• International Journal of Precision Engineering and Manufacturing
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• 제9권1호
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• pp.12-18
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• 2008

This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output variables (critical dimensions) were formed using an experimental design method, and the photolithography process model was built using a multiple regression analysis. Both the NMEWMA and DMTMV controllers could update the process model and obtain the optimal recipes for the next run. Quantified improvements were obtained from simulations and real photolithography processes.

• 한국시뮬레이션학회논문지
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• 제14권4호
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• pp.55-68
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• 2005

The advancement in semiconductor technology is leading toward smaller critical dimension designs and larger wafer manufactures. Due to such phenomena, semiconductor industry is in need of an accurate control of the process. Photolithography is one of the key processes where the pattern of each layer is formed. In this process, precise superposition of the current layer to the previous layer is critical. Therefore overlay parameters of the semiconductor photolithography process is targeted for this research. The complex relationship among the input parameters and the output metrologies is difficult to understand and harder yet to model. Because of the superiority in modeling multi-nonlinear relationships, neural networks is used for the simulator modeling. For training the neural networks, conjugate gradient method is employed. An experiment is performed to evaluate the performance among the proposed neural network simulator, stepwise regression model, and the currently practiced prediction model from the test site.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2004년도 하계종합학술대회 논문집(2)
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• pp.497-500
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• 2004

In this paper, we developed a new photolithography process which used a water-soluble photoresist instead of organic solvent soluble photoresist, defined pentacene thin film. And pentacene OTFTs were fabricated with the water- soluble photolithography process.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2257-2259
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• 2000

This paper reports on the design, fabrication and driving experiment of micro mirror array(MMA) for lithography process to apply to biochip fabrication Photolithography technology is applied to activate specific area on the surface of modified glass surface, DNA monomers are bound on the activated area of the glass surface. After repeat of DNA monomer synthesizing process, DNA single strand probes could be solid-synthesized on the glass substrate. Without using photomask, photolithography process is tried using micro mirror array(MMA). Photomask or mask alignment is not required in maskless photolithography process using micro mirror array.

• 대한기계학회논문집B
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• 제36권10호
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• pp.1011-1017
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• 2012

본 논문에서는 롤타입 마스크를 사용한 마이크로/나노 구조 제작용 광학 리소그래피 방법을 소개한다. 이 생산 방법은 다양한 목표 해상도에 따라 위상지연 리소그래피방법과 포토리소그래피로 나뉜다. 사용되는 빛의 파장대보다 작은 해상도를 갖는 패턴을 제작하기 위해서 실린더 형태의 위상지연 마스크를 활용한 근거리 노광 방식을 사용한다. 또한 필름 형태의 금속 마스크를 써서 포토리소그래피를 연속방식으로 수행하였는데 이 방식은 실린더 마스크의 회전수를 조절함으로써 노광 결과 패턴의 주기를 실시간으로 조절할 수 있다. 이 기술의 응용으로 금속 그물패턴으로 만들어진 100 $mm^2$ 넓이의 투명전극을 제작하였다.

• 대한기계학회논문집B
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• 제28권5호
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• pp.560-568
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• 2004

We performed the numerical study on the characteristics of the 3-D airflow and dynamic cross contamination in the photolithography process cleanroom. The nonunifurmity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. From the numerical results, we knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers and the global cross contamination varies with the location of source and the passage of time through the concentration ratio.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 추계학술대회
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• pp.151-156
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• 2003

We performed the numerical study on the characteristics of the airflow and cross contamination in the photolithography process cleanroom. The nonuniformity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. We knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers. And the numerical result showed that the global cross contamination varies with the location of source and the passage of time.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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• pp.247-250
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• 2002

SAW filters were fabricated on $LiNbO_3$ substrates to evaluate frequency response and properties of photolithography. In the both of etch and lift-off methods, lift off method was superior to etch method in fabrication process. Frequency response property was measured by network analyzer. From measurement of acoustic property, SAW propagation velocity was 3574.9m/sec for $LiNbO_3$ SAW filter.

• 한국산학기술학회논문지
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• 제13권8호
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• pp.3319-3325
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• 2012

본 논문은 반도체 포토장비의 이산 이벤트 시뮬레이터인 TrackSim의 개발에 관한 것이다. TrackSim은 포토 장비의 시뮬레이션 엔진과 사용하기 쉬운 사용자 환경을 포함하는 시뮬레이터로, 다양한 프로세스 모듈의 구성 및 운영 방법을 효율적으로 평가, 검증, 스케쥴링할 수 있는 3차원 시뮬레이션 환경을 제공한다. TrackSim은 반도체 산업에서 많이 사용되는 이산 사건 시뮬레이션 소프트웨어인 AutoMod를 기반으로 개발되어 시뮬레이션 신뢰성이 보장되며, AutoMod로 개발된 반도체 제조라인 시뮬레이션 모델 속에 함께 연동하여 사용이 가능하다는 특징이 있다.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 2008년도 High Temperature Superconductivity Vol.XVIII
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• pp.83-83
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• 2008