Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Process Study of Direct Laser Lithographic System for Fabricating Diffractive Optical Elements with Various Patterns

다중 패턴의 회절광학소자 제작을 위한 레이저 직접 노광시스템의 공정 연구

  • Kim, Young-Gwang (Department of science and Measurement, University of Science and Technology (UST)) ;
  • Rhee, Hyug-Gyo (Department of science and Measurement, University of Science and Technology (UST)) ;
  • Ghim, Young-Sik (Department of science and Measurement, University of Science and Technology (UST)) ;
  • Lee, Yun-Woo (Space Optics Team, Advanced Instrumentation Institute, Korea Research Institute of Standards and Science (KRISS))
  • 김영광 (과학기술연합대학원대학교 측정과학과) ;
  • 이혁교 (과학기술연합대학원대학교 측정과학과) ;
  • 김영식 (과학기술연합대학원대학교 측정과학과) ;
  • 이윤우 (한국표준과학연구원 첨단측정장비연구소 우주광학팀)
  • Received : 2019.06.12
  • Accepted : 2019.06.18
  • Published : 2019.06.30
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Abstract

Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.

Keywords

References

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