• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.96-96
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• 2016

Nanotechnology mostly employs nano-materials and nano-structures with distinctive properties based on their size, structure, and composition. It is quite difficult to produce nano-materials and nano-structures with identical sizes, structures, and compositions in large quantities, because of spatiotemporal fluctuation of production processes. In other words, fluctuation is the bottleneck in nanotechnology. We propose three strategies to suppress such fluctuations: employing 1) difference between linear and nonlinear phenomena, 2) difference in time constants, and 3) nucleation as a bottleneck phenomenon. We are also developing nano- and micro-scale guided assembly using plasmas as a plasma nanofabrication.1-5) We manipulate nano- and micro-objects using electrostatic, electromagnetic, ion drag, neutral drag, and optical forces. The accuracy of positioning the objects depends on fluctuation of position and energy of an object in plasmas. Here we evaluate such fluctuations and discuss the mechanism behind them. We conducted in-situ evaluation of local plasma potential fluctuation using tracking analysis of fine particles (=objects) in plasmas. Experiments were carried out with a radio frequency low-pressure plasma reactor, where we set two quartz windows at the top and bottom of the reactor. Ar plasmas were generated at 200 Pa by applying 13.56MHz, 450V peak-to-peak voltage. The injected fine particles were monodisperse methyl methacrylate-polymer spheres of $10{\mu}m$ in diameter. Fine particles were injected into the reactor and were suspended around the plasma/sheath boundary near the powered electrode. We observed binary collision of fine particles with a high-speed camera. The frame rate was 1000-10000 fps. Time evolution of their distance from the center of mass was measured by tracking analysis of the two particles. Kinetic energy during the collision was obtained from the result. Potential energy formed between the two particles was deduced by assuming the potential energy plus the kinetic energy is constant. The interaction potential is fluctuated during the collision. Maximum amplitude of the fluctuation is 25eV, and the average is 8eV. The fluctuation can be caused by neutral molecule collisions, ion collisions, and fluctuation of electrostatic force. Among theses possible causes, fluctuation of electrostatic force may be main one, because the fine particle has a large negative charge of -17000e and the corresponding electrostatic force is large compared to other forces.

• Journal of Ceramic Processing Research
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• 제20권6호
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• pp.589-596
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• 2019

Pigments with minute particle sizes, such as carbon black (CB) and pigment red 48:2 (P.R.48:2), are the most important types of pigment and have been widely used in many industrial applications. However, minute particles have large surface areas, high oil absorption and low surface energy. They therefore tend to be repellent to the vehicle and lose stability, resulting in significant increases in viscosity or reaggregation in the vehicle. Therefore, finding the best way to improve the dispersion properties of minute particle size pigments presents a major technical challenge. In this study, minute particle types of CB and P.R.48:2 were treated with nitrogen gas plasma generated via radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) to increase the dispersion properties of minute particles in deionized (DI) water. The morphologies and particle sizes of untreated and plasma treated particles were evaluated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The average distributions of particle size were measured using a laser particle sizer. Fourier transform infrared spectroscopy was carried out on the samples to identify changes in molecular interactions during plasma processing. The results of our analysis indicate that N2 plasma treatment is an effective method for improving the dispersibility of minute particles of pigment in DI water.

• 한국진공학회지
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• 제10권2호
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• pp.275-281
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• 2001

플라즈마 반응기 내에서 입자 전하 분포가 Gaussian형태로 표현될 때 전하 분포를 가지는 입자들의 충돌에 의한 입자 성장을 discrete-sectional 모델을 사용하여 이론적으로 고찰하였다. 플라즈마 반응기 내에서 입자 성장을 분석하기 위해 monomer크기, monomer생성 속도 등의 공정 변수들을 변화시켰다. 입자 크기가 40 m이상인 큰 입자들은 플라즈마 반응기내에서 대부분이 음으로 존재하였으며 40 m이하인 작은 입자들은 음성, 중성 혹은 양으로 존재하였다 입자 충돌에 의해 입자 크기가 증가함에 따라 입자 표면적의 증가와 더불어 입자가 가지는 평균 음전하수도 증가하였다. 입자 충돌에 의해 큰 입자들이 생성됨에 따라 입자크기분포는 2개의 모드로 양분화 됐다. 본 연구의 이론 결과와 Shiratani 등 [3]의 실험결과가 비교적 잘 맞았으며 본 연구에서 사용한 모델식은 플라즈마 반응기 내에서 수 나노 크기의 입자 성장 연구에도 활용될 수 있을 것으로 기대된다.

• Journal of Advanced Marine Engineering and Technology
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• 제23권4호
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• pp.523-532
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• 1999

This study is aimed to obtain fundamental knowledge of pulse laser welding phenomena the authors investigated the structure and composition of evaporated particles of Al alloys in air and in the Ar atmosphere during pulsed laser welding. The ultra-fine particles of 5 to 100nm diameter in a globular or irregular shape were formed in laser-induced plasma and the main structure was $MgAl_2O_4$ The composition of particles was ifferent depending on the power density of a laser beam; namely under the low power density conditions magnesium was predominant in the parti-cles while aluminium content increased with an increase in the power density. These results were attributed to evaporation phenomena of metals with different boiling points and latent heats of vaporization. On the other hand the number density of laser-induced plasma species was obtained by Saha's equation. it was confirmed that the number density depends upon the plasma tempera-ture and total pressures.

• 반도체디스플레이기술학회지
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• 제21권3호
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• pp.74-79
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• 2022

In this study, the plasma corrosion resistance and the change in the number of contamination particles generated using the plasma etching process and cleaning process of coating parts for semiconductor plasma etching equipment were investigated. As the coating method, atmospheric plasma spray (APS) was used, and the powder materials were Y₂O₃ and Y₃Al₅O₁₂ (YAG). There was a clear difference in the densities of the coatings due to the difference in solubility due to the melting point of the powdered material. As a plasma environment, a mixed gas of CF₄, O₂, and Ar was used, and the etching process was performed at 200 W for 60 min. After the plasma etching process, a fluorinated film was formed on the surface, and it was confirmed that the plasma resistance was lowered and contaminant particles were generated. We performed a surface cleaning process using piranha solution(H₂SO₄(3):H₂O₂(1)) to remove the defect-causing surface fluorinated film. APS-Y₂O₃ and APS-YAG coatings commonly increased the number of defects (pores, cracks) on the coating surface by plasma etching and cleaning processes. As a result, it was confirmed that the generation of contamination particles increased and the breakdown voltage decreased. In particular, in the case of APS-YAG under the same cleaning process conditions, some of the fluorinated film remained and surface defects increased, which accelerated the increase in the number of contamination particles after cleaning. These results suggest that contaminating particles and the breakdown voltage that causes defects in semiconductor devices can be controlled through the optimization of the APS coating process and cleaning process.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.79-79
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• 2012

A high temperature and a low temperature plasma process technologies were developed and demonstrated for synthesis, hybrid formation, surface treatment and CVD engineering of nano powder. RF thermal plasma is used for synthesis of spherical nano particles in a diameter ranged from 10 nm to 100 nm. A variety of nano particules such as Si, Ni, has been synthesized. The diameter of the nano-particles can be controlled by RF plasma power, pressure, gas flow rate and raw material feed rate. A modified RF thermal plasma also produces nano hybrid materials with graphene. Hemispherical nano-materials such as Ag, Ni, Si, SiO2, Al2O3, size ranged from 30 to 100 nm, has been grown on graphene nanoplatelet surface. The coverage ranged from 0.1 to 0.7 has been achieved uniformly over the graphene surface. Low temperature AC plasma is developed for surface modification of nano-powder. In order to have a three dimensional and lengthy plasma treatment, a spiral type of reactor has been developed. A similar plasma reactor has been modfied for nano plasma CVD process. The reactor can be heated with halogen lamp.

• 한국진공학회지
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• 제14권2호
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• pp.84-90
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• 2005

분자선에피를 이용한 $In_{0.2}Ga_{0.8}N/GaN$ 이종접합 구조의 에피성장에 미치는 플라즈마의 rf전력의 영향에 대해 고찰하였다. 플라즈마를 발생시키는 rf 전력과 플라즈마 챔버압력의 조건에 따라 성장표면에 도달하는 분자나 원자의 에너지와 flux가 조절되어 에피성장 속도와 물질적 특성을 변화시킨다. 전력이 너무 낮거나 높은 조건에서 표면거칠기와 광특성이 각각 저하된 결과를 보였으며, 적정한 전력인 400W에서 성장한 $In_{0.2}Ga_{0.8}N/GaN$이 종접합 구조에서 날카로운 계면과 강한 photoluminescence 피크를 보였다. 이러한 현상에 대한 원인으로 고에너지 입자들이 성장표면에서 작용하는 기구들인 플라즈마에 의한 탈착과 표면확산, 성장표면의 하부에 주입되는 결함의 발생에 대하여 논하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1989년도 하계종합학술대회 논문집
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• pp.447-450
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• 1989

Single particle orbit in plasma is obtained by drift Hamiltonian formulation in magnetic coordinate. The collisional effect is implied by Monte Carlo Method and the velocity space diffusion, energy transfer to the back ground plasma and the variation of energy distribution of test particles are investigated from many particles analysis.

• 한국전기전자재료학회논문지
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• 제20권11호
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• pp.943-947
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• 2007

The effect of hydrogen and oxygen plasma treatments on the structural properties of carbon nanotube(CNT) has been systematically investigated. As the plasma power was increased, nano particles were appeared at the surface of CNTs. At high plasma power(300 Watt), the structure of CNT was changed from nanotube type to nano particles. However, in case of hydrogen plasma treatment, there was no change in microstructure of CNT. From the Raman analysis, the crystallinity of CNT was deteriorated by the plasma treatment, regardless of gas types.

• Journal of the Optical Society of Korea
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• 제20권4호
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• pp.524-529
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• 2016

Diagnostic sensors are demanded during plasma processes. Holograms of plasma taken with laser light without a reference beam were used to monitor behaviors of charged particles produced in nitrogen plasma as a function of electrode temperature ranging between 50 and 300℃. Holograms were characterized as a function of the pixel sum and grayscale value. Pixel sum calculated in identified grayscale ranges strongly correlated with ion density and emitted light intensity measured with a langmuir probe and optical emission spectroscopy, respectively. The performance was further evaluated with data acquired as a function of N₂ and NH₃ flow rates and improved correlations were observed in the new grayscale range. The confirmed correlations indicate that a hologram is a viable means to diagnose behaviors of plasma particles such as ions. Underlying principles are discussed in view of particle and charge composing vacuum and light.