• 전자공학회논문지A
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• 제29A권7호
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• pp.73-81
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• 1992

We have investigated the thermal reaction property and the oxygen behavior of TiN/Ti/Si structure after different hear treatments using x-ray photoelectron spectroscopy and cross-sectional transmission electron microscopy measurements. During the heat treatment in N$_2$ amibient, the considerable amount of oxygen atoms incorporates into TiN/Ti/Si Structures. It is found that oxygen atoms pile up at the top surface of TiN and TiN/Ti interface, forming a compound of TiO$_2$ above $600^{\circ}C$. Inside the TiN film, the oxygen content increases as the annealing temperature increases, mostly TiO and Ti$_2$O$_3$ rather than thermodynamically stable TiO$_2$. Above the annealing temperature of 55$0^{\circ}C$, the TiSi$_2$ formation has initiated. One thing to note is that a severe blistering is observed in the sample annealed at $600^{\circ}C$, due to (1) the difference of thermal expansion coefficient between TiN and Si` (2) the compressive stress induced by the volume reduction caused by the Ti-Silicide grain while elevating temperatures.

• 한국수소및신에너지학회논문집
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• 제34권5호
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• pp.535-548
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• 2023

The intermittent nature of renewable energy is a challenge to overcome for safety and stable performance in water electrolysis systems linked to renewable energy. Oxygen removal using the catalyst is suitable for maintaining the oxygen concentration in hydrogen below the explosive level (4%) even in intermittent power supply. Metals such as Pd, Pt, and Ni are expected to be effective materials due to their hydrogen affinity. The oxygen removal performance was compared under high hydrogen concentration conditions by loading on γ-Al₂O₃ with high reactivity and large surface area. The characteristics of the catalyst before and after the reaction were analyzed through X-ray diffraction, transmission electron microscope, H₂-temperature programmed reduction, X-ray photoelectron spectroscope, etc. The Pd catalyst that showed the best performance was able to lower 2% oxygen to less than 5 ppm. Changes in catalyst characteristics after the reaction indicate that oxygen vacancies are related to oxygen removal performance and catalyst deactivation.

• Bulletin of the Korean Chemical Society
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• 제31권6호
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• pp.1596-1600
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• 2010

Surface functionalization of multi-walled carbon nanotubes (MWNTs) was carried out by means of acid treatment. The presence of oxygen functional groups on the surface of acid-treated MWNTs was confirmed with the aid of Fourier transform infrared spectroscopy and X-ray spectroscopy. In addition, carboxylic groups generally formed on the surface of acid-treated MWNTs, and the dispersion was increased by the duration of the acid treatment. The zeta-potential indicated the surface charge transfer and the dispersion of MWMTs. Morphological characteristics of acid-treated MWNTs were also observed using a transmission electron microscopy, X-ray diffraction, and Raman analysis, which was revealed the significantly unchanged morphologies of MWNTs by acid treatment. The hydrogen adsorption capacity of the MWNTs was evaluated by means of adsorption isotherms at 77 K/1 atm. The hydrogen storage capacity was dependent upon the acid treatment conditions and the formation of oxygen functional groups on the MWNT surfaces. The latter have an important effect on the hydrogen storage capacity.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1992년도 춘계학술대회 논문집
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• pp.117-121
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• 1992

Zinc oxide thin films were obtained from zinc acetate-2-water and oxygen by photo-CVD method. (1) The formation of ZnO films sarts from 100[$^{\circ}C$] and the deposition rate increases with increasing substrate temperature. (2) The rate of deposition was also affected by flow rates of O$_2$(reaction gas) and N$_2$(Carrier gas). (3) The deposition rate decreases with increasing O$_2$mole rate. (4) The transmission of the films was independent of oxygen mole rate and it was largely affected substrate temperature. (5) The electric resistivity of th films was largely varied at oxygen mole rate 10[%] and above 20[%], a plateau was encountered. Also, it increases with increasing substrate temperature. As the results, at substrate temperature: 200[$^{\circ}C$]; O$_2$gas mole rate:10[%]; reation time:10[min] pressure: 10$\^$-2/[atm], deposition rate; transmittance; resistivity were 780[A$\^$0/; 94[%]; 7${\times}$10$\^$-2/[$\Omega$$.$cm] respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.185-186
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• 2005

Intrinsic gettering is usually used to improve wafer quality which is an important factor for reliable ULSI devices. The two-step annealing method was adopted in order to investigate interactions between oxygens and secondary defects during oxygen precipitation process in lightly and heavily boron doped silicon wafers with high energy $^{11}B^+$ ion implantation. Secondary defects were inspected nearby the projected range by high resolution transmission electron microscopy. Oxygen pileup was measured in the vicinity of the projected range by secondary ion mass spectrometry for heavily boron doped silicon wafers.

• Journal of Ceramic Processing Research
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• 제20권4호
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• pp.388-394
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• 2019

In this study, high-purity single-walled carbon nanotubes (SWCNTs) were prepared by removing the unreacted metal constituents and amorphous carbon impurities using a post-annealing process. Unlike conventional thermal processing techniques, this technique involved different gas atmospheres for efficient removal of impurities. A heat treatment was conducted in the presence of chlorine, oxygen, and chlorine + oxygen gases. The nanotubes demonstrated the best characteristics, when the heat treatment was conducted in the presence of a mixture of chlorine and oxygen gases. The scanning electron microscopy, transmission electron microscopy, ultraviolet absorbance, and sheet resistance measurements showed that the heat treatment process efficiently removed the unreacted metal and amorphous carbon impurities from the as-synthesized SWCNTs. The high-purity SWCNTs exhibited improved electrical conductivities. Such high-purity SWCNTs can be used in various carbon composites for improving the sensitivity of gas sensors.

• 공업화학
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• 제25권6호
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• pp.645-647
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• 2014

본 연구에서는 수열합성법을 이용하여, 한단계의 과정으로 $TiO_2$와 Ru (Ruthenium)가 도입된 $TiO_2$ ($Ru_x/TiO_2$)를 합성하였다. 합성된 샘플의 결정성과 조성 및 형태를 X-ray diffraction (XRD)과 energy dispersive X-ray spectroscopy (EDS), transmission electron microscopy (TEM)를 통하여 확인하였으며, Benzyl alcohol의 Benzaldehyde로의 산화반응에 촉매로서 적용하였다. 높은 선택성을 가지는 산화반응이 진행되었으며, $TiO_2$에 도입된 Ru의 양이 증가할수록 촉매로서의 더 좋은 촉매활성을 보였다.

• 한국포장학회지
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• 제23권2호
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• pp.83-87
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• 2017

본 연구는 딸기(cv. 'Maehyang')의 모의 선박 수출 온도조건($2^{\circ}C$(10일${\sim}8^{\circ}C$(11일))에서 MA 저장에 적합한 고 산소투과율(OTR) 필름 종류 구명과 이에 따른 품질 변화를 알아보기 위해 실시하였다. MA 저장 처리는 산소투과율이 각각 1,300, 10,000, 20,000, 그리고 $30,000cc/m^2{\cdot}day{\cdot}atm$ OTR 필름으로 하였고, 관행 유통 처리는 유공 필름으로 포장한 대조구로 두었다. 저장 중 생체중 감소율은 유공 필름을 제외한 모든 MA 저장 처리에서 0.5% 미만이었다. 포장 내 이산화탄소와 산소 농도는 10,000 cc, 20,000 cc, 그리고 30,000 cc OTR 필름에서 딸기의 적정 CA/MA 조건(이산화탄소 15~20%, 산소 농도 5~10%)을 유지하였다. 에틸렌 농도는 처리간 차이를 보이지 않았다. 이취는 1,300 cc OTR 필름은 관능 평가를 통해 높은 이취와 가장 낮은 곰팡이 발생률을 보였다. 경도, 당도, 그리고 외관상 품질은 10,000 cc OTR 필름에서 가장 높게 유지되었다. 결론적으로, 10,000 cc OTR 필름은 가장 높은 품질과 관행 유통 조건보다 저장 수명을 13일 정도 연장할 수 있었다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제54권1호
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• pp.1-7
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• 2005

Thin films of vanadium oxide(VO/sub x/) were deposited by r.f. magnetron sputtering from V₂O/sub 5/ target with oxygen/(oxygen+argon) partial pressure ratio of 0% and 8% and in situ annealed in vacuum at 400℃ for 1h and 4h. Crystal structure, chemical composition, molecular structure, optical and electrical properties of films were characterized through XRD, XPS, RBS, FTIR, optical absorption and electrical conductivity measurements. The films as-deposited are amorphous, but 0%O₂ films annealed for time longer than 4h and 8% O₂ films annealed for time longer than 1h are polycrystalline. As the oxygen partial pressure is increased the films become more stoichiometric V₂O/sub 5/. When annealed at 400℃, the as-deposited films are reduced to a lower oxide. The optical transmission of the films annealed in vacuum decreases considerably than the as-deposited films and the optical absorption of all the films increases rapidly at wavelength shorter than about 550nm. Electrical conductivity and thermal activation energy are increased with increasing the annealing time and with decreasing the oxygen partial pressure.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.783-786
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• 2003

Thin films of vanadium oxide(VOx) have been deposited by r.f. magnetron sputtering from $V_2O_5$ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio of 0% and 8% is adopted. Crystal structure and optical properties of films sputter-deposited under different oxygen gas pressures and in situ annealed in vacuum at $400^{\circ}C$ for 1h and 4h are characterized through XRD and optical absorption measurements. The films as-deposited are amorphous, but $0%O_2$ films annealed for time longer than 4h and $8%O_2$ films annealed for time longer than 1h are polycrystalline. The optical transmission of the films annealed in vacuum decreases considerably than the as-deposited films and the optical absorption of all the films increases rapidly at wavelength shorter than about 550nm. Indirect and direct optical band gaps were decreased with increasing the annealing time.