• 제목/요약/키워드: Nano-patterning

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다공성 알루미나 박막을 이용한 나노마스크 제작 (Fabrication of Nano-mask Using Porous Alumina Membrane)

  • 정경한;류길용;장정수;권영수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.364-365
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    • 2006
  • One of the promising routes for producing highly ordered nanostructures is a template method using the porous alumina membrane (PAM). Because the PAM is mechanically, chemically, thermally stabile with highly ordered structure, many researchers have studied under various experimental conditions to fabricate nanostructures. We present the information on the fabrication of about 300 nm nano-mask which have important applications for various patterned nanostructures.

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나노미터 규격의 친수성 박막 패터닝을 이용한 선택적 폴리스티렌 입자 배열 (Selective Array of Polystyrene Beads by Using Nanometer-Scaled Hydrophilic Thin Film Patterning)

  • 강정화;김경섭;김남훈;노용한
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.103-104
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    • 2007
  • Nanometer-scaled polymer beads, such as polystyrene beads, were used as nanometer fabrication materials due to their some advantages such as self-assembled monolayer, nanometer scaled size and excellent compatibility with silicon based devices. Thus, the investigation on these properties of polymer beads was required. It is difficult to control the array of polystyrene beads on silicon substrate. In this study, we investigated the condition of selective array of polystyrene beads on nanometer-scaled hydrophilic surface which was obtained by APS coating. A tilting method was used to array the polystyrene beads selectively on the substrate. The polystyrene beads could be arrayed selectively by this method. From these results, we verified that there are possibilities to fabricate unique tools for the nanometer-scaled electrical devices.

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Diamond-like carbon 코팅기술을 사용한 UV-임프린트 스탬프 제작 (Fabrication of UV imprint stamp using diamond-like carbon coating technology)

  • 정준호;김기돈;심영석;최대근;최준혁;이응숙;임태우;박상후;양동열;차남구;박진구
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 추계학술대회 논문집
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    • pp.167-170
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    • 2005
  • The two-dimensional (2D) and three-dimensional (3D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography (UV-NIL) were fabricated using two kinds of methods, which were a DLC coating process followed by the focused ion beam (FIB) lithography and the two-photon polymerization (TPP) patterning followed by nano-scale thick DLC coating. We fabricated 70 nm deep lines with a width of 100 nm and 70 nm deep lines with a width of 150 nm on 100 nm thick DLC layers coated on quartz substrates using the FIB lithography. 200 nm wide lines, 3D rings with a diameter of $1.35\;{\mu}m$ and a height of $1.97\;{\mu}m$, and a 3D cone with a bottom diameter of $2.88\;{\mu}m$ and a height of $1.97\;{\mu}m$ were successfully fabricated using the TPP patterning and DLC coating process. The wafers were successfully printed on an UV-NIL using the DLC stamp. We could see the excellent correlation between the dimensions of features of stamp and the corresponding imprinted features.

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Design and Fabrication of Information Security Films with Microlouver Pattern and ZnO Nano-Ink Filling

  • Kim, Gwan Hyeon;Kim, So Won;Lee, Seong Eui;Lee, Hee Chul
    • 한국세라믹학회지
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    • 제56권4호
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    • pp.354-359
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    • 2019
  • Information security films that can ensure personal privacy by reducing the viewing angle of display screens were fabricated by microlouver patterning and a ZnO nano-ink filling process. Optical simulation results demonstrated that all the microlouver films showed good security performances. Security performances were evaluated as calculated relative luminance ratios compared between the side and front. Based on the simulation results, microlouver films were fabricated by UV imprint lithography and nano-ink bar coating. However, distortion of the microlouver pattern occurred with the use of high-viscosity nano-inks such as ZrO2 and TiO2, and the CuO-filled microlouver film suffered from very low optical transmittance. Accordingly, the effects of ZnO filling height on security performance were intensively investigated through simulation and experimental measurements. The fabricated microlouver film with a 75-㎛-high ZnO filling exhibited a good relative luminance ratio of 0.75 at a 60° side angle and a transmittance of 44% at a wavelength of 550 nm.

Two-Dimensional Arrays of Gold Nanoparticles for Plasmonic Nanosensor

  • Sim, Brandon;Monjaraz, Fernando;Lee, Yong-Joong;Park, So-Yeun
    • 한국재료학회지
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    • 제21권10호
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    • pp.525-531
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    • 2011
  • Two dimensional (2D) arrays of noble metal nanoparticles are widely used in the sensing of nanoscale biological and chemical events. Research in this area has sparked considerable interest in many fields owing to the novel optical properties, e.g., the localized surface plasmon resonance, of these metallic nanoarrays. In this paper, we report successes in fabricating 2D arrays of gold nano-islands using nanosphere lithography. The reproducibility and the effectiveness of the nano-patterning method are tested by means of spin coating and capillary force deposition. We found that the capillary force deposition method was more effective for nanospheres with diameters greater than 600 nm, whereas the spin coating method works better for nanospheres with diameters less than 600 nm. The optimal deposition parameters for both methods were reported, showing about 80% reproducibility. In addition, we characterize gold nano-island arrays both geometrically with AFM as well as optically with UV-VIS spectrometry. The AFM images revealed that the obtained nano-arrays formed a hexagonal pattern of truncated tetrahedron nano-islands. The experimental and theoretical values of the geometric parameters were compared. The 2D gold nano-arrays showed strong LSPR in the absorption spectra. As the nano-islands increased in size, the LSPR absorption bands became red-shifted. Linear dependence of the plasmon absorption maximum on the size of the gold nano-islands was identified through the increment in the plasmon absorption maximum rate for a one nanometer increase in the characteristic length of the nano-islands. We found that the 2D gold nano-arrays showed nearly seven-fold higher sensitivity of the absorption spectrum to the size of the nano-islands as compared to colloidal gold nano-particles.

나노 금속 격자형 편광필름 제작에서 증착 두께에 따른 광 특성 연구 (A Study on Optical Characteristic of Nano Metal Grid Polarizer Film with Different Deposition Thicknes)

  • 김지원;조상욱;정명영
    • 마이크로전자및패키징학회지
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    • 제22권1호
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    • pp.63-67
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    • 2015
  • 본 연구에서는 대면적 나노 금속 격자형 편광 필름 제작에서 증착 두께에 따른 광 특성 연구를 수행하였다. 나노 금속 격자형 편광필름은 PET(Polyethylene phthalate)기판 위에 알루미늄 선 격자 구조로 구성된다. 본 연구에서는 대면적 편광필름 제작을 위한 증착공정을 통한 금속 격자 형성을 목표로 하였으며, 금속 격자형 편광 필름 제작에 있어 최적의 투과율과 소광비를 가지는 금속 박막 형성 조건을 도출하였다. 최적화 공정에 의해 나노 금속 격자형 편광필름은 140 nm 주기, 70 nm 선폭, 70 nm의 금속층 높이를 가지는 금속 격자 구조로 제작 되었다. 분석결과 600 nm 파장에서 80% 이상의 최고 투과율 및 $10^6$ 이상의 소광비를 가지는 나노 금속 격자 편광필름의 높은 광 특성을 확인하였다.

롤 기반 나노임프린트 리소그래피 시스템 기술 (Technology for Roll-based Nanoimprint Lithography Systems)

  • 임형준;이재종;최기봉;김기홍;이성휘
    • 한국기계가공학회지
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    • 제12권5호
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    • pp.1-8
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    • 2013
  • Roll-based, nanoimprint lithography (Roll-NIL) is one effective method to produce large-area nanopatterns continuously. Systems and processes for Roll-NIL have been developed and studied for more than 15 years. Since the shapes of the stamp and the substrate for Roll-NIL can be plates, films, and rolls, there exist many concepts to design and implement roll-NIL systems. Combinations and variations of contact-methods for variously shaped stamps and substrates are analyzed in this paper. The contact-area can be changed by using soft materials such as polydimethylsiloxane (PDMS) or silicone rubber. Ultraviolet (UV) sources appropriate for the roll-to-plate or roll-to-roll process are introduced. Finally, two roll-to-plate nanoimprint lithography systems are illustrated.

롤압연, 압출, 단조 등 전통 기계가공법의 모사 응용을 통한 다양한 나노패턴의 대면적 연속생산 기술 구현 (Development of Continuous and Scalable Nanomanufacturing Technologies Inspired by Traditional Machining Protocols Such as Rolling, Pullout, and Forging)

  • 옥종걸;곽문규
    • 한국생산제조학회지
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    • 제24권2호
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    • pp.198-202
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    • 2015
  • We present a series of simple but novel nanopatterning methodologies inspired by traditional mechanical machining processes involving rolling, pullout, and forging. First, we introduce roll-to-roll nanopatterning, which adapts conventional rolling for continuous nanopatterning. Then, nano-inscribing and nano-channel lithography are demonstrated, whereby seamless nanogratings can be continuously pulled out, as in a pullout process. Finally, we discuss vibrational indentation micro- and nanopatterning. Similarly to the forging/indentation process, this technique employs high-frequency vertical vibration to indent periodic micro/nanogratings onto a horizontally fed substrate. We discuss the basic principles of each process, along with its advantages, disadvantages, and potential applications. Adopting mature and reliable traditional technologies for small-scale machining may allow continuous nanopatterning techniques to cope with scalable and low-cost nanomanufacturing in a more productive and trustworthy way.

Transfer of patterns from thin film to patterning-resist substrate

  • 하늘빛;박지선;정솔;임혜인;김재성
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.266-266
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    • 2010
  • Ion beam sputtering(IBS)을 이용한 pattern 형성은 대상 물질의 제한이 적고 물리적 변수의 조절에 의해 쉽게 nano 구조의 형태와 크기를 조절할 수 있다는 점에서 관심을 받아오고 있다. 하지만 IBS를 이용한 pattern 형성이 어려운 물질들도 있어 다양한 기판에서의 nano pattern 형성에 관련된 많은 연구가 보고되고 있다. 본 연구발표에서는 유용한 반도체인 Si 표면에서의 IBS를 이용한 nano 구조 형성이 가능함과 그 과정에 대해 말하고자 한다. Ru을 100nm 두께로 증착시킨 Si(100)을 sputter 했을 때, Ru 표면에 잘 order된 nano pattern이 형성되었다. Sputter 시간이 증가하면서 pattern은 유지된 채 Ru이 깎여 나가다가 pattern의 가장 낮은 부분부터 Si기판이 드러나게 된다. 이 때 노출된 Si은 sputtering에 의해 깎여나가고 아직 Ru이 덮여있는 부분의 Si은 그대로 유지되어, Ru이 모두 sputter 되면서 보여지는 Si의 pattern은 Ru의 그것과 동일한 형태를 띄게 된다. 그 결과, Ru의 pattern이 Si으로 transfer되었음을 AFM과 SAM을 통해 확인할 수 있었다. 또한 IBS를 이용해 pattern 형성이 힘든 metallic glass에도 같은 방식으로 Ru을 쌓아 sputter 해봄으로써 pattern transfer를 확인해 볼 계획이다. 이러한 pattern transfer는 sputtering을 통한 pattern 형성이 어려웠던 다른 물질들에 그 가능성이 있음을 보여주고 있어 sputtering의 응용 폭이 넓어질 것을 기대한다.

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능동적 박막 펌핑에 의한 파운틴 펜 나노 리소그래피 유동 특성에 관한 연구 (A Study on Flow Characteristics of Fountain-pen Nano-Lithography with Active Membrane Pumping)

  • 이진형;이영관;이성근;이석한;김윤제;김훈모
    • 대한기계학회논문집B
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    • 제30권8호
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    • pp.722-730
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    • 2006
  • In this study, the flow characteristics of a FPN (Fountain Pen Nano-Lithography) using active membrane pumping are investigated. The FPN has integrated chamber, micro channel, and high capacity reservoir for continuous ink feed. The most important aspect in this probe provided control of fluid injection using active membrane pumping in chamber. The flow rates in channel by capillary force are theoretically analyzed, including the control of the mass flow rates by the deflection of the membrane. The above results are compared with the numerical simulations that calculated by commercial code, FLUENT. The velocity of the fluid in micro channel shows linear behaviors. And the mass flows are proportional to the second order function of the pumping pressure that is imposed to the membrane.