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Process Study of Direct Laser Lithographic System for Fabricating Diffractive Optical Elements with Various Patterns  

Kim, Young-Gwang (Department of science and Measurement, University of Science and Technology (UST))
Rhee, Hyug-Gyo (Department of science and Measurement, University of Science and Technology (UST))
Ghim, Young-Sik (Department of science and Measurement, University of Science and Technology (UST))
Lee, Yun-Woo (Space Optics Team, Advanced Instrumentation Institute, Korea Research Institute of Standards and Science (KRISS))
Publication Information
Journal of the Semiconductor & Display Technology / v.18, no.2, 2019 , pp. 58-62 More about this Journal
Abstract
Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.
Keywords
Direct Laser Lithography; Laser Writing System. Diffractive Optical Elements; Computer Generated Hologram; Micro-Patterning;
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1 Takahisa ANDO, Toshiaki MATSUMOTO, Hideya Takahashi and Eiji SHIMIZU, " Head mounted display for mixed reality using holographic optical elements," Mem., Fac. Eng., Vol. 40, pp. 1-6, 1999.
2 Guoguang Yang, "An optical pickup using a diffractive optical element for a high-density optial disc," Opt. Communications, Vol. 159(1-3), pp. 19-22, 1999.   DOI
3 H. J. Tiziani, S. Reichelt, C. Pruss, M. Rocktaeschel and U. Hofbauer, "Testing of aspheric surfaces," in Proceeding of SPIE, Vol. 4440, pp. 109-119, 2001.
4 Jean-Michel Asfour and Alexander G. Poleshchuk, "Asphere testing with a Fizeau interferometer based on a combined computer-generated hologram," J. Opt. Soc. America A, Vol. 23(1), pp. 172-178, 2006.   DOI
5 Makoto OkaiShinji TsujiAkio OhishiMotohisa Hirao Hiroyoshi MatsumuraTatsuo HaradaToshiaki KitaHideki Taira, "Optical device diffraction gratings and a photomask for use in the same," US patent, US5340637A, 1994.
6 C. Vieu, F. Carcenac, A. Pépin, Y. Chen, M. Mejias, A. LebibL., Manin-Ferlazzo, L. Couraud, and H. Launois, "Electron beam lithography: resolution limits and applications," Appl. Surface Science, Vol. 164(1-4), pp. 111-117, 2000.   DOI
7 A.A. Tseng, Kuan Chen, C.D. Chen, and K.J. Ma, "Electron beam lithography in nanoscale fabrication: recent development," IEEE Transactions on Electron. Pack. Manuf., Vol. 26(2), pp. 141-149, 2003.   DOI
8 Hyug-Gyo Rhee and Yun-Woo Lee, "Improvement of linewidth in laser beam lithographed computer generated hologram," Opt. Express, Vol. 18(2), pp. 1734-1740, 2010.   DOI
9 Alexander G. Poleshchuk, Evgeny G. Churin, Voldemar P. Koronkevich, Victor P. Korolkov, Andrei A. Kharissov, Vadim V. Cherkashin, Valerii P. Kiryanov, Aleksei V. Kiryanov, Sergei A. Kokarev, and Alexander G. Verhoglyad, "Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure," Appl. Opt., Vol. 38(8), pp. 1295-1301, 1999.   DOI
10 H.G. Rhee, J.B. Song, D.I. Kim, Y.W. Lee, and K.S. Ha, "Diffractive optics fabrication system for large optical surface testing," J. Kor. Phy. Soc. Vol. 50(4), pp. 1032-1036, 2007.   DOI
11 Y.G. Kim, H.G. Rhee, Y.S. Ghim, H.S. Yang, and Y.W. Lee, "Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements," Opt. Express, Vol. 25(3), pp. 1636-1645, 2017.   DOI
12 Young-Gwang Kim, Hyug-Gyo Rhee, Young-Sik Ghim and Yun-Woo Lee, "Method of fabricating an array of diffractive optical elements by using a direct laser lithography," Int. J. Adv. Manf. Tech. Vol. 101(9), pp. 1681-1685, 2018.