysteine Concentration in the Rats (만성적인 에탄올 섭취가 흰쥐의 엽산대사 및 혈장 호모시스테인 농도에 미치는 영향)

  • 임은선;서정숙;민혜선
    • Journal of Nutrition and Health
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    • v.31 no.6
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    • pp.1006-1013
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    • 1998
  • The present study was conducted to investigate the effect of different levels of ethanol ingestion on 131ate metabolism and plasma homocysteine concentration in Sprague-Dawley male rats receiving 0, 10, 30% of their caloric intake as ethanol for S weeks. Diets containing 10% ethanol had no effect on plasma and red blood cell(rbc) 131a1e. However, in rats fed a 30% ethanol diet, rbc folate increased and plasma 131ate decreased significantly, In the rats maintained first on a 30% ethanol diet for S weeks and then on a control diet for 2 weeks, the levels of plasma and rbc f31ate were normalized by withdrawal of ethanol. Urinary fo1ate excretion increased markedly in rats fed 10% and 30% ethanol diets and decreased to 51% of controls by withdrawal of ethanol. Plasma homocysteine concentration increased significantly in rats fed a 30% ethanol diet. The results suggest that chronic ingestion of ethanol increased urinary 131ate excretion markedly, which may decrease plasma 131ate and deplete liver folate.

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A Magnetic Microsensor based on the Hall Effect in an AC Microplasma (극미세 교류 플라즈마 내에서의 홀 효과를 이용한 마이크로 자기센서)

  • Seo, Young-Ho;Han, Ki-Ho;Cho, Young-Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.27 no.8
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    • pp.1266-1272
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    • 2003
  • This paper presents a new class of magnetic microsensors based on the Hall effect in AC microplasma. In the theoretical study, we develop a simple model of the plasma Hall sensor and express the plasma Hall voltage as a function of magnetic field, plasma discharge field, pressure, and electrode geometry. On this basis, we have designed and fabricated magnetic microsensors using AC neon plasma. In the experiment, we have measured the Hall voltage output of the plasma microsensors for varying five different conditions, including the frequency and the magnitude of magnetic field, the frequency and the magnitude of plasma discharge voltage, and the neon pressure. The fabricated magnetic microsensors show a magnetic field sensitivity of 8.87${\pm}$0.18㎷/G with 4.48% nonlinearity.