• Title/Summary/Keyword: Pattern Fabrication

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Fabrication of a Nano Pattern Using Focused Ion Beam (집속이온빔을 이용한 나노 패턴 형성)

  • Han J.;Min B.K.;Lee S.J.;Park C.W.;Lee J.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1531-1534
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    • 2005
  • Nano pattern is being utilized to produce micro optical components, sensors, and information storage devices. In this study, a study on nano pattern fabrication using raster-scan type Focused Ion Beam (FIB) milling is introduced. Because the intensity of ion beam has Gaussian distribution, the overlapping of the Gaussian beam results in a 3D pattern, and the shape of the pattern can be adjusted by variation of FIB milling parameters, such as overlap, ion dose, and dwell time. The Gaussian shape of single beam intensity has been investigated by experiment, and 3D nano patterns with pitch of 200nm generated by FIB is demonstrated.

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A Study on the Fabrication of Various 3D Microstructures using Polymer Deposition System (폴리머 적층 시스템을 이용한 다양한 3 차원 미세 구조물 제작에 관한 연구)

  • Kim, Jong-Young
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.6
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    • pp.686-692
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    • 2012
  • Solid free-form fabrication (SFF) technology was developed to fabricate three-dimensional (3D) scaffolds for tissue engineering (TE) applications. In this study, we developed a polymer deposition system (PDS) and created 3D microstructures using a bioresorbable polycaprolactone (PCL) polymer. Fabrication of 3D scaffolds by PDS requires a combination of several devices, including a heating system, dispenser, and motion controller. The system can process a polymer with extremely high precision by using a 200 ${\mu}m$ nozzle. Based on scanning electron microscope (SEM) images, both the line width and the piled line height were fine and uniform. Several 3D micro-structures, including the ANU pattern (a pattern named after Andong National University), $45^{\circ}$ pattern square, frame, cylindrical, triangular, cross-shaped, and hexagon, have been fabricated using the polymer deposition system.

Investigation of Conductive Pattern Line for Direct Digital Printing (디지털 프린팅을 위한 전도성 배선에 관한 연구)

  • Kim, Yong-Sik;Seo, Shang-Hoon;Lee, Ro-Woon;Kim, Tae-Hoon;Park, Jae-Chan;Kim, Tae-Gu;Jeong, Kyoung-Jin;Yun, Kwan-Soo;Park, Sung-Jun;Joung, Jae-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.502-502
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    • 2007
  • Current thin film process using memory device fabrication process use expensive processes such as manufacturing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as PCB, FCPB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line for the electronic circuit board using metal ink contains Ag nano-particles. Metal lines are fabricated by two types of printing methods. One is a conventional printing method which is able to quick fabrication of fine pattern line, but has various difficulties about thick and high resolution DPI(Dot per Inch) pattern lines because of bulge and piling up phenomenon. Another(Second) methods is sequential printing method which has a various merits of fabrication for fine, thick and high resolution pattern lines without bulge. In this work, conductivities of metal pattern line are investigated with respect to printing methods and pattern thickness. As a result, conductivity of thick pattern is about several un.

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Finite Element Analysis of Nano Deformation for the Hyper-Fine Pattern Fabrication by using Nanoindentation (나노인덴테이션을 이용하여 극미세 패턴을 제작하기 위한 나노 변형의 유한요소해석(I))

  • 이정우;윤성원;강충길
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.5
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    • pp.210-217
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    • 2003
  • In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation was studied with numerical method by ABAQUS S/W. Polymer (PMMA) and brittle materials (Si, Pyrex glass) were used as specimens, and forming conditions to reduce the elastic restoration and pile-up was proposed. The indenter was modeled a rigid surface. Minimum mesh sizes of specimens are 1-l0mm. The result of the investigation will be applied to the fabrication of the hyper-fine pattern and mold.

Finite Element Analysis of Nano Deformation for Hyper-fine Pattern Fabrication by Application of Nanoidentation Process (II) (나노인덴테이션 공정을 이용하여 극미세 패턴을 제작하기 위한 나노변형의 유한요소해석(II))

  • 이정우;윤성원;강충길
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.9
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    • pp.47-54
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    • 2003
  • In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation was studied with numerical method by ABAQUS S/W. Polymer (PMMA) and brittle materials (Si, Pyrex glass) were used as specimens, and forming conditions to reduce the elastic re cover and pile-up were proposed. The indenter was modeled a rigid surface. Minimum mesh sizes of specimens are 1 -l0nm. Comparison between the experimental data and numerical result demonstrated that the finite element approach is capable of reproducing the loading-unloading behavior of a nanoindentation test. The result of the investigation will be applied to the fabrication of the hyper-fine pattern.

Fundamental Study on Deformation Behavior of the Nano Structure for Application to the Hyper-fine Pattern and Mold Fabrication (극미세 Mold 및 패턴 제작물 위한 나노변형의 기초연구)

  • 이정우;윤성원;강충길
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.10a
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    • pp.333-336
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    • 2002
  • In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation was studied with numberical method by ABAQUS S/W. Polymer (PMMA) and brittle materials (Si, Pyrex glass) were used as specimens, and forming conditions to reduce the elastic restoration and bur was proposed. The indenter was modeled a rigid surface. Minimum mesh sizes of specimens are 1-l0nm. The result of the investigation will be applied to the fabrication of the hyper-fine pattern and mold.

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Electric Circuit Fabrication Technology using Conductive Ink and Direct Printing

  • Jeong, Jae-U;Kim, Yong-Sik;Yun, Gwan-Su
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.12.1-12.1
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    • 2009
  • For the micro conductive line, memory device fabrication process use many expensive processes such as manufactur-ing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because nano-metal particles contained inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as FPCB, PCB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line on flexible PCB substrate for the next generation electronic circuit using Ag nano-particles contained ink. To improve the line tolerance on flexible PCB, metal lines are fabricated by sequential prinitng method. Sequential printing method has vari-ous merits about fine, thick and high resolution pattern lines without bulge.

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Finite Element Analysis of Nano Deformation for Hyper-fine Pattern Fabrication by Application of Nano-scratch Process (나노스크래치 공정을 이용하여 극미세 패턴을 제작하기 위한 나노 변형의 유한요소해석)

  • 이정우;강충길;윤성원
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.3
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    • pp.139-146
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    • 2004
  • In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation scratch test was studied with numerical method by ABAQUS S/W. Brittle materials (Si, Pyrex glass 7740) were used as specimens, and forming conditions to reduce the elastic recovery and pile-up were proposed. The indenter was modeled as a rigid surface. Minimum mesh sizes of specimens are 1-l0nm. Variables of the nanoindentation scratch test analysis are scratching speed, scratching load, tip radius and tip geometry. The nano-indentation scratch tests were performed by using the Berkovich pyramidal diamond indenter. Comparison between the experimental data and numerical result demonstrated that the FEM approach can be a good model of the nanoindentation scratch test. The result of the investigation will be applied to the fabrication of the hyper-fine pattern.

Effects of Parameters on Abrasion-Resistant Layer of Composite Structure Formed by Evaporation Pattern Casting (소실모형주조법에 의한 내마모 복합조직층 형성에 미치는 공정인자의 영향)

  • Choi, Chang-Young;Mo, Nam-Gyu;Kim, Gun-ho;Yoon, Jong-Cheon;Jung, Yu-Hyun;Kim, Dong-Hyuk;Choi, Yong-Jin;Lee, In-Kyu;Cho, Yong-Jae
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.17 no.2
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    • pp.89-94
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    • 2018
  • Due to industrial advancement and environmental concerns, there is a demand for light-weight material parts with high-performance characteristics. In order to meet this demand, various studies have been conducted on developing high-performance castings to achieve composite features by coating only specific parts that require high performance, with dissimilar joining, rather than coating the entire material part. This study analyzed the possibility of forming a local composite layer on an aluminum alloy through evaporation pattern casting, and the effects of parameters on the aluminum alloy.