• Korean Journal of Optics and Photonics
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• v.22 no.5
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• pp.207-213
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• 2011

We propose a new method to measure the phase errors of an AWG(arrayed waveguide grating) through Monte-Carlo analysis. In the frequency domain method, we used the Monte-Carlo method to fit the theory to the experimental results. The phase and amplitude values are obtained from the fitted theory. To verify our method, we carried out a simulation. Some phase errors were included to make a virtual interferogram and we measured the actual AWG phase errors from it by our method. The results show that our method gives good results if the laser tuning range is larger than 1.7 times of the AWG FSR(free spectral range) and if the phase errors are within ${\pm}50^{\circ}$.

• Journal of Periodontal and Implant Science
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• v.38 no.1
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• pp.67-74
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• 2008

Purpose: The aim of this study was to evaluate the effect of Er:YAG laser on microstructure and roughness of $TiO_2$ blasting implant surface. Materials and Methods: Ten $TiO_2$ blasting implant were used in this experiment. One implant was control group, and nine $TiO_2$ blasting implant surfaces were irradiated with Er:YAG laser under 100 mJ/pulse, 140 mJ/pulse, and 180 mJ/pulse condition for 1 min, 1.5 min, and 2 min respectively. Optical interferometer and scanning electron microscopy was utilized to measure roughness and microstructure of specimens. Results: The surface roughness was decreased after Er:YAG laser irradiation in all groups, but there was no significant difference. 100 mJ/pulse and 140 mJ/pulse group did not alter the $TiO_2$ blasting implant surface in SEM study while 180 mJ/pulse group altered the $TiO_2$ blasting implant surface. Implant surfaces showed melting, microfracture and smooth surface in 180 mJ/pulse group. Conclusion: Detoxification of implant surface using Er:YAG laser must be irradiated with proper energy output and irradiation time to prevent implant surface alteration.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.13 no.4
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• pp.13-20
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• 2014

In this paper, the effects of a nonionic surfactant on the etch uniformity and the etch profile during the wet-etching process of high-purity aluminum were investigated for the fabrication of uniform micropattern arrays. To improve the surface roughness of a high-purity aluminum plate, a mechanical lapping process and an electrolytic polishing process were used. After electrolytic polishing process, the surface roughness, Ra, of the high-purity aluminum plate was improved from $1.25{\mu}m$ to $0.02{\mu}m$. A photoresist was used as an etching mask during the aluminum etching process, where the mixture of phosphoric acid, acetic acid, nitric acid, a nonionic surfactant and water was used as the aluminum etchant. Different amounts of the Triton X-100 nonionic surfactant were added to the aluminum etchant to investigate the effect of a nonionic surfactant during the wet-etching process of high-purity aluminum. The etch rate and the etch profile were measured by an optical interferometer and a scanning electron microscope.

• Korean Journal of Optics and Photonics
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• v.19 no.3
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• pp.193-198
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• 2008

A novel refractive index sensor, which consists of polymer channel waveguide overlaid with $TiO_2$ thin film, is demonstrated. To evaluate the fabricated sensor, we measured the polarimetric interference induced by concentration change of injected glycerol solution. Our experimental results show that thicker $TiO_2$ film improves the sensitivity of the polarimetric interferometer. For the fabricated waveguide with a 20 nm thick $TiO_2$ film, the measured index change to lead phase variation of $2{\pi}$ is $1.8{\times}10^{-3}$.

• Journal of Periodontal and Implant Science
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• v.37 no.2
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• pp.251-263
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• 2007

The present study was performed to evaluate the effects of Tetracycline-HCI on the microstructure change of SLA implant surface according to application time. In the Tetracycline-HCI group, 6 implants were rubbed with sponges soaked $50mg/m{\ell}$ Tetracycline-HCI solution for O.5min., lmin., 1. 5min., 2min., 2.5min. and 3min. In the saline group. another 6 implants conditioned with sponges soaked saline using same methods. One implant wasn't conditioned anything. Then, the changes of surface roughness values were evaluated by optical interferometer & specimens were processed for scanning electron microscopic observation. The results of this study were as follows: 1. In both Tetracycline-HCI group & saline group, there are no significant differences between surface roughness values before & after surface detoxification. And in scanning electron microscopic observation. there are slightly changes of implant surface structures but this changes were not significant by comparison with no treatment implant surface. 2. In the changes of surface roughness values & the scanning electron microscopic observation, there were no significant differences between saline & Tetracycline-HCI groups. In conclusion, the detoxification with $50mg/m{\ell}$ Tetracycline-HCI within 3 minutes can be applied for treatment of peri-implantitis in SLA surface implants. without surface microstructure changes.

• Journal of Periodontal and Implant Science
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• v.37 no.2
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• pp.265-275
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• 2007

The present study was performed to evaluate the effect of Tetracycline-HCI on the change of implant surface microstructure according to application time. Implants with thermal dual acid etched surface were utilized. Implant surface was rubbed with $50mg/m{\ell}$ Tetracycline-HCI solution and sterilized saline for O.5min, 1min, 1.5min, 2min, 2.5min and 3min. respectively in the test group. Then, specimens were processed for scanning electron microscopic observation and measured surface roughness by optical interferometer. The results of this study were as follows. 1. The thermal dual acid etched surfaces showed many small peaks and valleys distributed overall surface. 2. The surface conditioning with Tetracycline-HCI and saline didn't influence on its micromorphology. In conclusion, the implant with thermal dual acid etched surface has a protective micromorphology from the detoxification with $50mg/m{\ell}$ Tetracycline-HCI and a scrubbing with cotton pellet. Therefore, the detoxification with $50mg/m{\ell}$ Tetracycline-HCI is an effective method for peri-implantitis in case implants with thermal dual acid etched surface.

• Korean Journal of Optics and Photonics
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• v.26 no.2
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• pp.103-109
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• 2015

In an amplitude-splitting interferometer, a beam splitter divides an input beam into two parts, which are superposed after propagating along separate paths, producing an interference effect. We have investigated the phase relation between the reflected and transmitted light waves at BS's made of lossless dielectric stacks. If we define the phases with proper reference planes, a definite phase relation exists, irrespective of the detailed structure of the layers in the BS. Although this results from the generalized Stokes relations, we have verified it numerically for two representative BS's with symmetric and asymmetric layer structures respectively. When we applied the phase relation to interferometers, we could determine the superposition state of the output beam (either constructive or destructive interference) for a general BS, and could verify that the light's energy was conserved.

• Korean Journal of Optics and Photonics
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• v.29 no.4
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• pp.166-172
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• 2018

In this paper, we propose a new method to predict a mirror's surface deformation due to the stress of moisture release by a coating in the environment of outer space. We measured the surface deformation of circular samples 50 mm in diameter and 1.03 mm thick, using an interferometer. The results were analyzed using Zernike fringe polynomials. The coating stress caused by moisture release was calculated to be 152.7 MPa. This value was applied to an analytic model of a 1.25 mm thickness sample mirror, confirming that the change of surface deformation could be predicted within the standard deviation of the measurement result ($78.9{\pm}5.9nm$). Using this methodology, we predicted the surface deformation of 600 mm hyperbolic mirror for the Compact Advanced Satellite, which will be launched in 2019. The result is only $2.005{\mu}m$ of focal shift, leading to 2.3% degradation of modulation transfer function (MTF) at the Nyquist frequency, which satisfies the requirement.

• Korean Journal of Optics and Photonics
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• v.28 no.3
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• pp.108-115
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• 2017

We report the assembly procedure and performance evaluation of a visible and near-infrared spectrometer in the wavelength region of 400-900 nm, which is later to be combined with fore-optics (a telescope) to form a f/2.5 imaging spectrometer with a field of view of ${\pm}7.68^{\circ}$. The detector at the final image plane is a $640{\times}480$ charge-coupled device with a $24{\mu}m$ pixel size. The spectrometer is in an Offner relay configuration consisting of two concentric, spherical mirrors, the secondary of which is replaced by a convex grating mirror. A double-pass test method with an interferometer is often applied in the assembly process of precision optics, but was excluded from our study due to a large residual wavefront error (WFE) in optical design of 210 nm ($0.35{\lambda}$ at 600 nm) root-mean-square (RMS). This results in a single-path test method with a Shack-Hartmann sensor. The final assembly was tested to have a RMS WFE increase of less than 90 nm over the entire field of view, a keystone of 0.08 pixels, a smile of 1.13 pixels and a spectral resolution of 4.32 nm. During the procedure, we confirmed the validity of using a Shack-Hartmann wavefront sensor to monitor alignment in the assembly of an Offner-like spectrometer.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.93-93
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• 2016

Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.