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Technology for Roll-based Nanoimprint Lithography Systems  

Lim, Hyungjun (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials)
Lee, Jaejong (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials)
Choi, Kee-Bong (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials)
Kim, Geehong (Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials)
Lee, Sunghwi (Advanced Manufacturing Systems Research Division, Korea Institute of Machinery and Materials)
Publication Information
Journal of the Korean Society of Manufacturing Process Engineers / v.12, no.5, 2013 , pp. 1-8 More about this Journal
Abstract
Roll-based, nanoimprint lithography (Roll-NIL) is one effective method to produce large-area nanopatterns continuously. Systems and processes for Roll-NIL have been developed and studied for more than 15 years. Since the shapes of the stamp and the substrate for Roll-NIL can be plates, films, and rolls, there exist many concepts to design and implement roll-NIL systems. Combinations and variations of contact-methods for variously shaped stamps and substrates are analyzed in this paper. The contact-area can be changed by using soft materials such as polydimethylsiloxane (PDMS) or silicone rubber. Ultraviolet (UV) sources appropriate for the roll-to-plate or roll-to-roll process are introduced. Finally, two roll-to-plate nanoimprint lithography systems are illustrated.
Keywords
Nanoimprint Lithography; Roll; Patterning;
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