• Proceedings of the Optical Society of Korea Conference
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• 2009.02a
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• pp.133-134
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• 2009

Cold temperature development (CTD) of electron beam (EB) patterned resists and subsequent dry etching were investigated for fabrication of nano-patterned Niobium (Nb). Bulky Nb fims on GaAs substrates were deposited with EB evaporation. Line patterns on Nb cathode were fabricated by EB patterning and reactive ion etching (RIE). Size deviations of nano-sized line patterns from CAD designed patterns are dependent on the EB total exposure, but it can be improved by CTD of EB-exposed resist. Line patterns of 10 to 300 nm widths of EB-exposed resist patterns were drawn under various exposure conditions of $0.2{\mu}s$/dot (total 240,000 dot) with a constant current (50 pA). Compared with room temperature development (RTD), the CTD improves pattern resolution due to the suppression of backscattering effect. RIE with $CF_4$ was performed for formation of several nano-sized line patterns on Nb. Each EB-resist patterned samples with RTDs and CTDs were etched with two different $CF_4$ gas pressures of 5 Pa. Nb etching rate increases while GaAs (or ZEP) etching rate decreases as the chamber pressure increases. This different dependent of the etching rate on the $CF_4$ pressure between Nb and GaAs (or ZEP) has a significant meaning because selective etching of nano-sized Nb line patterns is possible without etching of the underlying active layer.

• Transactions of the Korean Society of Automotive Engineers
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• v.15 no.6
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• pp.144-150
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• 2007

In recent years, the particle number emissions rather than particulate mass emissions in automotive engine have become the subject of controversial discussions. Recent results from the health effects studies imply that it is possible that particulate mass does not properly correlated with the variety of health effects attributed to diesel exhaust. So, the concern is instead now focusing on nano-sized particles emitted from I. C. engine. This study has been performed for the better understanding about the engine nano-particle for 3-measurement systems with different measuring principle. Firstly, EEPS is a newly introduced instrument for size distribution measurement of engine exhaust particles. It can measure nano-particles with an adequate resolution and in real time. In this study, the characteristics of EEPS were compared with ELPI and SMPS. As a research results, EEPS showed a same effect of engine load on the size distribution with ELPI and SMPS. But the quantitative results of EEPS were more similar to SMPS than ELPI, because the EEPS and SMPS use a same principle for classifying particles by size. The capability for transient measurement of EEPS was equivalent to that of ELPI.

• Journal of the Korean Vacuum Society
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• v.22 no.5
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• pp.262-269
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• 2013

Though focused ion beam (FIB) is one of the candidates to fabricate the nanoscale patterns, precision milling of nanoscale structures is not straightforward. Thus this poses challenges for novice FIB users. Optimal determination in FIB parameters is a crucial step to fabricate a desired nanoscale pattern. There are two main FIB parameters to consider, beam current (beam size) and dose (beam duration) for optimizing the milling condition. After fixing the dose, the proper beam current can be chosen considering both total milling time and resolution of the pattern. Then, using the chosen beam current, the metal nano hole structure can be perforated to the required depth by varying the dose. In this experiment, we found the adequate condition of $0.1nC/{\mu}m^2$ dose at 1 pA Ga ion beam current for 100 nm thickness perforation. With this condition, we perforated the periodic square array of elliptical nano holes.

• Journal of KIISE:Computer Systems and Theory
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• v.34 no.12
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• pp.630-640
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• 2007

As the range of sensor network's applicability is getting wider, it creates new application areas which is required real-time operation, such as military and detection of radioactivity. However, existing researches are focused on effective management for resources, existing sensor network operating system cannot support to real-time areas. In this paper, we propose the ${\mu}TMO$ model which is lightweight real-time distributed object model TMO. We design the real-time sensor network operation system ${\mu}TMO-NanoQ+$ which is based on ETRI's sensor network operation system Nano-Q+. We modify the Nano-Q+'s timer module to support high resolution and apply Context Switch Threshold, Power Aware scheduling techniques to realize lightweight scheduler which is based on EDF. We also implement channel based communication way ITC-Channel and periodic thread management module WTMT.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.3.2-3.2
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• 2011

In recent years, inkjet printing technology has received significant attention as a micro/nanofabrication technique for flexible printing of electronic circuits and solar cells, as well for biomaterial patterning. It eliminates the need for physical masks, causes fewer environment problems, lowers fabrication costs, and offers good layer-to-layer registration. To fulfill the requirements for use in the above applications, however, the inkjet system must meet certain criteria such as high frequency jetting, uniform droplet size, high density nozzle array, etc. Existing inkjet devices are either based on thermal bubbles or piezoelectric pumping; they have several drawbacks for flexible printing. For instance, thermal bubble jetting has limitations in terms of size and density of the nozzle array as well as the ejection frequency. Piezoelectric based devices suffer from poor pumping energy in addition to inadequate ejection frequency. Recently, an electrohydrodynamic (EHD) printing technique has been suggested and proposed as an alternative to thermal bubble or piezoelectric devices. In EHD jetting, a liquid (ink) is pumped through a nozzle and a strong electric field is applied between the nozzle and an extractor plate, which induce charges at the surfaces of the liquid meniscus. This electric field creates an electric stress that stretches the meniscus in the direction of the electric field. Once the electric field force is larger than the surface tension force, a liquid droplet is formed. An EHD inkjet head can produce droplets smaller than the size of the nozzle that produce them. Furthermore, the EHD nano-inkjet can eject high viscosity liquid through the nozzle forming tiny structures. These unique features distinguish EHD printing from conventional methods for sub-micron resolution printing. In this presentation, I will introduce the recent research results regarding the EHD nano-inkjet and the printing system, which has been applied to solar cell or thin film transistor applications.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.28 no.2
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• pp.58-72
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• 2002

The high resolution transmission electron microscope(HRTEM) is one of the most powerful methods fer investigating internal structures of various materials on an atomic scale. In fact, HRTEM images are becoming much more common in scientific papers, and are making valuable contributions to development of industrial products. With rapid improvement of current HRTEMS, their maximum resolution reaches almost 0.1 nm. In this paper we describe the fundamental formulation of the imaging process of HRTEM and their practical application f3r nano materials.

• Proceedings of the KSME Conference
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• 2004.11a
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• pp.777-781
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• 2004

This paper presents a force/displacement sensing system to measure penetration depths and machining forces during pattering operation. This sensing system consists of a leaf spring mechanism and a capacitive sensor, which is mounted on a PZT driven in-feed motion stage with 1nm resolution. The sample is moved by a xy scanning motion stage with 5nm resolution. The constructed system was applied to nano indentation experiments, and the load-displacement curves of silicon(111) and aluminum were obtained. Then, the indentation samples were measured by AFM. Experimental results demonstrated that the developed system has the ability of preforming force/depth sensing indentations

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1340_1341
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• 2009

In this report, high-resolution metal electrode patterning is demonstrated by using selective surface treatment and dip casting for low-cost printed electronic applications. On hydrophobic octadecyltrichlorosilane treated $SiO_2$ surface, deep UV irradiation was performed through a patterned quartz photomask to selectively control the surface energy of the $SiO_2$ layer. The deep UV irradiated region becomes hydrophilic and by dipping into Ag nano-ink, Ag patterns were formed on the surface. Using this patterning technique, line patterns and dot arrays having less than $10{\mu}m$ pitch were fabricated.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.426-428
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• 2007

A simple method is presented for fabricating micro/nanoscale combined hierarchical structures using a two-step UV-assisted capillary molding technique. This lithographic method consists of two steps: (i) fabrication of partially cured polymer microstructures using a PDMS mold and (ii) subsequent nanofabrication using a high-resolution polyurethane acrylate (PUA) mold on top of the pre-formed microstructures. Using this technique, various micro/nano hierarchical structures were fabricated with minimum resolution down to 70 nm over a large area with very good reproducibility.

• Journal of the Korean Magnetic Resonance Society
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• v.24 no.2
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• pp.59-65
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• 2020

Nitrogen-Vacancy (NV) center in diamond has been an emerging versatile tool for quantum sensing applications. Amongst various applications, nano-scale nuclear magnetic resonance (NMR) using a single or ensemble NV centers has demonstrated promising results, opening possibility of a single molecule NMR for its chemical structural studies or multi-nuclear spin spectroscopy for quantum information science. However, there is a key challenge, which limited the spectral resolution of NMR detection using NV centers; the interrogation duration for NV-NMR detection technique has been limited by the NV sensor spin lifetime (T₁ ~ 3ms), which is orders of magnitude shorter than the coherence times of nuclear spins in bulk liquid samples (T₂ ~ 1s) or intrinsic ¹³C nuclear spins in diamond. Recent studies have shown that quantum memory technique or synchronized readout detection technique can further narrow down the spectral linewidth of NMR signal. In this short review paper, we overview basic concepts of nanoscale NMR using NV centers, and introduce further developments in high spectral resolution NV NMR studies.