Browse > Article

A Piezo-driven Ultra-precision Stage for Alignment Process of a Contact-type Lithography  

Choi, Kee-Bong (한국기계연구원 나노융합시스템연구본부)
Lee, Jae-Jong (한국기계연구원 나노융합시스템연구본부)
Kim, Gee-Hong (한국기계연구원 나노융합시스템연구본부)
Lim, Hyung-Jun (한국기계연구원 나노융합시스템연구본부)
Publication Information
Journal of the Korean Society of Manufacturing Technology Engineers / v.20, no.6, 2011 , pp. 756-760 More about this Journal
Abstract
This paper proposed an alignment stage driven by piezo actuators for alignment process of a contact-type lithography. Among contact-type lithography processes, an UV-curable nanoimprint process is an unique process to be able to align patterns on upper and lower layers. An alignment stage of the UV-curable nanoimprint process requires nano-level resolution as well as high stiffness to overcome friction force due to contact moving. In this paper, the alignment stage consists of a compliant mechanism using flexure hinges, piezo actuators for high force generation, and capacitive sensors for high-resolution measurement. The compliant mechanism is implemented by four prismatic-prismatic compliant chains for two degree-of-freedom translations. The compliant mechanism is composed of flexure hinges with high stiffness, and it is directly actuated by the piezo actuators which increases the stiffness of the mechanism, also. The performance of the ultra-precision stage is demonstrated by experiments.
Keywords
Alignment stage; Contact-type lithography; Compliant mechanism; Piezo actuator; Flexure hinge;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
1 Dauksher, W. J., Le, N. V., Ainley, E. S., Nordquist, J. J., Gehoski, K. A., Young, S. R., Baker, J. H., Convey, D., and Mangat, P. S., 2006, "Nano-imprint Lithography: Templates, Imprinting and Wafer Pattern Transfer," Microelectronic Engineering, Vol. 83, No. 4-9, pp. 929-932.   DOI   ScienceOn
2 Sreenivasan, S. V., Choi, J., Schumaker, P., and Xu, F., 2011, "Status of UV Imprint Lighography for Nanoscale Manufacturing," Comprehensive Nanoscience and Technology, Chap. 4.04, pp. 83-116.
3 Ha, J., and Jeong, K., 2009, "Fuzzy Controller Design for a Nano Precision Stage Driven by a PZT," Trans. of the Korean Society of Machine Tool Engineers, Vol. 18, No. 4, pp. 228-233.
4 Cho, B., and Seong, H., 2010, "The Design of Sliding Mode Controller for Precision Stage Using Genetic Algorithm," J. of the Korea Society of Machine Tool Engineers, Vol. 19, No. 1, pp. 101-107.
5 Physik Instrumente GmbH, 2007, The World of Micro and Nanopositioning, Physik Instrumente Catalogue.
6 Choi, K. -B., and Han, C. S., 2007, "Optimal Design of a Compliant Mechanism with Circular Notch Flexure Hinges," J. of Mechanical Engineering Science, Vol. 221, No. C3, pp. 385-392.   DOI
7 Kim, D., Lee, D. Y., and Gweon, D. G., 2007, "A New Nano-accuracy AFM System for Minimizing Abbe Errors and the Evaluation of its Measuring Uncertainty," Ultramicroscopy, Vol. 107, No. 4-5, pp. 322-328.   DOI   ScienceOn
8 Scire, F. E., and Teague, E. C., 1978, "Piezodriven 50-mm Range Stage with Subnanometer Resolution," Review of Scientific Instruments, Vo. 49, No. 12, pp. 1735-1740.   DOI   ScienceOn
9 Chang, S. H., Tseng, C. K., and Chien, H. C., 1999, "An Ultraprecision $XY\theta_z$ Piezo-micropositioner. Part I: Design and Analysis," IEEE Transactionson Ultrasonics, Ferroelectrics, and Frequecy Control, Vol. 46, No. 4, pp. 897-905.   DOI