• 제목/요약/키워드: Photo Sensitive Polymer

검색결과 14건 처리시간 0.03초

Light intensity controlled wrinkling patterns in photo-thermal sensitive hydrogels

  • Toh, William;Ding, Zhiwei;Ng, Teng Yong;Liu, Zishun
    • Coupled systems mechanics
    • /
    • 제5권4호
    • /
    • pp.315-327
    • /
    • 2016
  • Undergoing large volumetric changes upon incremental environmental stimulation, hydrogels are interesting materials which hold immense potentials for utilization in a wide array of applications in diverse industries. Owing to the large magnitudes of deformation it undergoes, swelling induced instability is a commonly observed sight in all types of gels. In this work, we investigate the instability of photo-thermal sensitive hydrogels, produced by impregnating light absorbing nano-particles into the polymer network of a temperature sensitive hydrogel, such as PNIPAM. Earlier works have shown that by using lights of different intensities, these hydrogels follow different swelling trends. We investigate the possibility of utilizing this fact for remote switching applications. The analysis is built on a thermodynamic framework of inhomogeneous large deformation of hydrogels and implemented via commercial finite element software, ABAQUS. Various examples of swelling induced instabilities, and its corresponding dependence on light intensity, will be investigated. We show that the instabilities that arise have their morphologies dependent on the light intensity.

미세입자 분사가공에서 SU-8 마스크의 특성 (Characteristics of SU-8 Mask for Abrasive Jet Machining)

  • 고태조;박동진;김희술
    • 한국정밀공학회지
    • /
    • 제24권1호
    • /
    • pp.71-78
    • /
    • 2007
  • Abrasive jet machining (AJM) has been traditionally used for removing rusts or paints. Nowadays, this is promising technology for micro bulk machining where brittle substrate materials are used. In order to get accurate details, masks such as metal, polymer or elastomer is inevitable. Among them, photo polymer which is sensitive to the light has been attractive for it's high accuracy using photolithography. In this research, SU-8 as a photo polymer is used since it is adequate for making thick mask. So, this paper describes how to make AJM masks using SU-8 with a photolithography process, and investigates the characteristics of SU-8 masks during AJM process. Also, an example of fabrication using AJM was shown.

Material Design for the Fabrication of Barrier Ribs with High Aspect Ratio of Plasma Display Panel by X-ray Lithography

  • Ryu, Seung-Min;Yang, Dong-Yol;So, Jae-Yong;Park, Lee-Soon
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
    • /
    • pp.989-992
    • /
    • 2008
  • X-ray lithography is one of the most powerful processes in the fabrication of nano/micro structures with a high aspect ratio. This process enables the fabrication of ultra-thin barrier ribs for PDP using X-ray sensitive paste. In this paper, organic material including photo-monomers, photo-oligomers, binder polymer and additives as well as inorganic powders with different size were optimized to fabricate high aspect ratio barrier rib pattern for PDP.

  • PDF

광경화성 폴리머를 이용한 레이저 미세패터닝의 기초연구 (A Study on Laser Micro-Patterning using UV Curable Polymer)

  • 김정민;신보성;김재구;장원석;양성빈
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2003년도 춘계학술대회 논문집
    • /
    • pp.612-615
    • /
    • 2003
  • Maskless laser patterning process is developed using 3rd harmonic Diode Pumped Solid State Laser with near visible wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and polymer optical property to gain the optimal conditions. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8${\mu}{\textrm}{m}$ width and 5.4${\mu}{\textrm}{m}$ height. This process could be applied to fabricate a single mode waveguide without expensive mask projection method.

  • PDF

Diffraction Behaviors of New Photopolymers Containing the Dendritic Molecule

  • Kim Go Woon;Jun Woong Gi;Lee Sang Kyu;Cho Min Ju;Jin Jung-Il;Choi Dong Hoon
    • Macromolecular Research
    • /
    • 제13권6호
    • /
    • pp.477-482
    • /
    • 2005
  • Photopolymers are attractive materials for holographic 3-D data storage because of their high photosensitivity and large refractive index modulation. We synthesized the six-armed dendrimer for fabricating the new photopolymer. It was prepared using the initiating mixture of hexaarylbiimidazole (HABI), mercapto-benzoxazole (MOBZ), and 2,6-bis(4-diethylaminobenzylidene)cyclopentanone (DEAW), which is sensitive to 514 nm wavelength. The holographic gratings were fabricated successfully in these photopolymer samples by conventional optical interference method. We investigated the effect of dendrimer, either as a binder or as a plasticizer in the cellulose acetate butyrate (CAB), on the diffraction behavior. The addition of only 1 wt$\%$ of dendrimer-I into the CAB significantly increased the diffraction efficiency. The sample doped with dendrimer showed around 80-83$\%$ of the diffraction efficiency.

Preparation of Solventless UV Curable Thermally Conductive Pressure Sensitive Adhesives and Their Adhesion Performance

  • Baek, Seung-Suk;Park, Jinhwan;Jang, Su-Hee;Hong, Seheum;Hwang, Seok-Ho
    • Elastomers and Composites
    • /
    • 제52권2호
    • /
    • pp.136-142
    • /
    • 2017
  • Using various compositions of thermally conductive inorganic fillers with boron nitride (BN) and aluminum oxide ($Al_2O_3$), solventless UV-curable thermally conductive acrylic pressure sensitive adhesives (PSAs) were prepared. The base of the PSAs consists of 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, and isobornyl acrylate.The compositions of the thermally conductive inorganic fillers were 10, 15, 20, and 25 phr in case of BN, and 20:0, 15:5, 10:10, 5:15, and 0:20 phr in case of $BN/Al_2O_3$. The adhesion properties like peel strength, shear strength, and probe tack, and the thermal conductivity of the prepared PSAs were investigated with different thermally conductive inorganic filler contents. There were no significant changes in photo-polymerization behavior with increasing BN or $BN/Al_2O_3$ content. Meanwhile, the conversion rate and transmittance of the PSAs decreased and their thermal stabilities increased with increasing BN content. Their adhesion properties were also independent of the BN or $BN/Al_2O_3$ content. The dispersibility of BN in the acrylic PSAs was better than that of $Al_2O_3$ and it ranked the thermal conductivity in the following order: BN > $BN/Al_2O_3$ > $Al_2O_3$.

Multiplexed Hard-Polymer-Clad Fiber Temperature Sensor Using An Optical Time-Domain Reflectometer

  • Lee, Jung-Ryul;Kim, Hyeng-Cheol
    • International Journal of Aeronautical and Space Sciences
    • /
    • 제17권1호
    • /
    • pp.37-44
    • /
    • 2016
  • Optical fiber temperature sensing systems have incomparable advantages over traditional electrical-cable-based monitoring systems. However, the fiber optic interrogators and sensors have often been rejected as a temperature monitoring technology in real-world industrial applications because of high cost and over-specification. This study proposes a multiplexed fiber optic temperature monitoring sensor system using an economical Optical Time-Domain Reflectometer (OTDR) and Hard-Polymer-Clad Fiber (HPCF). HPCF is a special optical fiber in which a hard polymer cladding made of fluoroacrylate acts as a protective coating for an inner silica core. An OTDR is an optical loss measurement system that provides optical loss and event distance measurement in real time. A temperature sensor array with the five sensor nodes at 10-m interval was economically and quickly made by locally stripping HPCF clad through photo-thermal and photo-chemical processes using a continuous/pulse hybrid-mode laser. The exposed cores created backscattering signals in the OTDR attenuation trace. It was demonstrated that the backscattering peaks were independently sensitive to temperature variation. Since the 1.5-mm-long exposed core showed a 5-m-wide backscattering peak, the OTDR with a spatial resolution of 40 mm allows for making a sensor node at every 5 m for independent multiplexing. The performance of the sensor node included an operating range of up to $120^{\circ}C$, a resolution of $0.59^{\circ}C$, and a temperature sensitivity of $-0.00967dB/^{\circ}C$. Temperature monitoring errors in the environment tests stood at $0.76^{\circ}C$ and $0.36^{\circ}C$ under the temperature variation of the unstrapped fiber region and the vibration of the sensor node. The small sensitivities to the environment and the economic feasibility of the highly multiplexed HPCF temperature monitoring sensor system will be important advantages for use as system-integrated temperature sensors.

아크릴산 함량 및 무기물 충전제가 UV 경화형 아크릴 점착테이프의 물성에 미치는 영향 (Effect of Acrylic Acid Contents and Inorganic Fillers on Physical Properties of Acrylic Pressure Sensitive Adhesive Tape by UV Curing)

  • 김동복
    • 폴리머
    • /
    • 제37권2호
    • /
    • pp.184-195
    • /
    • 2013
  • 아크릴 점착테이프는 자동차, 전기전자 및 디스플레이 모듈 접합에 사용된다. 본 연구는 이러한 모듈 접합에 사용되는 고강도 준구조형 점착테이프 제조를 위해 2-ethylhexylacrylate(2-EHA)와 acrylic acid(AAC)를 사용하여 UV 조사에 의한 광중합 및 점착테이프 제조를 위해 광경화를 진행하였고, AAC의 함량 및 무기물 충전제 $SiO_2$ 함량에 따라 아크릴 점착테이프의 물성에 미치는 영향을 고찰하였다. 공단량체로 사용된 AAC의 함량이 많을수록 아크릴고분자 사슬의 강직성이 증가하여 초기 점착력이 낮았고, 시간경과에 따라 점착력이 증가하였으며 테이프의 젖음성, 접촉각 및 SEM 이미지를 통해 확인할 수 있었다. 충전제를 첨가하지 않은 점착테이프의 박리강도와 전단접착강도는 반비례 관계였으나 충전제를 첨가하면 함량 증가에 따라 박리강도 증가와 함께 전단접착강도가 증가하는 비례관계를 보였다. 이러한 상관관계로부터 고강도 준구조형 접착물성을 필요로 하는 용도에 최적화된 아크릴 점착테이프를 제시할 수 있었다.

2-beam Coupling 방법을 이용한 광 고분자 형광 패턴 형성 (Fluorescent Pattern Generation on the Fluorescent Photopolymer with 2-beam Coupling Method)

  • 김윤정;김정훈;심보연;이명규;김은경
    • 한국광학회지
    • /
    • 제21권1호
    • /
    • pp.6-11
    • /
    • 2010
  • 아크릴레이트계 모노머를 사용한 최적화 된 포토폴리머에 안트라센 형광폴리머를 첨가하여 형광 특성을 가지는 포토폴리머를 제조하고, 514 nm 레이저를 이용하여 2-beam coupling 방법으로 형광 포토폴리머 필름 위에 회절격자를 형성하였다. 기록 시작 후 30초 이내에 선명한 fluorescent line pattern 이 형성되었으며, 회절격자 형성 뒤, 패턴이 형성된 부분에서 형광 세기의 증가가 관찰되었다. 기록 시 간섭 빔 앞에 mask pattern 을 이용하여 $50\;{\mu}m$ gap electrode 패턴을 형성하였다. 이 때 형성된 패턴은 micron scale gap패턴 안에 회절격자로부터 생성된 submicron scale의 grating line을 보였다. 이는 beam의 광 고분자 film 표면에 대한 각도($3.6^{\circ}$, $15^{\circ}$), 패턴에 사용된 광 고분자의 굴절률 등으로부터 Bragg's equation 을 사용하여 계산된 이론적인 grating 간격 ($0.6\;{\mu}m$) 과 오차범위 안에서 일치 하였다.