• Title/Summary/Keyword: Particles in Plasma

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The Study on In-situ Diagnosis of Chemical Vapor Deposition Processes (화학기상증착 진공공정의 실시간 진단연구)

  • Jeon, Ki-Moon;Shin, Jae-Soo;Lim, Sung-Kyu;Park, Sang-Hyun;Kang, Byoung-Koo;Yune, Jin-Uk;Yun, Ju-Young;Shin, Yong-Hyeon;Kang, Sang-Woo
    • Journal of the Korean Vacuum Society
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    • v.20 no.2
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    • pp.86-92
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    • 2011
  • The diagnosis studies of the process of chemical vapor deposition were carried out by using in-situ particle monitor (ISPM) and self-plasma optical emission spectroscopy (SPOES). We used the two kinds of equipments such as the silicon plasma enhanced chemical vapor deposition system with silane gas and the borophosphosilicate glass depositon system for monitoring. Using two sensors, we tried to verify the diagnostic and in-situ sensing ability of by-product gases and contaminant particles at the deposition and cleaning steps. The processes were controlled as a function of precess temperature, operating pressure, plasma power, etc. and two sensors were installed at the exhaust line and contiguous with each other. the correlation of data (by-product species and particles) measured by sensors were also investigated.

Preparation of Ultrafine $SnO_2$ Powders by Spray-ICP Technique

  • Kim, Jung-Hwan;Kim, Young-Do;Shin, Kun-Chul;Park, Jong-Hyun
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.06a
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    • pp.65-70
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    • 1998
  • The Spray-ICP technique uses the ICP(Inductively Coupled Plasma) of ultra-high temperature which is produced by r.f power. The ICP is well-kwown as a clean heat source for the preparation of pure ceramic particles because the ICP is a electrodeless-thermal plasma without contamination. In this study,{{{{ { SnO}_{2 } }}}} particles were sythesized from metal salt solution by Spray-ICP technique. The effects of concentration of solution, collecting location of powders were investicated. The prepared {{{{ { SnO}_{2 } }}}} particles from each concentration of solution had same crystalline phase(tetragonal {{{{ { SnO}_{2 } }}}}) a nd the mean size decreased in proportion to the increase of solution concentration. Each {{{{ { SnO}_{2 } }}}} p owders collector in reactor and electrostatic collector had same crystalline phase and morphologies. The mean size of {{{{ { SnO}_{2 } }}}} p articles prepared by Spray-ICP technique was below 30nm.

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Direct Analysis of Aerosol Particles by Atomic Emission and Mass Spectrometry

  • Kawaguchi, Hiroshi;Nomizu, Tsutomu;Tanaka, Tomokazu;Kaneco, Satoshi
    • Analytical Science and Technology
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    • v.8 no.4
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    • pp.411-418
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    • 1995
  • A method for the direct determination of elemental content in each of aerosol particles by inductively coupled plasma atomic emission (ICP-AES) or mass spectrometry (ICP-MS) is described. This method is based upon the introduction of diluted aerosol into an ICP and the measurement of either the flash emission intensities of an atomic spectral line or ion intensities. A pulse-height analyzer is used for the measurement of the distribution of the elemental content. In order to calibrate the measuring system, monodisperse aerosols are used. The potentials of the method are shown by demonstrating the copper emission signals from the aerosols generated at a small electric switch, a study of the relation between the decreasing rate of particle number density and particle size, and measurements of calcium contents in the individual biological cells.

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Tensile Analysis of Plasma Spray Coating Material by Classification of AE Signals (Acoustic Emission 파형분류에 의한 플라즈마 용사 코팅재의 인장해석)

  • ;;K. ONO
    • Journal of Ocean Engineering and Technology
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    • v.15 no.4
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    • pp.60-65
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    • 2001
  • Thermal spray coating is formed by a process in which melted particles flying with high speed towards substrate, then crash and spread on the substrate surface cooled and solidified in a very short time, Stacking of the particles makes coating. In this study, the exfoliation of $Al_2$O$_3$ and Ni-4.5wt.%Al thermally sprayed coating which were deposited by an atmospheric plasma spray apparatus are investigated using an AE method. A tensile test is conducted on notch specimens in a stress range below the elastic limit of substrate. The wave forms of AE generated from the three coating specimens can be classified by FFT analysis into two types which low frequency(type I waveform is considered to corresponds exfoliation of coating layers and type II waveform corresponds the plastic deformation of notch tip or the resultant fracture of coating. The fracture of the coating layers can estimate by AE event and amplitude, because AE features increase when the deformation generates.

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Plasma Density Measurement of the Hg-Ar(1Torr) by LIF Method (LIF를 이용한 Hg-Ar(1Torr)의 플라즈마 밀도 측정)

  • Lee Jong-Chan;Park Dae-Hee;Yang Jong-Kyung
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.54 no.5
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    • pp.213-217
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    • 2005
  • In this paper, we introduced a LIF measurement method and summarized the theoretical side. When an altered wavelength of laser and electric power, lamp applied electric power, we measured the relative density of the metastable state in mercury after observing a laser induced fluorescence signal of 404.8nm and 546.2nm, and confirmed the horizontal distribution of plasma density in the discharge lamp. Due to this generation, the extinction of atoms in a metastable state occurred through collision, ionization, and excitation between plasma particles. The density and distribution of the metastable state depended on the energy and density of plasma particles, intensely This highlights the importance of measuring density distribution in plasma electric discharge mechanism study The results confirmed the resonance phenomenon regarding the energy level of atoms along a wavelength change, and also confirmed that the largest fluorescent signal in 436nm, and that the density of atoms in 546.2nm ($6^3S_1 {\to} 6^3P_2$ ) were larger than 404.8nm ($6^3S_1 {\to} 6^3P_1$). According to the increase of lamp applied electric power, plasma density increased, too. When increased with laser electric power, the LIF signal reached a saturation state in more than 2.6mJ. When partial plasma density distribution along a horizontal axis was measured using the laser induced fluorescence method, the density decreased by recombination away from the center.

Plasma Density Measurement of Hg-Ar by LIF Method (LIF를 이용한 Hg-Ar의 플라즈마 밀도 측정)

  • Choi, Yong-Sung;Hwang, Jong-Sun;Park, Kye-Choon;Song, Min-Jong;Kim, Hyeong-Gohn;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.12a
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    • pp.27-32
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    • 2006
  • In this paper, we introduced a LIF measurement method and summarized the theoretical side. When an altered wavelength of laser and electric power, lamp applied electric power, we measured the relative density of the metastable state in mercury after observing a laser induced fluorescence signal of 404.8nm and 546.2nm, and confirmed the horizontal distribution of plasma density in the discharge lamp. Due to this generation, the extinction of atoms in a metastable state occurred through collision, ionization, and excitation between plasma particles. The density and distribution of the metastable state depended on the energy and density of plasma particles, intensely. This highlights the importance of measuring density distribution in plasma electric discharge mechanism study. The results confirmed the resonance phenomenon regarding the energy level of atoms along a wavelength change, and also confirmed that the largest fluorcscent signal in 436nm, and that the density of atoms in 546.2nm ($6^3S_1{\rightarrow}6^3P_2$) were larger than 404.8nm ($6^3S_1{\rightarrow}6^3P_2$). According to the increase of lamp applied electric power, plasma density increased, too. When increased with laser electric power, the LIF signal reached a saturation state in more than 2.6mJ. When partial plasma density distribution along a horizontal axis was measured using the laser induced fluorescence method, the density decreased by recombination away from the center.

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Plasma Corrosion in Oxalic Acid Anodized Coatings Depending on Tartaric Acid Content

  • Shin, Jae-Soo;Song, Je-Boem;Choi, Sin-Ho;Kim, Jin-Tae;Oh, Seong-Geun;Yun, Ju-Young
    • Applied Science and Convergence Technology
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    • v.25 no.1
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    • pp.15-18
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    • 2016
  • Study investigated the optimal anodizing conditions for fabricating an oxide film that produces less contamination in a corrosive plasma environment, using oxalic acid and tartaric acid. Oxide films were produced using sulfuric acid, oxalic acid, and tartaric acid electrolyte mixtures with various mole ratios. The oxide film made by adding 0.05M tartaric acid to 0.3M oxalic acid showed higher breakdown voltage and lower leakage current. Additionally, contamination particles were reduced during plasma etching, thus demonstrates that this mixture presented optimal conditions. However, higher tartaric acid content (0.1 M, 0.15 M) led to lower breakdown voltages and higher leakage currents. Also, it resulted in more cracking during thermal shock tests as well as the generation of more contamination particles during plasma processing.

A Kinetic Study on the Growth of Nanocrystalline Diamond Particles to Thin Film on Silicon Substrate

  • Jung, Doo-Young;Kang, Chan-Hyoung
    • Journal of the Korean institute of surface engineering
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    • v.44 no.4
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    • pp.131-136
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    • 2011
  • A kinetic study has been made for the growth of nanocrystalline diamond (NCD) particles to a continuous thin film on silicon substrate in a microwave plasma chemical vapor deposition reactor. Parameters of deposition have been microwave power of 1.2 kW, the chamber pressure of 110 Torr, and the Ar/$CH_4$ ratio of 200/2 sccm. The deposition has been carried out at temperatures in the range of $400\sim700^{\circ}C$ for the times of 0.5~16 h. It has been revealed that a continuous diamond film evolves from the growth and coalescence of diamond crystallites (or particles), which have been heterogeneously nucleated at the previously scratched sites. The diamond particles grow following an $h^2$ = k't relationship, where h is the height of particles, k' is the particle growth rate constant, and t is the deposition time. The k' values at the different deposition temperatures satisfy an Arrhenius equation with the apparent activation energy of 4.37 kcal/mol or 0.19 eV/ atom. The rate limiting step should be the diffusion of carbon species over the Si substrate surface. The growth of diamond film thickness (H) shows an H = kt relationship with deposition time, t. The film growth rate constant, k, values at the different deposition temperatures show another Arrhenius-type expression with the apparent activation energy of 3.89 kcal/mol or 0.17 eV/atom. In this case, the rate limiting step might be the incorporation reaction of carbon species from the plasma on the film surface.

Image Observation of NO Particles Using ICCD camera (ICCD Camera를 이용한 NO 입자의 Image 관측)

  • 전용우;최준영;최상태;박원주;이광식;신용철
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2000.11a
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    • pp.209-213
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    • 2000
  • In this paper, the removal rate of NO in a reactor is measured first using nonthermal plasma generated from a wire-cylinder type reactor, then the spatial density distribution of NO particles is investigated using ICCD(Intensified Charged Coupled Device) camera. This research uses nonthermal plasma from electrical discharge to analyze the NO characteristics, and the measurements of NO discharge image and Distribution are performed using the ICCD camera to examine the NO characteristics more closely. Furthermore, the method of Laser Induced Fluorescence (LIF) is used to analyze the particular behavior of NO particles more specifically, to suggest a method of reducing exhaust gas, a serious environmental problem.

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Electrical Transport and Joule Heating of ZrB2 Network in SiC Matrix

  • Kim, Jung-Hun;Kim, Chang-Yeoul;Choi, Sung-Churl
    • Journal of the Korean Ceramic Society
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    • v.55 no.5
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    • pp.440-445
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    • 2018
  • To control the electrical properties of a SiC heating element, we sintered $SiC-ZrB_2$composites by using the spark plasma sintering method. The addition of $ZrB_2$ particles with lower electrical conductivity to the SiC matrices with comparatively higher electrical resistivity lowers the electrical resistivities of the composite material. The $ZrB_2$ particles aggregate to form large particles and 3-1, 3-2, and 3-3 networks, i.e., conduction paths. In our study, about $1-{\mu}m$-sized $ZrB_2$ powders start to form the conduction path at about 10 vol.% of addition, namely the threshold volume. The Joule heating experiment shows that 20 vol.% $ZrB_2$-added SiC heating element has outstanding heating efficiency.