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Nano-size Patterning with a High Transmission C-shaped Aperture  

Park, Sin-Jeung (연세대학교 기계공학과)
Kim, Yong-Woo (연세대학교 기계공학과)
Lee, Eung-Man (연세대학교 기계공학과)
Hahn, Jae-Won (연세대학교 기계공학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.24, no.11, 2007 , pp. 108-115 More about this Journal
Abstract
We have designed a high transmission C-shaped aperture using finite differential time domain (FDTD) technique. The C-shaped aperture was fabricated in the aluminum thin film on a glass substrate using a focused ion beam (FIB) milling. Nano-size patterning was demonstrated with a vacuum contact device to keep tight contact between the Al mask and the photoresist. Using 405 nm laser, we recorded a 50 nm-size dot pattern on the photoresist with the aperture and analyzed the spot size dependent on the dose illuminated on the aperture.
Keywords
Nano-aperture; FDTD; Metal permittivity; Nano-lithography; Nano-pattern;
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Times Cited By KSCI : 1  (Citation Analysis)
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