• 한국염색가공학회지
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• 제16권5호
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• pp.28-34
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• 2004

The polarizing film application exploits the unique physicochemical properties between PVA(Poly vinyl alcohol) film and CTA(Cellulose triacetate) film. However, hardly any research was aimed at improving the adhesion characteristics of the CTA film by radio frequency(RF) plasma treatment at argon(Ar) gaseous state. In this report, we deal with surface treatment technology for protective CTA film developed specifically for high adhesion applications. After Ar plasma, surface of the films is analyzed by atomic force microscopy(AFM), roughness parameter and peel strength. Furthermore, the wetting properties of the CTA film were studied by contact angle analysis. Results obtained for CTA films treated with a glow discharge showed that this technique is sensitive to newly created physical functions. The roughness and peel strength value increased with an increase in treatment time for initial treatment, but showed decreasing trend for continuous treatment time. The result of contact angle measurement refer that the hydrophilicity of surface was increased. AFM studies indicated that no considerable change of surface morphology occurred up to 3 minutes of treatment time, but a considerable uneven of surface structure resulted from treating time after 5 minutes.

• 한국전기전자재료학회논문지
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• 제18권8호
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• pp.696-701
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• 2005

This paper was investigated the changes of surface properties of high-temperature-vulcanized (HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone rubber surface by oxygen plasma were accessed using Fourier transform infrared spectroscopy(FTIR), X-ray photoelectron spectroscopy(XPS), contact angle and Surface Roughness Tester. The results of the chemical analysis Showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx, x=$3\~4$) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized (HTV) semiconductive silicone rubber also, Surface roughness was increased with cleavage of side-chains and oxidation process, it confirmed change as the SEM. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.

• Biomolecules & Therapeutics
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• 제22권6호
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• pp.477-490
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• 2014

Non-thermal atmospheric-pressure plasma, also named cold plasma, is defined as a partly ionized gas. Therefore, it cannot be equated with plasma from blood; it is not biological in nature. Non-thermal atmospheric-pressure plasma is a new innovative approach in medicine not only for the treatment of wounds, but with a wide-range of other applications, as e.g. topical treatment of other skin diseases with microbial involvement or treatment of cancer diseases. This review emphasizes plasma effects on wound healing. Non-thermal atmospheric-pressure plasma can support wound healing by its antiseptic effects, by stimulation of proliferation and migration of wound relating skin cells, by activation or inhibition of integrin receptors on the cell surface or by its pro-angiogenic effect. We summarize the effects of plasma on eukaryotic cells, especially on keratinocytes in terms of viability, proliferation, DNA, adhesion molecules and angiogenesis together with the role of reactive oxygen species and other components of plasma. The outcome of first clinical trials regarding wound healing is pointed out.

• 한국대기환경학회지
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• 제14권4호
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• pp.333-342
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• 1998

Plasma process has great possibilities to remove SOx, NOx simultaneously with high treatment efficiency and is expected to be suitable for small or middle plants. It was accomplished to evaluate SO2, NOx control possibility and achieve basic data to control pollutants by use of Surface Discharge Induced Plasma Chemical Process (SPCP) in this study. O3 generation characteristics by discharge of a plate was proportional to O2 concentration and power consumption and inversely proportional to temperature and humidity, In case of dry air, NOx was highly generated by N2 and O2 in air during the plasma discharge process but it was decreased considerably as H2O was added. SO2 removal efficiency was very high, and removal rate was 170,350 mEA at 30,50 watt respectively in flue gas which is usually contain HIO. NOx removal efficiency was about 57% at 40 watt power consumption with 7.5% humidity. It is estimated that H2O has an important role in reaction mechanism with pollutants according to plasma discharge.

• 한국진공학회지
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• 제11권3호
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• pp.171-175
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• 2002

Indium-Tin-Oxide(ITO)에 대해 산소 플라즈마 처리를 한 후 일함수에 대한 변화를 $\gamma$-집속 이온빔을 사용하여 조사하였다. ITO의 표면이 산소 플라즈마 처리를 보다 많이 경험할수록 표면저항이나 일함수는 높아졌다. Auger 전자 분광법을 이용해 표면의 화학적 분석을 해본 결과 산소는 증가한 반면 주석은 감소하였다. 표면 일함수와 표면 저항의 증가는 ITO 표면에서의 산소와 주석의 변화와 관계가 있는 것으로 여겨진다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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• pp.141-143
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• 1994

One of the Principal problems encountered in the use of filer reinforced composites is to establish an active fiber surface to achieve maximum adhesion between resin and fiber surface. Now, we want to develope new process that will overcome the disadvantage of the chemical coupling agent and achieve maximum adhesion at the interface between resin and fiber by active plasma treatment on the glass fiber surface. In this study. we investigated the effect of plasma treatment on the wettability of glans surface .

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.337-337
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• 2012

Dye sensitized solar cell (DSSC) having high efficiency with low cost was first reported by Gr$\ddot{a}$tzel et al. Many DSSC research groups attempt to enhance energy conversion efficiency by modifying the dye, electrolyte, Pt-coated electrode, and $TiO_2$ films. However, there are still some problems against realization of high-sensitivity DSSC such as the recombination of injected electrons in conduction band and the limited adsorption of dye on $TiO_2$ surface. The surface of $TiO_2$ is very important for improving hydrophilic property and dye adsorption on its surface. In this paper, we report a very efficient method to improve the efficiency and stability of DSSC with nano-structured $TiO_2$. Atmospheric plasma system was utilized for nitrogen plasma treatment on nano-structured $TiO_2$ film. We confirmed that the efficiency of DSSC was significantly dependent on plasma power. Relative in the $TiO_2$ surface change and characteristics after plasma was investigated by various analysis methods. The structure of $TiO_2$ films was examined by X-ray diffraction (XRD). The morphology of $TiO_2$ films was observed using a field emission scanning electron microscope (FE-SEM). The surface elemental composition was determined using X-ray photoelectron spectroscopy (XPS). Each of plasma power differently affected conversion efficiency of DSSC with plasma-treated $TiO_2$ compared to untreated DSSC under AM 1.5 G spectral illumination of $100mWcm^{-2}$.

• 한국전기전자재료학회논문지
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• 제21권2호
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• pp.111-117
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• 2008

We have studied surface roughness, contamination of impurity, bonding with some gas element, reflectance and zeta potential on masks to be generated or changed during photolithography/dry or wet etching process. Mask surface roughness was not changed after photolithography/dry etching process. But surface roughness was changed on some area under MoSi film of Cr/MoSi/Qz. There was not detected any impurity on mask surface after plasma dry etching process. Reflectance of mask was increased after variable plasma etching treatment, especially when mask was treated with plasma including $O_2$ gas. Blank mask was positively charged when the mask was treated with Cr plasma etching gas($Cl_2:250$ sccm/He:20 $sccm/O_2:29$ seem, source power:100 W/bias power:20 W, 300 sec). But this positive charge was changed to negative charge when the mask was treated with $CF_4$ gas for MoSi plasma etching, resulting better wet cleaning. There was appeared with negative charge on MoSi/Qz mask treated with Cr plasma etching process condition, and this mask was measured with more negative after SC-1 wet cleaning process, resulting better wet cleaning. This mask was charged with positive after treatment with $O_2$ plasma again, resulting bad wet cleaning condition.

• 폴리머
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• 제29권6호
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• pp.581-587
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• 2005

상업용 폴리우레탄(PU) 필름의 표면 개질 목적으로 대기압에서 플라스마를 발생시키기 위한 dielectric barrier discharge(DBD) 구조의 평판형 플라스마 반응기 내에서 이온화된 아르곤 플라스마를 사용하였다. 플라스마 처리 공정변수인 처리 시간, 처리 RF-power, 아르곤 가스 유속을 변화시켜가며 접촉각을 측정하여 젖음성과 표면 자유 에너지 변화를 알아보았고, 필름 표면 위에 과산화물을 최대로 도입시키기 위해 플라스마 처리 공정변수를 최적화하였다. 대기압 플라스마 처리 시간 70초, RF-power 120 W, 아르곤 가스유속 6 liter per minute(LPM)에서 가장 높은 젖음성과 표면 자유 에너지 값을 보였고, 1,1-diphenyl-2-picrylhydrazy(DPPH) 법을 사용하여 PU 필름의 표면에 생성된 과산화물의 농도를 정량한 결과, 처리 시간 30초, RF-power 80 W, 아르곤 가스유속 6 LPM의 플라스마 처리 조건에서 최대 2.1 nmol/$\cm^{2}$의 과산화물이 생성되었다.

• 한국진공학회지
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• 제19권5호
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• pp.326-330
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• 2010

Plasma electrolyte oxidation (PEO) 표면처리된 Mg 합금을 scanning electron microscopy (SEM) 방법으로 표면에 형성된 산화 막을 조사 분석하였다. 측정은 상온에서 수행하였다. Burning 및 PEO 방식의 표면처리 방법을 통해 제작 된 시료의 산화막을 SEM, EDS 및 I-V 측정을 통해 분석하였다. 그 결과 burning 방식의 표면처리가 PEO보다 내식성이 떨어지는 단점이 있지만, 전도성이 부여되는 결과를 나타낸다.