• 대한기계학회논문집
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• 제16권6호
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• pp.1030-1035
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• 1992

본 연구에서는 측정의 자동화 용도로 사용될 수 있는 광삼각법(optical tria- ngulation method)에 의한 비접촉방식의 광학센서에 대한 기본연구 결과를 서술하였 다. 세부적으로 광삼각 비접촉 측정의 기본원리를 제시하고 측정 범위 및 분해능 관 점에서의 센서설계의 기본방법을 제시하였다. 최종적으로 실제적인 센서의 설계제작 과정과 세제품의 성능실험의 결과를 기술하였다.

• 반도체디스플레이기술학회지
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• 제18권2호
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• pp.58-62
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• 2019

Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.

• 한국광학회지
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• 제28권4호
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• pp.146-152
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• 2017

우주용 인공위성 카메라를 구성하는 반사경의 정렬은 광학계의 고분해능, 고성능을 얻기 위한 중요한 과정 중 하나이다. 반사경들의 상호정렬에는 큐브미러(cube mirror)가 대신 사용되기 때문에, 각 반사경과 해당 큐브미러 간의 상호위치관계 정보가 우선 필요하다. 따라서 우주용 카메라 반사경들의 정렬을 위해 각 반사경의 정점과 해당 큐브미러의 상대 좌표값을 정확하게 측정해야하며, 본 논문에서는 컴퓨터 제작 홀로그램(computer-generated hologram, CGH)의 정렬용 세그먼트와 광섬유를 이용하는 새로운 측정 시스템을 제안함으로써 우주용 카메라를 구성하는 반사경의 정점을 요구조건 이내로 측정할 수 있었다. 측정 시스템은 광학계 평가용 간섭계, CGH, 광섬유, 반사경으로 구성되어 있으며, 최종적으로 데오도라이트를 이용해 큐브미러를 기준으로 주 반사경의 정점에 위치한 광섬유 끝단의 3차원 상대 좌표값을 $25{\mu}m$ 이하의 정밀도로 측정할 수 있었다.

• Journal of the Optical Society of Korea
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• 제16권3호
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• pp.277-281
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• 2012

We measured small optical beam deflection in an image rotating Sagnac interferometer. We used a weak value measurement scheme that involves a pre-selection, weak perturbation, and a post-selection procedure to obtain the amplified value of beam deflection. The amplification factor of the measured beam deflection varied from 11 to 63 depending on the settings of the post-selection polarizer in front of the photodetector and the settings of polarization compensator in the interferometer.

• 한국정밀공학회지
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• 제23권8호
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• pp.72-79
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• 2006

We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 춘계학술대회 논문집
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• pp.249-250
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• 2009

• 한국정밀공학회지
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• 제21권1호
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• pp.40-45
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• 2004

Recently, aspheric optical lenses and mirrors, which are harder to manufacture and measure than the conventional spherical ones, are widely used, particularly in electronic fabrication process. Generally, interferometric optical method is used for the measurement of spherical optical surface. However, the interferometric method for aspheric surface measurement is difficult because it needs a precise null corrector and strict environmental conditions such as constant temperature, humidity and vibrations. We have been studied on the manufacturing of aspheric optics to improve the surface profile accuracy and productivity using a corrective polishing process. For the corrective polishing, a practical method of On-Machine Measurement (OMM) is required. For this purpose, an optical OMM system has been studied using the Shach-Hartmann test, which is very robust to the practical polishing environment. The wavefront has been reconstructed from the measured data using the primary aberration polynomial function by the least squares fitting. The measured result of the OMM system shows that the maximum deviation is less than 200 nm for the one of commercial Fizeau interferometer Wyko 6000.

• 한국정밀공학회지
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• 제18권8호
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• pp.40-47
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• 2001

Optical measurement methods make it possible to detect object displacements with high resolution and noncontact measurements. Also, they are very robust against EMI noises and have long operation range. An optical triangulation sensor is one of widely used displacement measurement sensors for its sub-micron resolution, fast response, simple structure, and low cost. However. there are several errors caused by inclinations of a surface. speckle effects, power fluctuations of light sources, and noises of detectors. In this paper, in order to minimize error effects, we performed error analysis and proposed a new structure. Then, we setup a new modeling method and verify it through simulations and experiments. Based on the new model. we propose a new sensor structure and establish design criteria. Finally, we design a signal processing system to overcome a resolution-limited problem of light detectors. The resolution of the proposed system is 0.2${\mu}{\textrm}{m}$ in 5mm operating range.

• 센서학회지
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• 제31권6호
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• pp.441-447
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• 2022

This study describes a novel method for detecting and measuring partial discharge (PD) on an electrical facility such as an insulated power cable or switchgear using fiber optic sensing technology, and a distributed acoustic sensing (DAS) system. This method has distinct advantages over traditional PD sensing techniques based on an electrical method, including immunity to electromagnetic interference (EMI), long range detection, simultaneous detection for multiple points, and exact location. In this study, we present a DAS system for PD detection with performance evaluation and experimental results in a simulated environment. The results show that the system can be applied to PD detection.

• 한국전산구조공학회:학술대회논문집
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• 한국전산구조공학회 2003년도 가을 학술발표회 논문집
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• pp.556-565
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• 2003

Light losses in optical fibers are investigated by a fiber optic OTDR (Optical Time Domain Reflectometry) sensor system to develop fiber optic probes for structural displacement measurement. The displacement sensitivity was determined by the measurements of fiber-bending loss according to the gage length changes of the displacement sensor. The fiber optic displacement probe was manufactured to verify the feasibility of the structural displacement measurement.