• Title/Summary/Keyword: Nano-precision

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Manufacturing Technology of Thin Foil Tensile Specimen Using Cold Isostatic Press and Precision Mechanical Property Measurement Technology (냉간 등방압 성형기를 이용한 미세박판 인장시험시편 가공기술 및 정밀 기계적 물성 측정기술)

  • Lee H. J.;Park H. J.;Lee N. K.;Kim S. S.;Lee H. W.;Hwang J. H.;Park J. H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.245-248
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    • 2005
  • This paper is concerned with manufacturing technology of thin foil tensile specimen using CIP(Cold Isostatic Press) and measurement of precision mechanical property. This thin foil tensile specimen manufacturing technology is a method that can make a metal thin foil specimen for micro tensile testing. We can get a burr free micro metallic thin foil specimen using this technology. For testing mechanical property of this micro thin foil, we use a nano scale material testing machine that was developed by KITECH. In this paper, micro tensile specimens of nickel and copper thin foil are fabricated with CIP and precision mechanical properties of these materials could be measured. We will expect that precision mechanical property of micro/nano material and component. Micro and Nano mechanical property can be measured using this technology and mechanical property data base of micro/nano material and component can be constructed.

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Fabrications of nano-sized patterns using bi-layer UV Nano imprint Lithography (UV NIL을 이용한 Lift-off가 용이한 패턴 형성 연구)

  • Yang K.Y.;Hong S.H.;Lee H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1489-1492
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    • 2005
  • Compared to other nano-patterning techniques, Nano imprint Lithography (NIL) has some advantages of high throughput and low process cost. To imprint low temperature and pressure, UV Nano imprint Lithography, which using the monomer based UV curable resin is suggested. Because fabrication of high fidelity pattern on topographical substrate is difficult, bi-layer Nano imprint lithography, which are consist of easily removable under-layer and imprinted pattern, is being used. If residual layer is not remained after imprinting, and under-layer is removed by oxygen RIE etching, we might be able to fabricate the bi-layer pattern for easy lift-off process.

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Maskless Nano-fabrication by using both Nanoscratch and HF Wet Etching Technique (나노스크래치와 HF 에칭기술을 병용한 Pyrex 7740의 마스크리스 나노 가공)

  • 윤성원;이정우;강충길
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.628-631
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    • 2003
  • This study describes a new mastless nano-fabrication technique of Pyrex 7740 glass using the combination of nanomachining by nano-indenter XP and HF wet etching. First, the surface of a Pyrex 7740 glass specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by HF solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact. some sample structures were fabricated.

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A Method to Estimate Tensile Properties using Combined Nano-Indentation Tests and Finite Element Simulations (Nano-indentation 실험과 유한요소 해석을 연계한 재료의 탄소성 물성 평가법 개발)

  • Kim Y.J.;Song T.K.;Park J.H.;Hahn J.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.503-504
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    • 2006
  • Determination of elastic properties of nano-scale materials using nano-indentation tests is well established, but that of plastic properties is not yet clear. This paper presents a method to extract plastic properties from nano-indentation test, together with results from detailed elastic-plastic FE analysis. It shows that the plastic properties determined from this method are not unique, in the sense that a number of different plastic properties can give the same load-displacement response from nano-indentation test. possible ways to overcome such problems are discussed.

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Fabrication of Nano Composites Using Hybrid Rapid Prototyping (하이브리드 쾌속 조형을 이용한 나노 복합재의 조형)

  • Chu W.S.;Kim S.G.;Ahn S.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.757-760
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    • 2005
  • The technology of rapid prototyping (RP) is used for design verification, function test and fabrication of prototype. The current issues in RP are improvement in accuracy and application of various materials. In this paper, a hybrid rapid prototyping system is introduced which can fabricate nano composites using various materials. This hybrid system adopts RP and machining process, so material deposition and removal is performed at the same time in a single station. As examples, micro gears and a composite scaffold were fabricated using photo cured polymer with nano powders such as carbon black and hydroxyapatite. From the micro gear samples the hybrid RP technology showed higher precision than those made by casting or deposition process.

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Manufacturing Mechanism of FIB-CVD using Focused Ion Beam (집속이온빔의 가공 공정 메카니즘 연구)

  • 강은구;최병열;이석우;홍원표;최헌종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.925-928
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments and verifications of mechanism on FIB-CVD using SMI8800 made by Seiko. FIB-CVD has in fact proved to be commercially useful for repair processes because the beam can be focused down to 0.05$\mu\textrm{m}$ dimensions and below and because the same tool can be used to sputter off material with sub-micrometer precision simply by turning off the gas ambient. Recently the chemical vapour deposition induced ion beam has been required more deposition rate and accurate pattern because of trying to manufacture many micro and nano parts. Therefore this paper suggested the optimization parameters and discussed some mechanism of chemical vapour deposition induced ion beam on FIB-CVD for simple pattern.

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Pitch Measurement of 150 nm 1D-grating Standards Using an Nano-metrological Atomic Force Microscope

  • Jonghan Jin;Ichiko Misumi;Satoshi Gonda;Tomizo Kurosawa
    • International Journal of Precision Engineering and Manufacturing
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    • v.5 no.3
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    • pp.19-25
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    • 2004
  • Pitch measurements of 150 nm one-dimensional grating standards were carried out using a contact mode atomic force microscopy with a high resolution three-axis laser interferometer. This measurement technique was named as the 'nano-metrological AFM'. In the nano-metrological AFM, three laser interferometers were aligned precisely to the end of an AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$ stabilized He-Ne laser at a wavelength of 633 nm. Therefore, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM could be used to directly measure the length standard. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement (GUM). The primary source of uncertainty in the pitch-measurements was derived from the repeatability of the pitch-measurements, and its value was about 0.186 nm. The average pitch value was 146.65 nm and the combined standard uncertainty was less than 0.262 nm. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.