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http://dx.doi.org/10.3795/KSME-B.2004.28.5.560

A Study on the 3-D Airflow and Dynamic Cross Contamination in the Photolithography Process Cleanroom  

Noh, Kwang-Chul (서울시립대학교 대학원 기계정보공학과)
Oh, Myung-Do (서울시립대학교 기계정보공학과)
Lee, Seung-Chul (동해대학교 자동차공학과)
Publication Information
Transactions of the Korean Society of Mechanical Engineers B / v.28, no.5, 2004 , pp. 560-568 More about this Journal
Abstract
We performed the numerical study on the characteristics of the 3-D airflow and dynamic cross contamination in the photolithography process cleanroom. The nonunifurmity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. From the numerical results, we knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers and the global cross contamination varies with the location of source and the passage of time through the concentration ratio.
Keywords
Cleanroom; Fan Filter Unit; Dynamic Cross Contamination; Photolithography Process;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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