Journal of the Korean Society of Manufacturing Process Engineers (한국기계가공학회지)

The Korean Society of Manufacturing Process Engineers (한국기계가공학회)
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Technology for Roll-based Nanoimprint Lithography Systems

롤 기반 나노임프린트 리소그래피 시스템 기술

  • Lim, Hyungjun (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials) ;
  • Lee, Jaejong (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials) ;
  • Choi, Kee-Bong (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials) ;
  • Kim, Geehong (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials) ;
  • Lee, Sunghwi (Advanced Manufacturing Systems Research Division, Korea Institute of Machinery and Materials)
  • Published : 2013.10.31
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Abstract

Roll-based, nanoimprint lithography (Roll-NIL) is one effective method to produce large-area nanopatterns continuously. Systems and processes for Roll-NIL have been developed and studied for more than 15 years. Since the shapes of the stamp and the substrate for Roll-NIL can be plates, films, and rolls, there exist many concepts to design and implement roll-NIL systems. Combinations and variations of contact-methods for variously shaped stamps and substrates are analyzed in this paper. The contact-area can be changed by using soft materials such as polydimethylsiloxane (PDMS) or silicone rubber. Ultraviolet (UV) sources appropriate for the roll-to-plate or roll-to-roll process are introduced. Finally, two roll-to-plate nanoimprint lithography systems are illustrated.

Keywords

References

  1. Chou, S. Y., Krauss, P. R., and Renstrom, P. J., "Imprint of sub-25 nm vias and trenches in polymers," Applied physics letters, Vol. 67, p. 3114-3116, 1995. https://doi.org/10.1063/1.114851
  2. Haisma, J., Verheijen, M., Van Den Heuvel, K., and Van Den Berg, J., "Mold-assisted nanolithography: A process for reliable pattern replication," Journal of Vacuum Science and Technology B, Vol. 14, pp. 4124-4128. 1996. https://doi.org/10.1116/1.588604
  3. Chou, S. Y., Krauss, P. R., Zhang, W., Guo, L., and Zhuang, L., "Sub-10 nm imprint lithography and applications," Journal of Vacuum Science and Technology B, Vol. 15, pp. 2897-2904, 1997. https://doi.org/10.1116/1.589752
  4. Austin, M. D., Zhang, W., Ge, H., Wasserman, D., Lyon, S. A., and Chou, S. Y., "6 nm half-pitch lines and $0.04\;{\mu}m^2$ static random access memory patterns by nanoimprint lithography," Nanotechnology, Vol. 16, pp. 1058-1061, 2005. https://doi.org/10.1088/0957-4484/16/8/010
  5. Wu, W., Hu, M., Ou, F. S., Li, Z., and Williams, R. S., "Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy," Nanotechnology, Vol. 21, p. 255502, 2010. https://doi.org/10.1088/0957-4484/21/25/255502
  6. Farshchian, B., Hurst, S. M., Lee, J., and Park, S., "3D molding of hierarchical micro-and nanostructures," Journal of Micromechanics and Microengineering, Vol. 21, p. 035016, 2011. https://doi.org/10.1088/0960-1317/21/3/035016
  7. Tan, H., Gilbertson, A., and Chou, S. Y., "Roller nanoimprint lithography," Journal of Vacuum Science and Technology B, Vol. 16, pp. 3926-3928, 1998. https://doi.org/10.1116/1.590438
  8. Ok, J. G., Kwak, M. K., Huard, C. M., Youn, H. S., and Guo, L. J., "Photo-Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics," Advanced Materials, doi: 10.1002/adma.201303514, 2013.
  9. Ruchhoeft, P., Colburn, M., Choi, B., Nounu, H., Johnson, S., Bailey, T., Damle, S., Stewart, M., Ekerdt, J., Sreenivasan, S. V., Wolfe, J. C., and Willson, C. G., "Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography," Journal of Vacuum Science and Technology B, Vol. 17, pp. 2965-2969, 1999. https://doi.org/10.1116/1.590935
  10. Kim, Y., Kim, G., and Lee, J., "Fabrication of a conductive nanoscale electrode for functional devices using nanoimprint lithography with printable metallic nanoink," Microelectronic Engineering, Vol. 87, pp. 839-842, 2010. https://doi.org/10.1016/j.mee.2009.12.062
  11. Dumond, J. J., Mahabadi, K. A., Yee, Y. S., Tan, C., Fuh, J. Y. H., Lee, H. P., & Low, H. Y., "High resolution UV roll-to-roll nanoimprinting of resin moulds and subsequent replication via thermal nanoimprint lithography," Nanotechnology, Vol. 23, pp. 485310, 2012. https://doi.org/10.1088/0957-4484/23/48/485310
  12. Ok, J. G., Seok Youn, H., Kyu Kwak, M., Lee, K. T., Jae Shin, Y., Jay Guo, L., Greenwald, A., and Liu, Y., "Continuous and scalable fabrication of flexible metamaterial films via roll-to-roll nanoimprint process for broadband plasmonic infrared filters," Applied Physics Letters, Vol. 101, p. 223102, 2012. https://doi.org/10.1063/1.4767995
  13. Taniguchi, J., and Aratani, M., "Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate," Journal of Vacuum Science and Technology B, Vol. 27, pp. 2841-2845, 2009. https://doi.org/10.1116/1.3237141
  14. Ahn, S. H., and Guo, L. J., "Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting," ACS nano, Vol. 3, pp. 2304-2310, 2009. https://doi.org/10.1021/nn9003633
  15. Ahn, S., Cha, J., Myung, H., Kim, S. M., and Kang, S., "Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano-and micropatterns," Applied physics letters, Vol. 89, p. 213101, 2006. https://doi.org/10.1063/1.2392960
  16. Ahn, S., Choi, M., Bae, H., Lim, J., Myung, H., Kim, H., and Kang, S., "Design and fabrication of micro optical film by ultraviolet roll imprinting," Japanese Journal of Applied Physics, Vol. 46, pp. 5478-5484, 2007. https://doi.org/10.1143/JJAP.46.5478
  17. Han, J., Choi, S., Lim, J., Lee, B. S., and Kang, S., "Fabrication of transparent conductive tracks and patterns on flexible substrate using a continuous UV roll imprint lithography," Journal of Physics D: Applied Physics, Vol. 42, p. 115503, 2009. https://doi.org/10.1088/0022-3727/42/11/115503
  18. Yoshikawa, H., Taniguchi, J., Tazaki, G., and Zento, T., "Fabrication of high-aspect-ratio pattern via high throughput roll-to-roll ultraviolet nanoimprint lithography," Microelectronic Engineering, Vol. 112, pp. 273-277, 2013. https://doi.org/10.1016/j.mee.2013.03.117
  19. Armani, Deniz, Chang Liu, and Narayan Aluru., "Re-configurable fluid circuits by PDMS elastomer micromachining," 12th IEEE International Conference on Micro Electro Mechanical Systems, pp. 222-227, 1999.
  20. Choi, Kyung M., and John A. Rogers., "A photocurable poly (dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime," Journal of the American Chemical Society, Vol. 125, pp. 4060-4061, 2003. https://doi.org/10.1021/ja029973k
  21. Okada, M., Miyake, H., Iyoshi, S., Yukawa, T., Katase, T., Tone, K., Haruyama, Y., and Matsui, S., "Double patterning in nanoimprint lithography," Microelectronic Engineering, Vol. 112, pp. 139-142, 2013. https://doi.org/10.1016/j.mee.2013.06.009
  22. Lim, H., Kim, G., Choi, K. B., Jeong, M., Ryu, J., and Lee, J., "Nanoimprint lithography with a soft roller and focused UV light for flexible substrates," Microelectronic Engineering, Vol. 98, pp. 279-283, 2012. https://doi.org/10.1016/j.mee.2012.04.030
  23. Park, H., Lim, H., Lee, J., "Fabrication of Hybrid Patterns using UV Roll-Liquie Transfer Imprint Lithography for Large Area," 10th International Workshop on High Aspect Ratio Micro and Nano System Technology, 2013.
  24. Lim, H., Lee, J., Choi, K., Kim, G., Lee, S., Park, H., Ryu, J., and Jung, S., "Roll-to-Roll Nanoimprint Lithography for Patterning on a Large-area Substrate Roll," 39th International Conference on Micro and Nano Engineering, p. 571, 2013.