• 제목/요약/키워드: Nano Patterns

검색결과 435건 처리시간 0.031초

이광자 흡수 광환원 공정을 이용한 마이크로 금속형상 제작의 정밀화에 관한 연구 (Improvement of Metallic Micro-Structure Precision Employing Two-photon Induced Photoreduction Process)

  • 손용;임태우;양동열;;이광섭
    • 대한기계학회논문집A
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    • 제32권9호
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    • pp.754-760
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    • 2008
  • A two-photon induced photoreduction process suggests a possibility for fabricating complicated metallic microstructures which can be applied to 3-D micro-circuits and optical devices, etc. The process employs the photoreduction of silver ions in a metallic solution which is composed of metallic salt ($AgNO_3$) and watersoluble polymer ((poly(4-styrenesulfonique acid) 18wt. % in $H_2O$, $(C_8H_8O_3S)_n$)). In this process, the improvement of the resolution and the uniformity of fabricated metallic structures are important issues. To address these problems, continuous forming window (CFW) is obtained from a parametric study on the conditions of laser power and scanning velocity and the direct seed generation (DSG) method is proposed. Silver nano particles are uniformly generated in a metallic solution through the DSG method, which enables the decrease of a laser power to trigger the photoreduction of silver ions as well as the increase of metal contents in a metallic solution. So the two-photon induced photoreduction property of a metallic solution is improved. Through this work, precise silver patterns are fabricated with a minimum line width of 400 nm.

Analysis of a functionally graded nanocomposite sandwich beam considering porosity distribution on variable elastic foundation using DQM: Buckling and vibration behaviors

  • Nejadi, Mohammad Mehdi;Mohammadimehr, Mehdi
    • Computers and Concrete
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    • 제25권3호
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    • pp.215-224
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    • 2020
  • In the present study, according to the important of porosity in low specific weight in comparison of high stiffness of carbon nanotubes reinforced composite, buckling and free vibration analysis of sandwich composite beam in two configurations, of laminates using differential quadrature method (DQM) is studied. Also, the effects of porosity coefficient and three types of porosity distribution on critical buckling load and natural frequency are discussed. It is shown the buckling loads and natural frequencies of laminate 1 are significantly larger than the results of laminate 2. When configuration 2 (the core is made of FRC) and laminate 1 ([0/90/0/45/90]s) are used, the first natural frequency rises noticeably. It is also demonstrated that the influence of the core height in the case of lower carbon volume fractions is negligible. Even though, when volume fraction of fiber increases, the critical buckling load enhances smoothly. It should be noticed the amount of decline has inverse relationship with the beam aspect ratio. Investigating three porosity patterns, beam with the distribution of porosity Type 2 has the maximum critical buckling load and first natural frequency. Among three elastic foundations (constant, linear and parabolic), buckling load and natural frequency in linear variation has the least amount. For all kind of elastic foundations, when the porosity coefficient increases, critical buckling load and natural frequency decline significantly.

Light intensity controlled wrinkling patterns in photo-thermal sensitive hydrogels

  • Toh, William;Ding, Zhiwei;Ng, Teng Yong;Liu, Zishun
    • Coupled systems mechanics
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    • 제5권4호
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    • pp.315-327
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    • 2016
  • Undergoing large volumetric changes upon incremental environmental stimulation, hydrogels are interesting materials which hold immense potentials for utilization in a wide array of applications in diverse industries. Owing to the large magnitudes of deformation it undergoes, swelling induced instability is a commonly observed sight in all types of gels. In this work, we investigate the instability of photo-thermal sensitive hydrogels, produced by impregnating light absorbing nano-particles into the polymer network of a temperature sensitive hydrogel, such as PNIPAM. Earlier works have shown that by using lights of different intensities, these hydrogels follow different swelling trends. We investigate the possibility of utilizing this fact for remote switching applications. The analysis is built on a thermodynamic framework of inhomogeneous large deformation of hydrogels and implemented via commercial finite element software, ABAQUS. Various examples of swelling induced instabilities, and its corresponding dependence on light intensity, will be investigated. We show that the instabilities that arise have their morphologies dependent on the light intensity.

접촉식 리소그라피의 정렬공정을 위한 압전구동 초정밀 스테이지 (A Piezo-driven Ultra-precision Stage for Alignment Process of a Contact-type Lithography)

  • 최기봉;이재종;김기홍;임형준
    • 한국생산제조학회지
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    • 제20권6호
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    • pp.756-760
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    • 2011
  • This paper proposed an alignment stage driven by piezo actuators for alignment process of a contact-type lithography. Among contact-type lithography processes, an UV-curable nanoimprint process is an unique process to be able to align patterns on upper and lower layers. An alignment stage of the UV-curable nanoimprint process requires nano-level resolution as well as high stiffness to overcome friction force due to contact moving. In this paper, the alignment stage consists of a compliant mechanism using flexure hinges, piezo actuators for high force generation, and capacitive sensors for high-resolution measurement. The compliant mechanism is implemented by four prismatic-prismatic compliant chains for two degree-of-freedom translations. The compliant mechanism is composed of flexure hinges with high stiffness, and it is directly actuated by the piezo actuators which increases the stiffness of the mechanism, also. The performance of the ultra-precision stage is demonstrated by experiments.

Control of Nanospacing in TiO2 Nanowire Array Using Electron Beam Lithography

  • Yun, Young-Shik;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.430.1-430.1
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    • 2014
  • According to advanced nanotechnology in the field of biomedical engineering, many studies of the interaction between topography of surfaces and cellular responses have been focused on nanostructure. In order to investigate this interaction, it is essential to make well-controlled nanostructures. Electron beam lithography (EBL) have been considered the most typical processes to fabricate and control nano-scale patterns. In this work, $TiO_2$ nanowire array was fabricated with hybrid process (top-down and bottom-up processes). Nanodot arrays were patterned on the substrate by EBL process (top-down). In order to control the spacing between nanodots, we optimized the EBL process using Poly(methyl methacrylate) (PMMA) as an electron beam resist. Metal lift-off was used to transfer the spacing-controlled nanodots as a seed pattern of $TiO_2$ nanowire array. Au or Sn nanodots which play an important role for catalyst using Vapor-Liquid-Solid (VLS) method were patterned on the substrate through the lift-off process. Then, the sample was placed in the tube furnace and heated at the synthesis temperature. After heat treatment, $TiO_2$ nanowire array was fabricated from the nanodots through VLS method (bottom-up). These results of spacing-controlled nanowire arrays will be used to study the interaction between nanostructures and cellular responses in our next steps.

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UV 나노임프린트 공정에서의 수지 액적 증발 거동 분석 (Analysis of the Evaporation Behavior of Resin Droplets in UV-Nanoimprint Process)

  • 최두순;김기돈
    • 소성∙가공
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    • 제18권3호
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    • pp.268-273
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    • 2009
  • Ultraviolet nanoimprint lithography (UV-NIL), which is performed at a low pressure and at room temperature, is known as a low cost method for the fabrication of nano-scale patterns. In the patterning process, maintaining the uniformity of the residual layer is critical as the pattern transfer of features to the substrate must include the timed etch of the residual layer prior to the etching of the transfer layer. In pursuit of a thin and uniform residual layer thickness, the initial volume and the position of each droplet both need to be optimized. However, the monomer mixtures of resin had a tendency to evaporate. The evaporation rate depends on not only time, but also the initial volume of the monomer droplet. In order to decide the initial volume of each droplet, the accurate prediction of evaporation behavior is required. In this study, the theoretical model of the evaporation behavior of resin droplets was developed and compared with the available experimental data in the literature. It is confirmed that the evaporation rate of a droplet is not proportional to the area of its free surface, but to the length of its contact line. Finally, the parameter of the developed theoretical model was calculated by curve fitting to decide the initial volume of resin droplets.

ESD를 이용한 다기능 미세 프린팅 공정 (Multi-functional Micro/Nano Printing Process with ElectroSpray Deposition(ESD))

  • 김동수;이원희;임현의;박용두;이규백
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.597-598
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    • 2006
  • In this study, we used the ESD method to prepare the protein microarrays for observation the stem cell responses to pattern size, space and shapes. The ESD method allows a reduction in spot size, high efficiency of substance transfer, and high rate in fabrication as a result of ability to simultaneously deposit thousands of identical spots. Typical electro spraying conditions for the deposition of proteins were a voltage of $3{\sim}5keV$ and the humidity under 30%. The patterns of masks have a variety of shapes, spaces, and hole sizes from 10 um to $300{\mu}m$. Three kinds of proteins(collagen, fibronectin, and vitronectin dissolved in PBS) are deposited in a dry state, preserving the functional activity of proteins. Stem cells were cultured on each protein patterned sample at $37^{\circ}C$ for 1day.

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미세접촉프린팅공정을 이용한 플렉시블 디스플레이 유기박막구동소자 제작 (Fabrication of Organic Thin Film Transistor(OTFT) for Flexible Display by using Microcontact Printing Process)

  • 김광영;조정대;김동수;이제훈;이응숙
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.595-596
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    • 2006
  • The flexible organic thin film transistor (OTFT) array to use as a switching device for an organic light emitting diode (OLED) was designed and fabricated in the microcontact printing and low-temperature processes. The gate, source, and drain electrode patterns of OTFT were fabricated by microcontact printing which is high-resolution lithography technology using polydimethylsiloxane(PDMS) stamp. The OTFT array with dielectric layer and organic active semiconductor layers formed at room temperature or at a temperature tower than $40^{\circ}C$. The microcontact printing process using SAM(self-assembled monolayer) and PDMS stamp made it possible to fabricate OTFT arrays with channel lengths down to even nano size, and reduced the procedure by 10 steps compared with photolithography. Since the process was done in low temperature, there was no pattern transformation and bending problem appeared. It was possible to increase close packing of molecules by SAM, to improve electric field mobility, to decrease contact resistance, and to reduce threshold voltage by using a big dielecric.

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Role of gas flow rate during etching of hard-mask layer to extreme ultra-violet resist in dual-frequency capacitively coupled plasmas

  • 권봉수;이정훈;이내응
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.132-132
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    • 2010
  • In the nano-scale Si processing, patterning processes based on multilevel resist structures becoming more critical due to continuously decreasing resist thickness and feature size. In particular, highly selective etching of the first dielectric layer with resist patterns are great importance. In this work, process window for the infinitely high etch selectivity of silicon oxynitride (SiON) layers and silicon nitride (Si3N4) with EUV resist was investigated during etching of SiON/EUV resist and Si3N4/EUV resist in a CH2F2/N2/Ar dual-frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters, such as the CH2F2 and N2 flow ratio and low-frequency source power (PLF). It was found that the CH2F2/N2 flow ratio was found to play a critical role in determining the process window for ultra high etch selectivity, due to the differences in change of the degree of polymerization on SiON, Si3N4, and EUV resist. Control of N2 flow ratio gave the possibility of obtaining the ultra high etch selectivity by keeping the steady-state hydrofluorocarbon layer thickness thin on the SiON and Si3N4 surface due to effective formation of HCN etch by-products and, in turn, in continuous SiON and Si3N4 etching, while the hydrofluorocarbon layer is deposited on the EUV resist surface.

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고에너지 볼밀링된 Sm-Co 합금 분말의 미세조직 및 자성특성에 미치는 공정변수의 영향 (Effect of Process Parameters on Microstructure and Magnetic Properties of Sm-Co Alloy Powder Prepared by High Energy Ball Milling)

  • 김보식;장시영
    • 한국분말재료학회지
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    • 제17권2호
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    • pp.130-135
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    • 2010
  • Sm-16.7wt%Co alloy powders were prepared by high energy ball milling under the conditions of various milling time and the content of process control agent (PCA), and their microstructure and magnetic properties were investigated to establish optimum processing conditions. The initial powders employed showed irregular shape and had a size ranging from 5 to $110\;{\mu}m$. After milling for 5 h, the shape of powders changed to round shape and their mean powder size was approximately $5\;{\mu}m$, which consisted of the agglomerated nano-sized particles with 15 nm in diameter. The coercivity was reduced with increasing the milling time, whereas the saturation magnetization increased. As the content of PCA increased, the powder size minutely decreased to approximately $7\;{\mu}m$ at the PCA content of 10 wt%. The XRD patterns showed that the main diffraction peaks disappeared apparently after milling, indicating the formation of amorphous structure. The measured values of coercivity were almost unchanged with increasing the content of PCA.