• 제목/요약/키워드: Oxidation process

검색결과 2,160건 처리시간 0.026초

Frictional behaviour of Oxide Films Produced on S45C Steel by Plasma Nitrocarburizing and Post Plasma Oxidation Treatment (플라즈마 질탄화 & 후산화처리로 S45C강에 형성된 산화막의 마찰거동)

  • Jeong, Kwang-Ho;Lee, In-Sup
    • Korean Journal of Materials Research
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    • 제16권12호
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    • pp.766-770
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    • 2006
  • The frictional behavior of oxide films on top of the plasma nitrocarburized compound layers was investigated in terms of post-oxidation treatment temperatures. The post-oxidation treatment at both temperatures($400^{\circ}C,\;500^{\circ}C$) produced magnetite($Fe_3O_4$) films which led to a significant enhancement in corrosion resistance. However, this process did not result in any improvement in frictional behavior of the nitrocarburized surface. The wear mechanisms were governed predominantly by the abrasive action of the slider on the surface irrespective of the counterface material(SiC and Bearing steel). When the specimen was sliding against a SiC counterface, the oxide films were destroyed during the early stage of the sliding process and the wear debris of the oxide film at the sliding track had a great influence on the friction coefficient. On the other hand, when sliding against a bearing steel counterface, the slider was mainly worn out due to the much higher hardness of the surface hardened layer. The fluctuation of the friction coefficient of $400^{\circ}C$-oxidized/ nitrocarburized specimen is much severer than that of $500^{\circ}C$ specimen, due to the less amount of wear debris.

Effects of KanghwalSokdantang(KS) on LDL Oxidation in Macrophage Cell (대식세포의 oxLDL 생성에 미치는 강활속단탕의 영향)

  • Ko Seong-Gyu;Jeong Yong-Su;Sun Seung-Ho
    • The Journal of Internal Korean Medicine
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    • 제24권2호
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    • pp.203-212
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    • 2003
  • Objective : As a link in chain of research to confirm the oriental medical prescription which has the anti-atherosclerosis effects, this research evaluated the effects on the macrophage-related factors by using KanghwalSokdantang(KS). Methods : In order to perform this research, we have evaluated the effects on the oxLDL formation from the macrophages, the nitric oxide formation, and the oxidation of macrophages. Thus, with this evaluation, we have investigated the applicapability on the artherosclerosis. Results : KanghwalSokdantang has showed a noticeable reduction of protein oxidation in the process of oxLDL formation, has remarkably restrained phospholipid peroxidation, an index to estimated the phospholipid oxidation and reduction that are formed in the process of macrophage's oxLDL formation, and has increased the nitrite concentration noticeably in the LDL-dealing macrophages. By increasing the survival rate of macrophages, KanghwalSokdantang has restrained the cellular damages. KanghwalSokdantang is ineffective on the LDH outflow from damaged cells. $1{\mu}g/ml$ KanghwalSokdantang sample has increased acid phosphatase activity remarkably. Conclusion : KanghwalSokdantang has the possibility to be used in the prevention and treatment of atherosclerosis, which is formed by the oxLDL formation of macrophages.

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Polarographic Behavior of Oxovanadium (IV) Complex of Mercaptopyridine N-Oxide

  • Shim, Yoon-Bo;Choi, Sung-Nak
    • Bulletin of the Korean Chemical Society
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    • 제8권4호
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    • pp.225-230
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    • 1987
  • The redox properties of 2-mercaptopyridine N-oxide (mpno) and its oxovanadium complex, $VO (mpno)_2$ have been studied by the use of polarography and cyclic voltammetry. The radical anion of mpno is generated in acetone and is adsorbed to the electrode to form an adsorption wave at -0.21 V vs Ag/AgCl electrode. The normal wave appeared at -0.50 V is attributed to the formation of radical anion. The $VO (mpno)_2$ exhibits one oxidation wave at +0.57 V, and two reduction waves at -1.07 V and -1.76 V vs. Ag/AgCl electrode; the oxidation is fully reversible one-electron process ($VO (mpno)_2\;{\leftrightarrow}\;VO(mpno)_2^+ + e).$ The reduction wave at -1.07 V is quasireversible and is arised from the formation of $VO (mpno)_2^-.$ The second reduction wave at -1.76 V is irreversible and this reduction process consists of two one-electron steps. The sulfur containing ligands seem to enhance the stability of lower oxidation state of vanadium while the oxygen or nitrogen donor of the ligands stabilize the higher oxidation state of vanadium when comparisons are made among several oxovanadium complexes.

A Study on the Removal of Chloro-Phenols by Photocatalytic Oxidation (광촉매(光觸媒) 산화(酸化) 반응(反應)을 이용한 클로로페놀 분해(分解)에 관한 연구(硏究))

  • Lee, Sang Hyup;Park, Ju Seok;Park, Chung Hyun
    • Journal of Korean Society of Water and Wastewater
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    • 제9권4호
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    • pp.87-96
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    • 1995
  • The Electron/Hole Pair is generated when the activation energy produced by ultraviolet ray illuminates to the semiconductor and OH- ion produced by water photocleavage reacts with positive Hole. As a results, OH radical acting as strong oxidant is generated and then Photocatalytic oxidation reaction occurs. The photocatalytic oxidation can oxidate the non-degradable and hazardous organic substances such as pesticides and aromatic materials easier, safer and shorter than conventional water treatment process. So in this study, many factors influencing the oxidation of chlorophenols, such as inorganic electrolytes addition, change of oxygen and nitrogen atmosphere, temperature, pH, oxygen concentration, chlorophenol concentration, were throughly examined. According to the experiments observations, it is founded that the rate of chlorophenol oxidation follows a first-order reaction and the modified Langmuir-Hinshelwood relationship. And the photocatalytic oxidation occurs only when activation energy acting as Electron/Hole generation, oxygen acting as electron acceptor to prevent Electron/Hole recombination, $TiO_2$ powder acting as photocatalyst are present. The effects of variation of dissolved oxygen concentration, temperature and inorganic electrolytes concentration on 2-chlorophenol oxidation are negligible. And the lower the organic concentration, the higher the oxidation efficiency becomes. Therefore, the photocatalytic oxidation is much effective to oxidation of hazardous substances at very low concentration. The oxidation is effective in the range of 0.1 g/L-10 g/L of $TiO_2$. Finally when the ultra-violet ray is illuminated to $TiO_2$, the surface characteristics of $TiO_2$ change and Adsorption/Desorption reaction on $TiO_2$ surface occurs.

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High Temperature Oxidation Behavior of 316L Austenitic Stainless Steel Manufactured by Laser Powder Bed Fusion Process (Laser powder bed fusion 공정으로 제조된 오스테나이트계 316L 스테인레스 강의 고온 산화 거동)

  • Hwang, Yu-Jin;Wi, Dong-Yeol;Kim, Kyu-Sik;Lee, Kee-Ahn
    • Journal of Powder Materials
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    • 제28권2호
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    • pp.110-119
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    • 2021
  • In this study, the high-temperature oxidation properties of austenitic 316L stainless steel manufactured by laser powder bed fusion (LPBF) is investigated and compared with conventional 316L manufactured by hot rolling (HR). The initial microstructure of LPBF-SS316L exhibits a molten pool ~100 ㎛ in size and grains grown along the building direction. Isotropic grains (~35 ㎛) are detected in the HR-SS316L. In high-temperature oxidation tests performed at 700℃ and 900℃, LPBF-SS316L demonstrates slightly superior high-temperature oxidation resistance compared to HR-SS316L. After the initial oxidation at 700℃, shown as an increase in weight, almost no further oxidation is observed for both materials. At 900℃, the oxidation weight displays a parabolic trend and both materials exhibit similar behavior. However, at 1100℃, LPBF-SS316L oxidizes in a parabolic manner, but HR-SS316L shows a breakaway oxidation behavior. The oxide layers of LPBF-SS316L and HR-SS316L are mainly composed of Cr2O3, Fe-based oxides, and spinel phases. In LPBF-SS316L, a uniform Cr depletion region is observed, whereas a Cr depletion region appears at the grain boundary in HR-SS316L. It is evident from the results that the microstructure and the high-temperature oxidation characteristics and behavior are related.

Effects of Oxidation Process on Thermal Properties of Petroleum-based Isotropic Pitch (산화 공정이 석유계 등방성 피치의 열거동 특성에 미치는 영향)

  • Lee, Namji;Seo, Sang Wan;Kwak, Cheol Hwan;Kim, Min Il;Im, Ji Sun
    • Applied Chemistry for Engineering
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    • 제31권1호
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    • pp.36-42
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    • 2020
  • In order to investigate the effect of the oxidation process on thermal properties of the pitch, the oxidized pitch was prepared by changing the oxidation temperature. Thermal properties of the pitch were analyzed using thermogravimetric analysis (TGA), and it divided into three sections as A (25~100 ℃), B (250~550 ℃) and C (550~800 ℃) by derivative thermogravimetry (DTG) graph behavior. In the A section, the was reduced because the moisture contained in the pitch was removed. In the B section, as the oxidation temperature increased, the thermal stability of the pitch is improved. Because the degree of aromaticity and molecular weight of the pitch increased with increasing oxidation temperature. In contrast, the results of the C section were shown opposite of B section. Because the introduced C-OH, C-O-C, and C=O bonds were decomposed, and the resulting oxygen compounds induced the combustion reaction of the pitch.

Effects of Nitrate Ions on Advanced Oxidation of UV/H2O2 for 2,4-Dichlomphenol Degradation (UV/H2O2를 이용한 2,4-DCP의 산화에 NO3- 이온이 미치는 영향)

  • Park, Jae Han;Lee, Ji Yong;Ahn, Yoon Hee;Moon, Tae Hoon;Yim, Sung Kyun;Ko, Kwang Baik
    • Journal of Korean Society on Water Environment
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    • 제23권3호
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    • pp.319-323
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    • 2007
  • The Advanced Oxidation Process (AOP) is being increasingly used to oxidize complex organic constituents in treated effluents from domestic wastewater treatment plants. Generally, ${NO_3}^--N$ concentrations ranges between 5 and 8 mg/L for biologically well-treated effluents. However, nitrate ions, ${NO_3}^-$, affects on oxidation as not only a well-known strong absorber of UV light below 250 nm of wavelength but also as an OH radical scavenger. The objective of this study was to evaluate the AOP systems for degradation of 2,4-DCP, and to delineate the effect of nitrate ions on UV oxidation of 2,4-DCP by conducting a bench-scale operation at various reaction times and initial concentrations of $H_2O_2$. The experimental results indicated that 2,4-DCP could be completely oxidized by $UV/H_2O_2$ process with an initial $H_2O_2$ concentration of 20 mg/L at a retention time of 1.0 min or longer. Nitrate ions did not show any adverse effect on 2,4-DCP oxidation at this high $H_2O_2$ concentration, and the practical initial $H_2O_2$ concentration and reaction time for the 80% oxidation turned out to be 5 mg/L and 1.0 min, respectively.

Effect of Oxidation on Hot Ductility Behavior of Plain Carbon Steel (탄소강의 열간연성 거동에 미치는 산화의 영향)

  • Park, Tae Eun;Lee, Un Hae;Sohn, Kwang Suk;Lee, Sung Keun;Kim, In Soo;Yim, Chang Hee;Kim, Donggyu
    • Korean Journal of Metals and Materials
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    • 제48권5호
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    • pp.394-400
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    • 2010
  • The effects of oxidation behavior on the hot ductility of plain carbon steels were investigated at various temperatures in order to simulate the continuous casting process more precisely, in which the process undergoes in air atmosphere rather than Ar atmosphere. The high temperature oxidation behavior and scale morphology of the carbon steels exposed to the air and Ar atmosphere at various temperatures were also investigated in order to assess the mechanism of the RA value decreasing in an air atmosphere. The RA values obtained from the air atmosphere were marked below 45% by the test temperature, except for over 1000${^{\circ}C}$, with the RA values remaining in low values in both the low and high temperature region, at which the RA values generally recovered in the Ar atmosphere. The surface roughness of the specimen was developed by external and internal oxidation when the specimen was deformed in an air atmosphere at high temperature, with the result being the stress concentrated at the roughness of the specimen surface, resulting in low RA values. The hot ductility in the air atmosphere was found to be likely controlled by the oxidation rate instead of the microstructures corresponding to test temperatures.

Photocatalytic Oxidation of Free Cyanide Using UV LED (자외선 LED를 이용한 자유 시안의 광촉매 산화)

  • Kim, Seong Hee;Seol, Jeong Woo;Lee, Woo Chun;Lee, Sang-Woo;Kim, Soon-Oh
    • Journal of Korean Society of Environmental Engineers
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    • 제37권1호
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    • pp.34-44
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    • 2015
  • This study was initiated to remove free cyanide from wastewater using the process of photocatalytic oxidation. UV lamp has been extensively used as a light source in conventional photocatalytic oxidation, but numerous drawbacks of UV lamp have been raised so far. Thus, this study focused on evaluating the applicability of UV LED as an alternative light source to overcome the drawbacks of UV lamp. Furthermore, the effects of diverse operational parameters on the performance of process were investigated. The results demonstrated the applicability of UV LED as a substitute of UV lamp. Also, the results show that the performance of process was improved by the increase in the number of UV LEDs used. To acquire economic feasibility as well as high efficacy, however, it is required to determine the optimum number of UV LED prior to practical implementation of the process. Among the three types of photocatalysts (anatase, rutile, and Degussa P25) tested, the Degussa P25 showed the greatest performance, and it was proven that the process was not improved as much as the Degussa P25 through simple mixing of anatase and rutile without any pretreatment. In addition, the removal efficiency of free cyanide appeared to be increased with the decrease in the particle size of $TiO_2$ photocatalyst. Besides, the process was enhanced with injection of oxygen which is considered as a major electron acceptor in the photocatalytic oxidation.

Small Molecular Organic Nonvolatile Memory Cells Fabricated with in Situ O2 Plasma Oxidation

  • Seo, Sung-Ho;Nam, Woo-Sik;Park, Jea-Gun
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제8권1호
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    • pp.40-45
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    • 2008
  • We developed small molecular organic nonvolatile $4F^2$ memory cells using metal layer evaporation followed by $O_2$ plasma oxidation. Our memory cells sandwich an upper ${\alpha}$-NPD layer, Al nanocrystals surrounded by $Al_2O_3$, and a bottom ${\alpha}$-NPD layer between top and bottom electrodes. Their nonvolatile memory characteristics are excellent: the $V_{th},\;V_p$ (program), $V_e$ (erase), memory margin ($I_{on}/I_{off}$), data retention time, and erase and program endurance were 2.6 V, 5.3 V, 8.5 V, ${\approx}1.5{\times}10^2,\;1{\times}10^5s$, and $1{\times}10^3$ cycles, respectively. They also demonstrated symmetrical current versus voltage characteristics and a reversible erase and program process, indicating potential for terabit-level nonvolatile memory.