• 제목/요약/키워드: Multilayers

검색결과 425건 처리시간 0.026초

Plasma spray 공정을 이용한 BCuP-5 filler 금속/Ag 기판 복합 소재의 제조, 미세조직 및 접합 특성 (Fabrication, Microstructure and Adhesive Properties of BCuP-5 Filler Metal/Ag Plate Composite by using Plasma Spray Process)

  • 윤성준;김영균;박재성;박주현;이기안
    • 한국분말재료학회지
    • /
    • 제27권4호
    • /
    • pp.333-338
    • /
    • 2020
  • In this study, we fabricate a thin- and dense-BCuP-5 coating layer, one of the switching device multilayers, through a plasma spray process. In addition, the microstructure and macroscopic properties of the coating layer, such as hardness and bond strength, are investigated. Both the initial powder feedstock and plasma-sprayed BCuP-5 coating layer show the main Cu phase, Cu-Ag-Cu3P ternary phases, and Ag phase. This means that microstructural degradation does not occur during plasma spraying. The Vickers hardness of the coating layer was measured as 117.0 HV, indicating that the fine distribution of the three phases enables the excellent mechanical properties of the plasma-sprayed BCuP-5 coating layer. The pull-off strength of the plasma-sprayed BCuP-5 coating layer is measured as 16.5 kg/㎠. Based on the above findings, the applicability of plasma spray for the fabrication process of low-cost multi-layered electronic contact materials is discussed and suggested.

폴리이미드 LB 필름을 이용한 패터닝 및 생물전자 소자로의 응용에 관한 연구 (Studies on the Patterning of Polyimide LB Film and Its Application for Bioelectronic Device)

  • 오세용;박준규;정찬문;최정우
    • 폴리머
    • /
    • 제26권5호
    • /
    • pp.634-643
    • /
    • 2002
  • 고분자 주사슬에 벤젠과 sulfonyloxvimide moiety를 가지고 있는 polyamic acid 초박막을 LB 기법을 이용하여 제조한 다음 200 $^{\circ}C$에서 1시간 동안 열처리에 의해 감광성 폴리이미드 LB 필름을 얻었다. Polyamic acid는 THF-pyridine 공용매를 가지고 축중합에 의해 합성하였다. 모든 단량체와 고분자는 원소분석, FT-IR, $^1$H-NMR의 분광학적 측정을 통해 정량 정성분석을 행하였다. UV lithography 방법을 사용하여 금 기판 위에 제조한 감광성 폴리이미드 LB 필름의 마이크로 어레이 패턴을 제조하였다. 형성된 마이크로 어레이 패턴을 따라 두 가지의 자기조립 방법으로 단백질 cytochrome c 단분자 막을 고정화시켰다. 자기조립된 cytochrome c 단분자 막의 물리ㆍ전기 화학적 특성은 cyclic voltammetry와 AFM을 통해 조사하였으며 생물전자소자로의 응용 가능성에 대해서도 검토하였다.

Separating nanocluster Si formation and Er activation in nanocluster-Si sensitized Er luminescence

  • 김인용;신중훈;김경중
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
    • /
    • pp.109-109
    • /
    • 2010
  • $Er^{3+}$ ion shows a stable and efficient luminescence at 1.54mm due to its $^4I_{13/2}\;{\rightarrow}\;^4I_{15/2}$ intra-4f transition. As this corresponds to the low-loss window of silica-based optical fibers, Er-based light sources have become a mainstay of the long-distance telecom. In most telecom applications, $Er^{3+}$ ions are excited via resonant optical pumping. However, if nanocluster-Si (nc-Si) are co-doped with $Er^{3+}$, $Er^{3+}$ can be excited via energy transfer from excited electrical carriers in the nc-Si as well. This combines the broad, strong absorption band of nc-Si with narrow, stable emission spectra of $Er^{3+}$ to allow top-pumping with off-resonant, low-cost broadband light sources as well as electrical pumping. A widely used method to achieve nc-Si sensitization of $Er^{3+}$ is high-temperature annealing of Er-doped, non-stoichiometric amorphous thin film with excess Si (e.g.,silicon-rich silicon oxide(SRSO)) to precipitate nc-Si and optically activate $Er^{3+}$ at the same time. Unfortunately, such precipitation and growth of nc-Si into Er-doped oxide matrix can lead to $Er^{3+}$ clustering away from nc-Si at anneal temperatures much lower than ${\sim}1000^{\circ}C$ that is necessary for full optical activation of $Er^{3+}$ in $SiO_2$. Recently, silicon-rich silicon nitride (SRSN) was reported to be a promising alternative to SRSO that can overcome this problem of Er clustering. But as nc-Si formation and optical activation $Er^{3+}$ remain linked in Er-doped SRSN, it is not clear which mechanism is responsible for the observed improvement. In this paper, we report on investigating the effect of separating the nc-Si formation and $Er^{3+}$ activation by using hetero-multilayers that consist of nm-thin SRSO or SRSN sensitizing layers with Er-doped $SiO_2$ or $Si_3N_4$ luminescing layers.

  • PDF

접지된 유전체 평면위의 저항띠 격자구조에 의한 TE 산란 해석 (Analysis of the TE Scattering by a Resistive Strip Grating Over a Grounded Dielectric Plane)

  • 윤의중
    • 한국항행학회논문지
    • /
    • 제10권3호
    • /
    • pp.198-204
    • /
    • 2006
  • 본 논문에서는 스트립 폭과 격자주기, 유전체 층의 비유전율과 두께, 그리고 TE(transverse electric) 평면파의 입사각에 따른 접지된 유전체 평면위의 저항띠 격자구조에 의한 TE 산란 문제를 수치해석 방법인 FGMM(Fourier-Galerkin Moment Method)를 이용하여 해석하였다. 유도되는 표면전류밀도는 간단한 함수인 지수 함수를 사용하여 Fourier 급수로 전개하였다. 유전체층의 비유전율과 두께가 증가함에 따라 반사전력이 증가하였고, 반사전력의 급변점들은 공진효과에 기인한 것으로 과거에 wood's anomallies[7]라고 불리워졌다. 제안된 방법의 검증을 위하여 기존의 완전도체 경우인 균일 저항율 R = 0에 대한 정규화된 반사전력의 수치결과는 기존의 논문들과 일치하였다.

  • PDF

유리기판 위에 형성된 Al/Ni 및 TiW/Ni 다층 금속배선막의 계면 접합력 및 나노압입특성 평가 (Measurement of Adhesion Strength and Nanoindentation of Metal Interconnections of Al/Ni and TiW/Ni Layers Formed on Glass Substrate)

  • 조철민;김재호;황소리;윤여현;오용준
    • 대한금속재료학회지
    • /
    • 제48권12호
    • /
    • pp.1116-1122
    • /
    • 2010
  • Metal interconnections of multilayer Al/Ni and TiW/seed-Ni/Ni were formed on glass, and the adhesion strength and nanoindentation response of the composite layers were evaluated. The Al/Ni multilayer was formed by an anodic bonding of glass to Al and subsequent electroless plating of Ni, while the TiW/Ni multilayer was fabricated by sputter deposition of TiW and seed-Ni onto glass and electroless plating of Ni. Because of the diffusion of aluminum into glass during the anodic bonding, anodically bonded glass/Al joint exhibited greater interfacial strength than the sputtered glass/TiW one. The Al/Ni on glass also showed excellent resistance against delamination by bending deformation compared to the TiW/seed-Ni/Ni on glass. From the nanoindentation experiment of each metal layer on glass, it was found that the aluminum layer had extremely low hardness and elastic modulus similar to the glass substrate and played a beneficial role in the delamination resistance by lessening stress intensification at the joint. The indentation data of the multilayers also supported superior joint reliability of the Al/Ni to glass compared to that of the TiW/seed-Ni/Ni to glass.

Hardness and Oxidation Resistance of Ti0.33Al0.67N/CrN Nano-multilayered Superlattice Coatings

  • Ahn, Seung-Su;Oh, Kyung-Sik;Chung, Tai-Joo;Park, Jong-Keuk
    • 한국세라믹학회지
    • /
    • 제56권1호
    • /
    • pp.49-55
    • /
    • 2019
  • $Ti_{0.33}Al_{0.67}N/CrN$ nano-multilayers, which are known to have excellent wear resistance, were prepared using an unbalanced magnetron sputter to have various periods of 2-5 nm. $Ti_{0.33}Al_{0.67}N$ had a hexagonal structure in a single layer, but converted to a cubic structure by forming a multilayer with CrN, which has a cubic structure. Thus, $Ti_{0.33}Al_{0.67}N$ formed a superlattice in the multilayer. The $Ti_{0.33}Al_{0.67}/CrN$ multilayer with a period of 2.5 nm greatly exceeded the hardness of the $Ti_{0.33}Al_{0.67}N$ and the CrN single layer, reaching 39 GPa. According to the low angle X-ray diffraction results, the $Ti_{0.33}Al_{0.67}N/CrN$ multilayer maintained its as-coated structure to a temperature as high as $700^{\circ}C$ and exhibited hardness of 30 GPa. The thickness of the oxide layer of the $Ti_{0.33}Al_{0.67}N/CrN$ multilayered coating was less than one-tenth of those of the single layers. Thus, $Ti_{0.33}Al_{0.67}N/CrN$ multilayered coating had hardness and oxidation resistance far superior to those of its constituent single layers.

양자점과 정공 수송 물질의 혼합층을 사용한 양자점 전계발광 소자의 특성 연구 (A Study on the Characteristics of a Quantum Dots Light-Emitting Diodes Using a Mixed Layer of Quantum Dots and Hole Transport Materials)

  • 윤창기;오성근;김지완
    • 마이크로전자및패키징학회지
    • /
    • 제28권4호
    • /
    • pp.69-72
    • /
    • 2021
  • Quantum Dot Light-Emitting Diodes (QLEDs)는 제조 공정이 용액 공정을 기반으로 하기 때문에 잉크젯 공정에 쉽게 적용할 수 있다. 하지만 QLED의 적층은 서로 다른 용매를 사용하는 직교 공정이 필요하기 때문에 잉크젯 인쇄 공정이 더 복잡하며 비용이 상승한다. 따라서 한 번의 공정으로 두 개의 층을 증착하면 제조 단계를 줄일 수 있어 공정 시간이 절감된다. 이 연구에서 우리는 QD와 정공 수송 재료의 혼합물을 사용하여 standard 구조의 QLED를 제작하였다. TFB와 QD를 클로로벤젠에 분산시켜 혼합층에 사용하였고, 소자는 45,850 cd/m2의 최고 휘도를 나타내었다. 이 연구는 잉크젯 프린팅 공정을 적용하여 전계발광 장치를 제작할 수 있는 가능성을 확인하였다.

Structure and Physical Properties of Fe/Si Multiayered Films with Very Thin Sublayers

  • Baek, J.Y;Y.V.Kudryavtsev;J.Y.Rhee;Kim, K.W.;Y.P.Le
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
    • /
    • pp.173-173
    • /
    • 2000
  • Multilayered films (MLF) consisting of transition metals and semiconductors have drawn a great deal of interest because of their unique properties and potential technological applications. Fe/Si MLF are a particular topic of research due to their interesting antiferromagnetic coupling behavior. although a number of experimental works have been done to understand the mechanism of the interlayer coupling in this system, the results are controversial and it is not yet well understood how the formation of an iron silicide in the spacer layers affects the coupling. The interpretation of the coupling data had been hampered by the lack of knowledge about the intermixed iron silicide layer which has been variously hypothesized to be a metallic compound in the B2 structure or a semiconductor in the more complex B20 structure. It is well known that both magneto-optical (MO0 and optical properties of a metal depend strongly on their electronic structure that is also correlated with the atomic and chemical ordering. In order to understand the structure and physical properties of the interfacial regions, Fe/Si multilayers with very thin sublayers were investigated by the MO and optical spectroscopies. The Fe/si MLF were prepared by rf-sputtering onto glass substrates at room temperature with a totall thickness of about 100nm. The thicknesses of Fe and Si sublayers were varied from 0.3 to 0.8 nm. In order to understand the fully intermixed state, the MLF were also annealed at various temperatures. The structure and magnetic properties of Fe/Si MLF were investigated by x-ray diffraction and vibrating sample magnertometer, respectively. The MO and optical properties were measured at toom temperature in the 1.0-4.7 eV energy range. The results were analyzed in connection with the MO and optical properties of bulk and thin-film silicides with various structures and stoichiometries.

  • PDF

NIR 협대역 투과 필터 응용을 위한 LED 실리콘 봉지재 위에 직접 E-beam으로 증착 된 SiO2/TiO2 다층 박막 설계 및 제작 (Design and Fabrication of SiO2/TiO2 Multi Layer Thin Films on Silicon Encapsulation of LED Deposited by E-beam Evaporation for NIR Narrow Band Pass Filter Application)

  • 김동표;김경섭;김구철;정중채
    • 한국전기전자재료학회논문지
    • /
    • 제35권2호
    • /
    • pp.165-171
    • /
    • 2022
  • The SiO2/TiO2 multilayer thin films used for narrow band pass filter were fabricated using E-beam evaporation method. The narrow band pass filter was used to enhance the resolution of spectroscopy and sensor applications with near infrared (NIR) light source. The narrow band pass filter with multilayer thin films were designed with Essential Macleod program. The multilayers of SiO2/TiO2 with 32 layers were deposited on the silicon encapsulation of IR with peak wavelength (λp) of 660 nm and NIR LEDs with λp of 830 nm, 880 nm, and 955 nm. After NIR light passed through the narrow band pass filter, the full width of half maximum of 33.4~48.6 nm became narrow to 20~24 nm owing to the absorption of photons with short or long wavelength of designed band of 20 nm. The SiO2/TiO2 band pass filter fabricated in this study can be used for sensor, optoelectronics, and NIR spectroscopy applications.

Pd층의 두께 변화에 따른 [Co/Pd] 다층박막의 연엑스선 방사광 분광 연구 (Soft X-ray Synchrotron-Radiation Spectroscopy Study of [Co/Pd] Multilayers as a Function of the Pd Sublayer Thickness)

  • 김대현;이은숙;김현우;성승호;강정수;양승모;박해수;홍진표
    • 한국자기학회지
    • /
    • 제26권4호
    • /
    • pp.124-128
    • /
    • 2016
  • 이 연구에서는 연 X선 광흡수 분광법(soft X-ray absorption spectroscopy: XAS)과 연 X선 자기 원편광 이색성(soft X-ray magnetic circular dichroism: XMCD)을 이용하여 수직자기이방성을 보이는 [$Co(2{\AA})/Pd(x{\AA})$] 형의 다층박막의 전자구조를 연구하였다(x = $1{\AA}$, $3{\AA}$, $5{\AA}$, $7{\AA}$, $9{\AA}$). Co 2p XAS와 XMCD 스펙트럼은 Pd 층의 두께 변화에 상관없이 서로 매우 유사하였으며, 또한 Co 금속의 Co 2p XAS와 XMCD 스펙트럼과도 매우 유사함이 관찰되었는데, 이러한 결과는 [$Co(2{\AA})/Pd(x{\AA})$] 다층박막에서 Co 이온들이 금속 결합을 하고 있다는 사실을 보여 준다. Co 2p XMCD 스펙트럼을 분석하여 두께에 따른 궤도 자기모멘트(orbital magnetic moment)와 스핀 자기모멘트(spin magnetic moment) 의 크기를 결정하였다. 이 결과에 의하면 Pd 층의 두께(x)가 $1{\AA}$에서 $3{\AA}$으로 증가할 때, 궤도 자기모멘트가 가장 크게 증가하였으며, $x{\geq}3{\AA}$ 이상의 영역에서는 별 다른 변화가 없었다. 이러한 결과는 [$Co(2{\AA})/Pd(x{\AA})$] 다층박막의 계면에서의 스핀-궤도 상호작용이 수직자기 이방성에 매우 중요한 역할을 한다는 사실을 나타낸다.