• 한국전기전자재료학회논문지
• /
• 제11권12호
• /
• pp.1070-1078
• /
• 1998

A density of phonon is increased by application of electric field. At this time the phonon which has higher energy than around is called hot phonon is disappeared after 7 picosecond by scattering with electron and loss energy. Since the lifetime of phonon is very short, the effects of hot phonon can be neglected in the low speed semiconductor device, but it must be considered in high speed devices. DC and AC electric fields are applied to bulk GaAs, and the density of phonon is obtained and analyzed for its effects on electron velocity and electron distribution using Monte Carlo simulation method. Under high electric filed the density of hot phonon increased and energy of hot phonon is decreased by scattering with electron on the other hand the energy of electron is increased. Therefore electron move from central valley of conduntion band to satellite vallies and the valocity of electron decrease since the mass of electron in satellite vally is heavier than central vally. In millimeter wave frequencies, the effects of hot phonon increased at higher frequencies.

• 한국음향학회지
• /
• 제1권1호
• /
• pp.92-96
• /
• 1982

In this paper, the interaction of electron and phonon in metals is expressed using Hamiltonian operator as follows. By excahnging phonon energy with in the vicinity of isotropical Fermi surface and using following electron and hole operators. We obtain the interaction of electron and phonon. And new Feynman Graphs are tried with the following conditions on. First, when state transfer state, phonon cannot be created. Second, when state transfer state, phonon cannot be destroyed. Third, when state transfer state, phonon can be created or destroyed. Fourth, when state transfer state, phonon can be created or destroyed.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2009년도 제38회 동계학술대회 초록집
• /
• pp.4-5
• /
• 2010

The surface phonon is defined as a coherent vibrational excitation of surface atoms propagating along the surface. It is characterized by a phonon dispersion curves, which were extensively studied in 1990's using helium atom scattering and high-resolution electron-energy-loss spectroscopy (HREELS)[1].The understanding is mainly based on the theoretical framework of a classical bond model or cluster calculations. The recent sample preparation and first principles calculations open the naval way to deep insight for surface phonon problems. The surface phonon dispersion on the hydrogen-terminated Si(111)-($1{\times}1$) surface [H:Si(111)] is the typical system and already reported experimentally [2] and theoretically [3], although the understandingis incomplete. The sample contaminated by the oxygen atoms on the surface and the calculations were also classical. In this study, firstly, we have prepared an ultra-clean H:Si(111) surface [4] and measured the surface phonon dispersion curvesusing HREELS. Secondly, we have performed first-principles density functional calculations with the projector augmented wave functionals, as implemented in VASP, using generalized gradient approximations. We used aslab of six silicon layers and both top and bottom surfaces were terminated with hydrogen atoms. Finally, we have compared with the surface phonon dispersion of deuterium-terminatedSi(111)-($1{\times}1$) surface[5] and led to our conclusions. The Si-H stretching and the bending modes are observed at 258.5 and 78.2 meV, respectively. These energies are the same as the previously reported values [2], but the energy-loss peaks at the lower energy regions are dramatically shifted. Through this combination study, we have formulated the procedure of preparing ultra-clean H:Si(111)/D:Si(111), which was confirmed by HREELS vibrational analysis. The Si surface will be utilized for further nano-physics research as well as for the materials for nano-fubrication.

• Bulletin of the Korean Chemical Society
• /
• 제12권4호
• /
• pp.387-392
• /
• 1991

We present a theoretical investigation of the inelastic atom-surface phonon scattering for a model He-Si(100) system by the classical trajectory-quantum forced oscillator(DECENT) method. Single and multi-phonon transition probabilities of normal modes are calculated for several initial beam orientations and several initial kinetic energies. In order to understand surface structure effects, the calculation has been done on both reconstructed and unreconstructed surfaces of the He/Si(100) system. The origin of mode specificity for energy transfer is discussed. The contribution of one, two, and multi-phonon events to the total energy transfer between 0 and 600 K is also given.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2007년도 춘계학술대회B
• /
• pp.2165-2170
• /
• 2007

At nanoscales, the Boltzmann transport equation (BTE) can best describe the behavior of phonons which are energy carriers in crystalline materials. Through this study, the phonon transport in some micro/nanoscale problems was simulated with the Monte Carlo method which is a kind of the stochastic approach to the BTE. In the Monte Carlo method, the superparticles of which the number is the weighted value to the actual number of phonons are allowed to drift and be scattered by other ones based on the scattering probability. Accounting for the phonon dispersion relation and polarizations, we have confirmed the one-dimensional transient phonon transport in ballistic and diffusion limits, respectively. The thermal conductivity for GaAs was also calculated from the kinetic theory by using the proposed model. Besides, we simulated the electrostatic discharge event in the NMOS transistor as a two-dimensional problem by applying the Monte Carlo method.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 1992년도 제3회 학술발표회 논문개요집
• /
• pp.17-17
• /
• 1992

In this talk, our recent progress in experiment study on microscopic surface phonons has been reviewed. After the brief introduction concerning the concept of surface phonons, exprimental apparatus of HREELS and the principle of the measurment for surface phonon dispersions, I show the experimental data of some solide surfaces. The following points are discussed ; (1) lattice dynamical analysis of the phonon dispersions of some transi tion metal carbide (100) surfaces indicates the large changes in the force constant near the surface, which is consistent wi th a rippled structure of a topmost layer. (2) the phonon dispersions of a graphite overlayer show the modified phonon structure, which indicates that the thickness of the overlayer is one atomic layer, and in addition, the electronic structure is also modified. (3) The phonon structure of $LaB_6$ (100) surface is discussed. Lastly I telJ about new technology of extreme high vaccum less than $10^{-10}$ Pa.EX> Pa.

• 대한전자공학회논문지SD
• /
• 제42권9호
• /
• pp.9-18
• /
• 2005

60 nm C-MOSFET 기술 분기점 이상의 고성능, 저전력 트랜지스터를 구현 시키기 위해 SiGe/SiO2/Si위에 성장된 strained Si의 두께가 전자 이동도에 미치는 영향을 두 가지 관점에서 조사 연구하였다. 첫째, inter-valley phonon 산란 모델의 매개변수들을 최적화하였고 둘째, strained Si 반전층의 2-fold와 4-fold의 전자상태, 에너지 밴드 다이어그램, 전자 점유도, 전자농도, phonon 산란율과 phonon-limited 전자이동도를 이론적으로 계산하였다. SGOI n-MOSFET의 전자이동도는 고찰된 SOI 구조의 Si 두께 모든 영역에서 일반적인 SOI n-MOSFET보다 $1.5\~1.7$배가 높음이 관찰 되었다. 이러한 경향은 실험 결과와 상당히 일치한다. 특히 strained Si의 두께가 10 nm 이하일 때 Si 채널 두께가 6 nm 보다 작은 SGOI n-MOSFET에서의 phonon-limited 전자 이동도는 일반 SOI n-MOSFET과 크게 달랐다. 우리는 이러한 차이가 전자들이 suained SGOI n-MOSFET의 반전층에서 SiGe층으로 터널링 했기 때문이고, 반면에 일반 SOI n-MOSFET에서는 캐리어 confinement 현상이 발생했기 때문인 것으로 해석하였다. 또한 우리는 10 nm와 3 nm 사이의 Si 두께에서는 SGOI n-MOSFET의 phonon-limited 전자 이동도가 inter-valley phonon 산란율에 영향을 받는 다는 것을 확인하였으며, 이러한 결과는 더욱 높은 드레인 전류를 얻기 위해서 15 nm 미만의 채널길이를 가진 완전공핍 C-MOSFET는 stained Si SGOI 구조로 제작하여야 함을 확인 했다

• Nuclear Engineering and Technology
• /
• 제55권7호
• /
• pp.2556-2566
• /
• 2023

A first-principle approach within the framework of density functional theory was employed to study the effect of vacancy defects and fission products (FPs) doping on the mechanical, electronic, and thermodynamic properties of uranium monocarbide (UC). Firstly, the calculated vacancy formation energies confirm that the C vacancy is more stable than the U vacancy. The solution energies indicate that FPs prefer to occupying in U site rather than in C site. Zr, Mo, Th, and Pu atoms tend to directly replace U atom and dissolve into the UC lattice. Besides, the results of the mechanical properties show that U vacancy reduces the compressive and deformation resistance of UC while C vacancy has little effect. The doping of all FPs except He has a repairing effect on the mechanical properties of U_1-xC. In addition, significant modifications are observed in the phonon dispersion curves and partial phonon density of states (PhDOS) of UC_1-x, Zr_xU_1-xC, Mo_xU_1-xC, and Rh_xU_1-xC, including narrow frequency gaps and overlapping phonon modes, which increase the phonon scattering and lead to deterioration of thermal expansion coefficient (α_V) and heat capacity (C_p) of UC predicted by the quasi harmonic approximation (QHA) method.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2007년도 춘계학술대회B
• /
• pp.2182-2187
• /
• 2007

The relative contributions of phonon and electron to the thermal conductivity of silicon film with varying doping density are evaluated from the modified electron-phonon interaction model, which is applicable to the micro/nanoscale simulation of energy transport between energy carriers. The thermal conductivities of intrinsic silicon layer thicknesses from 20 nm to 500 nm are calculated and extended to the variation in n-type doping densities from 1.0 ${\times}$ $10^{18}$ to 5.0 ${\times}$ $10^{20}$ $cm^{-3}$, which agree well with the experimental data and theoretical model. From simulation results, the phonon and electron contributions to thermal conductivity are extracted. The electron contribution in the silicon is found to be not negligible above $10^{19}$ $cm^{-3}$, which can be classified as semimetal or metal by the value of its electrical resistivity at room temperature. The thermal conductivity due to electron is about 57.2% of the total thermal conductivity at doping concentration 5.0 ${\times}$ $10^{20}$ $cm^{-3}$ and silicon film thickness 100 nm.

• Journal of Mechanical Science and Technology
• /
• 제19권6호
• /
• pp.1378-1389
• /
• 2005

This work provides the fundamental knowledge of energy transport characteristics during very short-pulse laser heating of semiconductors from a microscopic viewpoint. Based on the self-consistent hydrodynamic equations, in-situ interactions between carriers, optical phonons, and acoustic phonons are simulated to figure out energy transport mechanism during ultrafast pulse laser heating of a silicon substrate through the detailed information on the time and spatial evolutions of each temperature for carriers, longitudinal optical (LO) phonons, acoustic phonons. It is found that nonequilibrium between LO phonons and acoustic phonons should be considered for ultrafast pulse laser heating problem, two-peak structures become apparently present for the subpicosecond pulses because of the Auger heating. A substantial increase in carrier temperature is observed for lasers with a few picosecond pulse duration, whereas the temperature rise of acoustic and phonon temperatures is relatively small with decreasing laser pulse widths. A slight lagging behavior is observed due to the differences in relaxation times and heat capacities between two different phonons. Moreover, the laser fluence has a significant effect on the decaying rate of the Auger recombination.