• Transactions of the Korean Society of Mechanical Engineers A
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• v.31 no.6 s.261
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• pp.679-685
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• 2007

Superhydrophobic surface, with a water contact angle greater than $150^{\circ}$, has a self-cleaning effect termed 'Lotus effect'. This surface is created by the combination of rough surface and the low surface energy. We proposed square pillar and square shapes to control surface roughness. Microstructure arrays are fabricated by DRIE(Deep Reactive Ion Etching) process and followed by PPFC(Plasma Polymerized Fluorocarbon) deposition. On the experimental result, contact angle at square pillar arrays is well matched with Cassie's model and largest contact angle is $173.37^{\circ}$. But contact angle of square pore shape arrays is lower than Cassie's theoretical contact angle about $5{\sim}10%$. Nevertheless, square pore arrays have more rigidity than square pillar arrays.

• Proceedings of the KAIS Fall Conference
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• 2004.11a
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• pp.103-106
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• 2004

플라스틱 무선부품에서 발생하는 전자파를 차폐하기 위한 도금연구를 하였다. ABS 수지상에 습식도금법과 기상도금법을 이용하여 전기전도도가 우수한 Ag를 도금하였다. Sputtering공정시 압력, 시간, 전력이 증가함에 따라 Ag 입자가 조대화되고 증착속도가 증가되었다. 그리고 탈지 후 plasma, 탈지 후 Etching, 인가 전력 70W$\~$110W, 증착압력 4×10-2torr이하, 증착시간 5min$\~$6min에서 5B의 밀착력과 100dB 이상의 차폐효과가 계산되었다. 무전해 Ag 도금의 경우 최고 0.47$\mu$m/min의 도금속도와 plasma를 이용한 도금 전처리가 깨끗한 도금표면을 나타냈고 모든 조건에서 5B의 밀착력을 나타냈으며 100dB 이상의 차폐효과가 계산되었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.29-32
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• 2000

Cerium oxide thin film has been proposed as a buffer layer between the ferroelectric film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS ) structures for ferroelectric random access memory (FRAM) applications. In this study, CeO$_2$ thin films were etched with Cl$_2$/Ar gas combination in an inductively coupled plasma (ICP). The highest etch rate of CeO$_2$ film is 230 $\AA$/min at Cl$_2$/(Cl$_2$+Ar) gas mixing ratio of 0.2. This result confirms that CeO$_2$ thin film is dominantly etched by Ar ions bombardment and is assisted by chemical reaction of Cl radicals. The selectivity of CeO$_2$ to YMnO$_3$ was 1.83. As a XPS analysis, the surface of etched CeO$_2$ thin films was existed in Ce-Cl bond by chemical reaction between Ce and Cl. The results of XPS analysis were confirmed by SIMS analysis. The existence of Ce-Cl bonding was proven at 176.15 (a.m.u.).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.21-24
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• 2000

Ferroelectric YMnO$_3$ thin films are excellent dielectric materials for high integrated ferroelectric random access memory (FRAM) with metal-ferroelectric-silicon field effect transistor (MFSFET) structure. In this study, YMnO$_3$ thin films were etched with C1$_2$/Ar gas chemistries in inductively coupled plasma (ICP). The maximum etch rate of YMnO$_3$ thin films is 285 $\AA$/min under C1$_2$/Ar of 10/0, 600 W/-200 V and 15 mTorr. The selectivities of YMnO$_3$ over CeO$_2$ and $Y_2$O$_3$ are 2.85, 1.72, respectively. The results of x-ray photoelectron spectroscopy (XPS) reflect that Y is removed dominantly by chemical reaction between Y and Cl, while Mn is removed more effective by Ar ion bombardment than chemical reaction. The results of secondary ion mass spectrometer (SIMS) were equal to these of XPS. The etch profile of the etched YMnO$_3$ film is approximately 65$^{\circ}$and free of residues at the sidewall.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1382-1383
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• 2006

ZnO 박막은 wide band gap(Eg=3.37eV)의 derect band gap을 갖고 있기 때문에 여러 소자로의 응용가능성에 큰 기대를 하고 있는 물질이다. 본 논문에서는 소자 제조과정에서 요구되는 ZnO 박막의 식각변수에 따른 식각율과 식각특성에 관하여 연구하였으며 Inductively coupled plasma(ICP)를 사용하여 $BCl_3$/Ar 가스를 혼합하여 식각을 하였다. $BCl_3$/Ar=8/2 플라즈마에서 화학적 식각의 도움을 받아 ZnO 박막의 식각률은 1724 ${\AA}/min$ 로 최고를 보였으며 이때의 공정 조건은 800 W 의 RF power, 400 W 의 bias power, 1 Pa 의 공정 압력이었다. 식각시에 플라즈마 내부의 이온 거동상태를 측정하기위해 quadrupolemass spectrometer(QMS)를 사용하여 분석하였고 식각후 ZnO 박막의 식각률은 surface profiler(KLA fencer, ${\alpha}$-step 500)을 이용하여 측정하고 ZnO 박막과 B, Cl 라디칼과의 표면 반응 상태를 고찰하기 위하여 식각된 ZnO 박막의 표면을 X-ray photoelectron spectroscopy(XPS)로 분석하였다. XPS를 통하여 ZnO 박막과 Cl 라디칼과 반응을 하여 식각된다는 것과 낮은 휘발성으로 인하여 Ar 이온에 의한 스퍼터링 효과의 도움에 의해서 식각이 진행됨을 확인하였다.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1333-1334
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• 2007

Al thin film was the most popular electrode in semiconductor and flat panel display world, because of its electrical conductivity, selectivity and easy to apply to thin film. However, Al thin films were not good to use on the bottom electrode about the crystalline growth of inorganic compound materials such as ZnO, AlN and GaN, because of its surface roughness and melting points. In this paper, we investigated Ar plasma surface treatment of Al thin film to enhance the surface roughness and electrical conductivity using the reactive ion etching system. Several process conditions such as RF power, working pressure and process time were controlled. In results, the surface roughness showed $15.53\;{\AA}$ when RF power was 100 W, working pressure was 50 mTorr and process time was 10 min. Also, we tried to deposit ZnO thin films on the each Al thin films, the upper conditions showed the best crystalline characteristics by x-ray diffraction.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.405-405
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• 2010

Thermocouple 을 통해 Inductively coupled plasma 에 노출된 실리콘 기판 표면온도를 공정조건 변화 에 따라 실시간 (in-situ) 측정하였다. 이를 바탕으로 공정변화에 따른 플라즈마 내 활성종의 거동을 연구하였다. 더 나아가 기판의 표면온도변화 및 활성종의 거동해석을 토대로 공정변화에 의한 딥 실리콘 구조형성 메커니즘을 해석하였다. 플라즈마에 노출된 기판표면 온도를 상승시키는 주 활성종은 positive ion 이며 ICP power, Bias power, 플라즈마 압력 변화에 따라 positive ion 의 밀도 및 가속에너지가 변화하는데 이러한 거동변화는 기판의 표면온도를 변화시킴을 알 수 있었다. 딥 실리콘 구조의 측벽 및 바닥에 형성되어 있는 passivaiton layer 즉 $SiO_xF_y$(silicon oxyflouride) 는 온도에 매우 민감한 물질이며 이는 딥 실리콘 구조 내부로 입사하는 positive ion 거동변화에 따라 그 성질이 변화하여 deep Si 구조 형상을 변화시킴을 알 수 있었다. 기판표면 온도가 $0^{\circ}C$ 이하의 극저온으로 유지된 상황에서 플라즈마를 방전할 경우 positive ions 의 가속에너지로 인해 기판표면온도가 상승하며 액화질소 유량증가를 통해 다시 기판의 표면온도를 유지시킬 수 있었다. 이를 통해 플라즈마 방전 전과 방전 후의 기판 표면온도는 상온의 기판뿐만 아니라 극저온의 기판에서도 다름을 알 수 있었다. 냉각환경 변화에 따른 딥 실리콘 구조형성 메커니즘을 positive ions 거동 그리고 온도 감소에 의한 $SiO_xF_y$ 성질 변화를 이용해 해석할 수 있었다.

• Journal of the Semiconductor & Display Technology
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• v.16 no.2
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• pp.55-60
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• 2017

The supercritical $CO_2$ (sc-$CO_2$) mixture and the sc-$CO_2$-based Photoresist(PR) stripping(SCPS) process were applied to the removal of the post etch/ash PR residue on aluminum patterned wafers and the results were observed by scanning of electron microscope(SEM). In the case of MDII wafers, the carbonized PR was able to be effectively removed without pre-stripping by oxygen plasma ashing by using sc-$CO_2$ mixture containing the optimum formulated additives at the proper pressure and temperature, and the same result was also able to be obtained in the case of HDII wafer. It was found that the efficiency of SCPS of ion implanted wafer improved as the temperature of SCPS was high, so a very large amount of MEA in the sc-$CO_2$ mixture could be reduced if the temperature could be increased at condition that a process permits, and the ion implanted photoresist(IIP) on the wafer was able to be removed completely without pre-treatment of plasma ashing by using the only 1 step SCPS process. By using SCPS process, PR polymers formed on sidewalls of metal conductive layers such as aluminum films, titanium and titanium nitride films by dry etching and ashing processes were removed effectively with the minimization of the corrosion of the metal conductive layers.

• Applied Chemistry for Engineering
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• v.30 no.6
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• pp.719-725
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• 2019

In this study, activated carbon fibers were treated with oxygen plasma to investigate gas sensing properties of the dimethyl methylphosphonate (DMMP), which is a simulant gas of the chemical warfare agent, according to oxygen functional group contents. As the flow rate of oxygen plasma treatment increased, oxygen groups were introduced to the surface of activated carbon fibers from 6.90 up to 36.6%, increasing the -OH group which influences the DMMP gas sensing properties. However, as the flow rate of oxygen plasma increases, the specific surface area tends to decrease because etching on the surface of activated carbon fibers occurs due to active species generated during the oxygen plasma treatment. The resistance change rate of the DMMP gas sensor increased from 4.2 up to 25.1% as the oxygen plasma treatment flow rate increased. This is attributed to the hydrogen bonding between DMMP gas and introduced hydroxyl functional group on activated carbon fibers by the oxygen plasma treatment. Therefore, the oxygen plasma is considered to be one of the important surface treatment methods for detecting chemical warfare agents at room temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.237.1-237.1
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• 2014

Etching is one of the most important steps in semiconductor manufacturing. In etch process control a critical task is to stop the etch process when the layer to be etched has been removed. If the etch process is allowed to continue beyond this time, the material gets over-etched and the lower layer is partially removed. On the other hand if the etch process is stopped too early, part of the layer to be etched still remains, called under-etched. Endpoint detection (EPD) is used to detect the most accurate time to stop the etch process in order to avoid over or under etch. The goal of this research is to develop a hardware and software system for EPD. The hardware consists of an Optical Plasma Monitor (OPM) sensor which is used to continuously monitor the plasma optical emission intensity during the etch process. The OPM software was developed to acquire and analyze the data to perform EPD. Our EPD algorithm is based on the following theory. As the etch process starts the plasma generated in the vacuum is added with the by-products from the etch reactions on the layer being etched. As the endpoint reaches and the layer gets completely removed the plasma constituents change gradually changing the optical intensity of the plasma. Although the change in optical intensity is not apparent, the difference in the plasma constituents when the endpoint has reached leaves a unique signature in the data gathered. Though not detectable in time domain, this signature could be obscured in the frequency spectrum of the data. By filtering and analysis of the changes in the frequency spectrum before and after the endpoint we could extract this signature. In order to do that, first, the EPD algorithm converts the time series signal into frequency domain. Next the noise in the frequency spectrum is removed to look for the useful frequency constituents of the data. Once these useful frequencies have been selected, they are monitored continuously in time and using a sub-algorithm the endpoint is detected when significant changes are observed in those signals. The experiment consisted of three kinds of etch processes; ashing, SiO2 on Si etch and metal on Si etch to develop and evaluate the EPD system.