• 제목/요약/키워드: Photoelectron spectroscopy

검색결과 1,451건 처리시간 0.03초

Interfacial Natures and Controlling Morphology of Co Oxide Nanocrystal Structures by Adding Spectator Ni Ions

  • Gwag, Jin-Seog;Sohn, Young-Ku
    • Bulletin of the Korean Chemical Society
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    • 제33권2호
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    • pp.505-510
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    • 2012
  • Cobalt oxide nanostructure materials have been prepared by adding several concentrations of spectator Ni ions in solution, and analyzed by electron microscopy, X-day diffraction, calorimetry/thermogravimetric analysis, UV-vis absorption, Raman, and X-ray photoelectron spectroscopy. The electron microscopy results show that the morphology of the nanostructures is dramatically altered by changing the concentration of spectator ions. The bulk XRD patterns of $350^{\circ}C$-annealed samples indicate that the structure of the cobalt oxide is all of cubic Fd-3m $Co_3O_4$, and show that the major XRD peaks shift slightly with the concentration of Ni ions. In Raman spectroscopy, we can confirm the XRD data through a more obvious change in peak position, broadness, and intensity. For the un-sputtered samples in the XPS measurement process, the XPS peaks of Co 2p and O 1s for the samples prepared without Ni ions exhibit higher binding energies than those for the sample prepared with Ni ions. Upon $Ar^+$ ion sputtering, we found $Co_3O_4$ reduces to CoO, on the basis of XPS data. Our study could be further applied to controlling morphology and surface oxidation state.

Tribological Properties of Sputtered Boron Carbide Coating and the Effect of ${CH}_4$ Reactive Component of Processing Gas

  • Cuong, Pham-Duc;Ahn, Hyo-Sok;Kim, Jong-Hee;Shin, Kyung-Ho
    • KSTLE International Journal
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    • 제4권2호
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    • pp.56-59
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    • 2003
  • Boron carbide thin coatings were deposited on silicon wafers by DC magnetron sputtering using a ${B}_4$C target with Ar as processing gas. Various amounts of methane gas (${CH}_4$) were added in the deposition process to better understand their influence on tribological properties of the coatings. Reciprocating wear tests employing an oscillating friction wear tester were performed to investigate the tribological behaviors of the coatings in ambient environment. The chemical characteristics of the coatings and worn surfaces were studied using X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES). It revealed that ${CH}_4$addition to Ar processing gas strongly affected the tribologcal properties of sputtered boron carbide coating. The coefficient of friction was reduced approximately from 0.4 to 0.1, and wear resistance was improved considerably by increasing the ratio of ${CH}_4$gas component from 0 to 1.2 vol %. By adding a sufficient amount of ${CH}_4$(1.2 %) in the deposition process, the boron carbide coating exhibited lowest friction and highest wear resistance.

Soft X-ray Nano-spectroscopy for Electronic Structures of Transition Metal Oxide Nano-structures

  • Oshima, Masaharu
    • Applied Science and Convergence Technology
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    • 제23권6호
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    • pp.317-327
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    • 2014
  • In order to develop nano-devices with much lower power consumption for beyond-CMOS applications, the fundamental understanding and precise control of the electronic properties of ultrathin transition metal oxide (TMO) films are strongly required. The metal-insulator transition (MIT) is not only an important issue in solid state physics, but also a useful phenomenon for device applications like switching or memory devices. For potential use in such application, the electronic structures of MIT, observed for TMO nano-structures, have been investigated using a synchrotron radiation angle-resolved photoelectron spectroscopy system combined with a laser molecular beam epitaxy chamber and a scanning photoelectron microscopy system with 70 nm spatial resolution. In this review article, electronic structures revealed by soft X-ray nano-spectroscopy are presented for i) polarity-dependent MIT and thickness-dependent MIT of TMO ultrathin films of $LaAlO_3/SrTiO_3$ and $SrVO_3/SrTiO_3$, respectively, and ii) electric field-induced MIT of TMO nano-structures showing resistance switching behaviors due to interfacial redox reactions and/or filamentary path formation. These electronic structures have been successfully correlated with the electrical properties of nano-structured films and nano-devices.

Effect of Doping Si in DLC Thin Films Growth on Their Mechanical Properties

  • 김대영;박민석;진인태
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.369.2-369.2
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    • 2014
  • Diamond-like Carbon(DLC) films doping Si were deposited by linear ion source(LIS)-physical vapor deposition method on Si wafer. We have studied the effects of Si content on friction and wear properties of DLC films and the characteristics of the films were investigated using Nano-indentation, Micro raman spectroscopy, Field Emission-Scanning Electron Microscope (FM-SEM) and X-ray Photoelectron Spectroscopy (XPS). The films has been various low-friction and low-stress by varying the flow rates of silane gas. Under the about 2% of Si doping is very suitable for improving the adhesion of films and reducing internal stress while maintaining the surfaces hardness of DLC films. Linear ion source (LIS)를 사용하여 Si wafer위에 Si 이온이 첨가된 DLC 박막을 증착하였다. 참가된Si 이온의 양에 따라 DLC 박막에 미치는 영향을 분석하기 위하여 마찰 계수 및 경도를 비교하였고, Micro raman spectroscopy, Field Emission-Scanning Electron Microscope (FM-SEM) and X-ray Photoelectron Spectroscopy (XPS)를 통하여 표면 상태를 분석하였다. 천체 주입된 가스량의 약 2%까지 Si 이온 주입이 늘어날수록 DLC 박막의 마찰계수는 낮아졌고, 경도는 Si 이온이 주입되지 않았을 경우와 비슷한 값(약 20~23 GPa)을 가졌다. 2% 이상의 주입량에서는 마찰계수는 주입량이 늘어날수록 높아졌으며 경도는 떨어지는 경향을 보였다. 이는 Si이온이 2%이하로 첨가되었을 경우, DLC 박막의 생성시 탄소 이온들의 결합 Stress를 줄여 마찰계수가 줄어든다고 볼 수 있으며, 그 양이 2%이상이 되면 오히려 불순물로 작용하여 DLC 박막의 Stress는 급격히 증가하고 마찰계수도 높아짐을 알 수 있다.

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Tribological properties of sputtered boron carbide coating and the effect of $CH_4$ reactive component of processing gas

  • Cuong Pham Duc;Ahn Hyo-Sok;Kim Jong-Hee;Shin Kyung-Ho
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2003년도 학술대회지
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    • pp.78-84
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    • 2003
  • Boron carbide thin coatings were deposited on silicon wafers by DC magnetron sputtering using a $B_4C$ target with As as processing gas. Various amounts of methane gas $(CH_4)$ were added in the deposition process to better understand their influence on tribological properties of the coatings. Reciprocating wear tests employing an oscillating friction wear tester were performed to investigate the tribological behaviors of the coatings in ambient environment. The chemical characteristics of the coatings and worn surfaces were studied using X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES). It revealed that $CH_4$ addition to As processing gas strongly affected the tribologcal properties of sputtered boron carbide coating. The coefficient of friction was reduced approximately from 0.4 to 0.1, and wear resistance was improved considerably by increasing the ratio of $CH_4$, gas component from 0 to $1.2\;vol\;\%$. By adding a sufficient amount of $CH_4\;(1.2\%)$ in the deposition process, the boron carbide coating exhibited lowest friction and highest wear resistance.

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$Cl_{2}O_{2}$ 가스에 의한 크롬 박막의 식각 특성 고찰 (The Etching Characteristics of Cr Films by Using $Cl_{2}O_{2}$ Gas Mixtures)

  • 박희찬;강승열;이상균;최복길;권광호
    • 한국전기전자재료학회논문지
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    • 제14권8호
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    • pp.634-639
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    • 2001
  • We investigated the etching characteristics of chromium films by using Cl$_2$/O$_2$ gas mixtures with electron cyclotron resonance plasma. In order to examine the chemical etch characteristics of Cr films by using Cl$_2$/O$_2$ gas plasma, we obtained the etch rate with various gas mixing ratios. By X-ray photoelectron spectroscopy, the surface reaction on the chromium films during the etch was examined. From narrow scan analyses of Cr, Cl, and O, it was confirmed that a chromium oxychlorie (CrCl$_{x}$O$_{y}$) layer was formed on the surface by the etch using Cl$_2$/O$_2$ gas mixtures. We observed a new characteristic emission line during the etch of chromium films using Cl$_2$/O$_2$ gas mixtures by an optical emission spectroscopy. It was found that the peak intensity of this emission line had a tendency compatible with the etch rate. The origin of this emission line was discussed in detail. At the same time, the etched profile was also examined by scanning electron microscope.e.e.

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알루미늄으로 제작된 심해 장비의 부식 저항 능력 향상 방법 및 측정 방법 조사 (Study on Methods of Enhancement and Measurement of Corrosion Resistance for Subsea Equipment made of Aluminum)

  • 서영균;정정열
    • 플랜트 저널
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    • 제16권3호
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    • pp.47-52
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    • 2020
  • 본 연구에서는 알루미늄으로 제작된 심해 장비의 부식 저항 능력 향상시키기 위해 알루미늄 부식 방지 방법과 측정방법을 조사하였다. 조사된 부식 방지 방법은 Cathodic Protection(음극화 보호), Conversion Coating, Anodizing, 및 Organic Coating이었다. 그리고 간단하게 조사된 측정 방법은 Scanning Electron Microscope (SEM), Electrochemical Impedance Spectroscopy (EIS), Glow discharge optical emission spectrum spectroscopy (GD-OES), Fourier Transform Infrared Spectroscopy (FT-IR), Transmission Electron Microscopy (TEM), X-ray Photoelectron Spectroscopy (XPS), Scanning Vibrating Electrode Technique (SVET), Contact Angle(접촉각), Interfacial Tension (경계면 장력)이었다. 알루미늄 부식을 방지하기 위해 널리 사용되는 방법은 Anodizing과 Organic Coating이었으며, 부식 측정을 위해서는 여러 방법들이 골고루 사용되었다. 그 중 많이 사용되는 방법은 표면의 구조를 관찰하 위한 SEM과 부식 저항 능력을 측정하기 위한 접촉각 측정이었다.

이온빔을 조사한 폴리스타일렌 기판에서의 액정의 배향특성 (Investigation of Liquid Crystal Alignment on ion beam exposed polystyrene surface)

  • 황현석;이종덕;노정규;한정민
    • 한국위성정보통신학회논문지
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    • 제9권1호
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    • pp.33-37
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    • 2014
  • 본 연구에서는 이온빔을 조사한 폴리스타일렌 기판에 일정강도의 이온빔을 조사한 경우에 발생되는 액정배향의 특성에 대해서 연구하였다. 폴리스타일렌은 기계적강도 및 절연성에서 액정표시소자의 배향막으로 사용되는 폴리이미드 계열의 대체 물질로서 주목받고 있으며, 특히 비접촉 배향에서의 가능성이 새롭게 평가되고 있는 소재이다. 이온빔을 조사하여 이방성을 발생시킨 박막의 표면에서의 액정배향상태를 편광현미경으로 관찰하고, 액정배향에 기여한 메커니즘의 규명을 위해서 XPS(X-ray photoelectron spetroscopy) 분석을 사용하였다. 분석한 결과 15초까지의 이온빔 조사는 액정의 배향을 유발하는 중요한 원인으로 작용함을 알 수 있었으며, 이온빔조사에 의한 액정의 배향방법은 고온안정성도 겸비하고 있는 것을 실험을 통해서 알 수 있었다.

목련잎 추출액을 이용한 Au Core-Ag Shell 합금 나노입자의 생물학적 합성 (Biological Synthesis of Au Core-Ag Shell Bimetallic Nanoparticles Using Magnolia kobus Leaf Extract)

  • 송재용;김범수
    • Korean Chemical Engineering Research
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    • 제48권1호
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    • pp.98-102
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    • 2010
  • 목련잎 추출액을 이용하여 Au core-Ag shell 합금 나노입자를 합성하였다. 환원제인 식물잎 추출액을 먼저 $HAuCl_4$ 용액과 반응시키고 다음에 $AgNO_3$ 용액과 반응시켜 금 seed와 은 shell을 형성시켰다. 반응시간에 따른 UV-visible spectroscopy의 변화를 모니터링하여 합금 나노입자의 형성을 관찰하였다. 합성된 합금 나노입자를 transmission electron microscopy(TEM), energy dispersive X-ray spectroscopy(EDS), X-ray photoelectron spectroscopy(XPS) 등으로 특성화 하였다. TEM image로부터 관찰된 합금 나노입자는 삼각형, 오각형, 육각형 등의 평판과 구 구조의 혼합물이었다. EDS와 XPS 분석으로부터 결정된 금/은 합금 나노입자의 원자 은 함량은 각각 34와 65 wt%로 Au core-Ag shell 나노구조가 형성되었음을 알 수 있었다. 이러한 core-shell 형태의 나노구조는 표면 강화 라만 분광 및 생물분자의 고감도 검출 등에 잠재적인 응용이 기대된다.