分子線에피택셜 方法으로 成長한 I $n_{0.53}$ GaTEX>$_{0.47}$As/InTEX>$_{0.52}$AlTEX>$_{0.48}$As/InP P-HEMT 構造內의 V 및 X字形 缺陷에 關한 硏究
(A study on the V and X shpe defects in I $n_{0.53}$ GaTEX>$_{0.47}$As/InTEX>$_{0.52}$AlTEX>$_{0.48}$As/InP P-HEMT structure grown by molecular beam epitaxy method)
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- 전자공학회논문지D
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- 제34D권7호
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- pp.56-61
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- 1997