Browse > Article

A Feasibility Study on the Cold Hollow Cathode Gas Ion Source for Multi-Aperture Focused Ion Beam System  

Choi, Sung-Chang (Nano & Surface Department SongDo TechnoPark)
Kang, In-Cheol (Nano & Surface Department SongDo TechnoPark)
Han, Jae-Kil (Nano & Surface Department SongDo TechnoPark)
Kim, Tae-Gon (Department of Mechanical Engineering, Yonsei Univ.)
Min, Byung-Kwon (Department of Mechanical Engineering, Yonsei Univ.)
Publication Information
Journal of the Korean Society for Precision Engineering / v.28, no.3, 2011 , pp. 383-388 More about this Journal
Abstract
The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 mA/$cm^2$ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.
Keywords
Ion Beam; Plasma; Gas Ion Source; Nano-Fabrication; Cold Hollow Cathode;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 Salancon, E., Hammadi, Z. and Morin, R., "A new approach to gas field ion sources," Ultramicroscopy, Vol. 95, No. 1-4, pp. 183-188, 2003.   DOI
2 Guharay, S. K., Sokolovsky, E. A., Reiser, M., Orloff, J. and Melngailis, J., "Study of energy broadening of high-brightness ion beams from a surface plasma Penning source and its relevance in ion projection lithography," Microelectronic Engineering, Vol. 35, No. 1-4, pp. 435-438, 1997.   DOI
3 Choi, S. C. and Han J. K., "Surface Modification of polymer and Metal by Ion Beam or Plasma," J. Kor. Soc. Prec. Eng., Vol. 25, No. 3, pp. 32-43, 2008.
4 Gavrilov, N. V., Mesyats, G. A., Radkovski, G. V. and Bersenev, V. V., "Development of technological sources of gas ions on the basis of hollow-cathode glow discharge," Surface and Coatings Technology, Vol. 96, No. 1, pp. 81-88, 1997.   DOI   ScienceOn
5 Remy, J., Biennier, L. and Salama, F., "Plasma structure in a pulsed discharge environment," Plasma Source Sci. Technol., Vol. 12, No. 3, pp. 295-301, 2003.   DOI   ScienceOn
6 Boonyawan, D., Suanpoot, P. and Vilaithong, T., "A 13.56 MHz multicusp ion source for gaseous ionbeam production," Surface and Coating Technology, Vol. 112, No. 1-3, pp. 314-317, 1999.   DOI   ScienceOn
7 Wutte, D., Freedman, S., Gough, R., Lee, Y., Leitner, M., Leung, K. N., Lyneis, C., Pickard, D. S., Williams, M. D. and Xie, Z. Q., "Development of an rf driven multicusp ion source for nuclear science experiments," Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 142, No. 3, pp. 409-416, 1998.   DOI   ScienceOn
8 Okazaki, S., "Comparison of Optical, X-ray, Electron, and ion beam Lithography," Microelectronics Engineering, Vol. 9, No. 1-4, pp. 297-304, 1989.   DOI   ScienceOn
9 Gierak, J., Mailly, D., Faini, G., Pelouard, J. L., Denk, P., Pardo, F., Marzin, J. Y., Septier, A., Schmid, G., Ferre, J., hydamn, R., Chappert, C., Flicstein, J., Gayral, B. and Gerard, J. M., "Nano-fabrication with focused ion beams," Microelectronic Engineering, Vol. 57-58, pp. 865-875, 2001.
10 Choi, Y. S., Kim, T. G., Min, B. K. and Kim, Y. J., "Evaluation of durability and etching rate of material of the Multi-aperture plate for Multi-FIB," Proc. of KSPE Spring Conference, pp. 929-930, 2009.
11 Bruenger, W. H., Kaesmaier, R., Loeshner, H. and Springer, R., "Status of Ion Projection Lithography," Proc. of Mat. Res. Soc. Symp., Vol. 636, Paper No. D5.5, 2001.
12 Jiang, X. Q., Chang, J. A. and Leung, K. N., "Mini rfdriven ion sources for focused ion beam systems," Rev. Sci. Instrum., Vol. 74, No. 4, pp. 2288-2292, 2003.   DOI   ScienceOn