• Title/Summary/Keyword: Nano Aperture

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Nano-size Patterning with a High Transmission C-shaped Aperture (고 투과 C 형 개구를 이용한 나노 크기 패턴 구현)

  • Park, Sin-Jeung;Kim, Yong-Woo;Lee, Eung-Man;Hahn, Jae-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.11
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    • pp.108-115
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    • 2007
  • We have designed a high transmission C-shaped aperture using finite differential time domain (FDTD) technique. The C-shaped aperture was fabricated in the aluminum thin film on a glass substrate using a focused ion beam (FIB) milling. Nano-size patterning was demonstrated with a vacuum contact device to keep tight contact between the Al mask and the photoresist. Using 405 nm laser, we recorded a 50 nm-size dot pattern on the photoresist with the aperture and analyzed the spot size dependent on the dose illuminated on the aperture.

Design of a High-Transmission C-Shaped Nano-Aperture in a Perfectly Electric Conductor Film (완전도체 박막에서 고 투과율 C형 나노 개구 설계)

  • Park Sin-Jeung;Hahn Jae-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.6 s.183
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    • pp.160-165
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    • 2006
  • We have designed a high-transmission nano aperture in a perfect electric conductor film with the incident beam of 532 nm wavelength. The aperture basically has a C-shape and is known to produce a bright spot nearby the aperture in small size less than diffraction limit. The bright spot is strongly coupled with the local plasmon excited through the aperture hole. The characteristics of transmission and peak power of the aperture output were calculated using finite differential time domain (FDTD) technique, and the geometry of the aperture was determined to get a maximum transmission and peak power. To find the effect of the surface plasmon induced near by the aperture, we calculated the variations of the transmittance and the beam sizes by changing the size of the input beam irradiated on the aperture.

Development of Optical Head Unit for Nano Optical Probe Array (나노 광 프로브 어레이 구현을 위한 광학 헤드 유닛 개발)

  • Kim H.;Lim J.;Kim S.;Han J.;Kang S.
    • Transactions of Materials Processing
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    • v.15 no.1 s.82
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    • pp.21-26
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    • 2006
  • A optical head unit for nano optical probe array was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

Development of Optical Head Unit for Nano Optical Probe Array (나노 광 프로브 어레이 구현을 위한 광학 헤드 유닛 개발)

  • Kim H.;Lim J.;Kim S.;Han J.;Kang S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.09a
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    • pp.29-34
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    • 2005
  • A optical head unit for nano optical probe away was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

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Design of a C-shaped nano-aperture in the Ag film (은 필름에서의 C형 나노 개구 설계)

  • Park, Sin-Jeung;Hahn, Jae-Won
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.38-39
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    • 2005
  • A new C-aperture is needed in the Ag film because general metal films don't alternate with the PEC film. In this paper, using FDTD method and the Drude-Lorentz metal model, a new C-aperture is designed in the Ag film and the 40nm-beam size and the $7\%$ near-field transmission efficiency are obtained at 28nm distance from the aperture. Its near-field transmission is about 1000 times larger than that of a 54 nm${\times}$54 nm square aperture.

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A Study on Performance and Sensitivity Improvement of an Off-axis TMA Telescope Optical System by Changing the Aperture-stop Position (조리개 위치 변경을 통한 비축 삼반사 망원경 광학계의 성능 및 민감도 개선 연구)

  • Lee, Han-Yul;Jun, Won-Kyoun;Lee, Sang-min;Kim, Ki-hwan;Seo, Hyun-Ju;Park, Seung-Han;Jung, Mee-Suk
    • Korean Journal of Optics and Photonics
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    • v.32 no.1
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    • pp.9-14
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    • 2021
  • In this paper we have studied an optical system according to the aperture position of an off-axis TMA telescope for satellites. An off-axis TMA telescope should have high resolution and wide field of view (FOV). In addition, the optical system should have a wide tolerance range, because it is structurally located off-axis and is difficult to assemble. However, there are differences in performance and sensitivity according to the aperture-stop position, so it is important to select a suitable aperture-stop position. Therefore, in this paper we have designed each off-axis TMA telescope according to the aperture-stop position, and have analyzed the performance and sensitivity to suggest a suitable aperture-stop position.

A Feasibility Study on the Cold Hollow Cathode Gas Ion Source for Multi-Aperture Focused Ion Beam System (다개구 이온빔 가공장치용 냉음극 방식의 가스 이온원의 가능성 평가에 관한 연구)

  • Choi, Sung-Chang;Kang, In-Cheol;Han, Jae-Kil;Kim, Tae-Gon;Min, Byung-Kwon
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.3
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    • pp.383-388
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    • 2011
  • The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 mA/$cm^2$ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.

Study on Viewing angle controllable Liquid Crystal Display with High Aperture Ratio (시야각 조절이 가능한 고개구율 액정 디스플레이 연구)

  • Shin, Suck-Jae;Her, Jung-Hwa;Lim, Young-Jin;Lee, Seung-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.173-173
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    • 2010
  • We proposed viewing angle switchable liquid crystal display(LCD) associated with fringe-field switching (FFS) mode with high aperture ratio characteristic. In the device, single pixel is separated into two regions, named as main pixel for displaying images and sub pixel for viewing angle control. In sub pixel region, add the common electrode on the top substrate and the initial alignment of liquid crystal is Hybrid Alignment Nematic (HAN) state. In conclusion, we suggested that the device has high aperture ratio characteristic because the LC directors are rotated in which viewing angle control region are generated fringe electric field.

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Plasmon Assisted Deep-ultraviolet Pulse Generation from Amorphous Silicon Dioxide in Nano-aperture

  • Lee, Hyunsu;Ahn, Heesang;Kim, Kyujung;Kim, Seungchul
    • Current Optics and Photonics
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    • v.2 no.4
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    • pp.361-367
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    • 2018
  • Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous $SiO_2$ dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules