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http://dx.doi.org/10.4313/JKEM.2005.18.8.696

Changes of Surface Properties by Plasma Treatment on the Surface of Semiconductive Silicone Rubber  

Lee, Ki-Taek (인하대학교 전기공학과)
Huh, Chang-Su (인하대학교 전기공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.18, no.8, 2005 , pp. 696-701 More about this Journal
Abstract
This paper was investigated the changes of surface properties of high-temperature-vulcanized (HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone rubber surface by oxygen plasma were accessed using Fourier transform infrared spectroscopy(FTIR), X-ray photoelectron spectroscopy(XPS), contact angle and Surface Roughness Tester. The results of the chemical analysis Showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx, x=$3\~4$) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized (HTV) semiconductive silicone rubber also, Surface roughness was increased with cleavage of side-chains and oxidation process, it confirmed change as the SEM. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.
Keywords
Silicone rubber; Plasma discharge; Surface energy;
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