Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Design and Fabrication of SiO2/TiO2 Multi Layer Thin Films on Silicon Encapsulation of LED Deposited by E-beam Evaporation for NIR Narrow Band Pass Filter Application

NIR 협대역 투과 필터 응용을 위한 LED 실리콘 봉지재 위에 직접 E-beam으로 증착 된 SiO2/TiO2 다층 박막 설계 및 제작

  • 김동표 (여주대학교 반도체시스템과) ;
  • 김경섭 (여주대학교 반도체시스템과) ;
  • 김구철 ((주)IVU테크 기술연구소) ;
  • 정중채 (전남테크노파크 정책기획단)
  • Received : 2021.11.10
  • Accepted : 2021.11.19
  • Published : 2022.03.01
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Abstract

The SiO2/TiO2 multilayer thin films used for narrow band pass filter were fabricated using E-beam evaporation method. The narrow band pass filter was used to enhance the resolution of spectroscopy and sensor applications with near infrared (NIR) light source. The narrow band pass filter with multilayer thin films were designed with Essential Macleod program. The multilayers of SiO2/TiO2 with 32 layers were deposited on the silicon encapsulation of IR with peak wavelength (λp) of 660 nm and NIR LEDs with λp of 830 nm, 880 nm, and 955 nm. After NIR light passed through the narrow band pass filter, the full width of half maximum of 33.4~48.6 nm became narrow to 20~24 nm owing to the absorption of photons with short or long wavelength of designed band of 20 nm. The SiO2/TiO2 band pass filter fabricated in this study can be used for sensor, optoelectronics, and NIR spectroscopy applications.

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References

  1. A. Alabugin, Photochem. Photobiol., 95, 722 (2019). [DOI: https://doi.org/10.1111/php.13068]
  2. D. C. Chen, V. G. Agopian, J. R. Avasino, S. M. Farely, and M. G. Stelzner, J. Surg. Res., 130, 222 (2005). [DOI: https://doi.org/10.1016/j.jss.2005.11.170]
  3. L. Shi, L. A. Sordillo, A. Rodriguez-Contreras, and R. Alfano, J. Biophotonics, 9, 38 (2016). [DOI: https://doi.org/10.1002/jbio.201500192]
  4. J. T. Kim, S. B. Bae, and D. H. Yoon, Electron. Telecom. Trends, 25, 59 (2010). [DOI: https://doi.org/10.22648/ETRI.2010.J.250506]
  5. E. W. Park, J. Biomed. Eng. Res., 40, 125 (2019). [DOI: https://doi.org/10.9718/JBER.2019.40.4.125]
  6. S. E. Jo, H. Lee, S. J. Hong and J. H. Kang, J. Acupunct. Res., 32, 211 (2015). [DOI: https://doi.org/10.13045/acupunct.2015053]
  7. K. G. Lee, J. H. Shin, K. J. Lee, S. H. Sun, C. H. Han, and I. S. Jang, J. Int. Korean Med., 35, 546 (2014).
  8. E. Sato, A. Yoshida, T. Someya, Y. Oda, S. Yoshida, K. Yoshioka, Y. Sato, H. Moriyama, and M. Watanabe, Physics Open, 2, 100010 (2019). [DOI: https://doi.org/10.1016/j.physo.2019.100010]
  9. D. P. Kim and K. S. Kim, J. Korean Inst. Electr. Electron. Mater. Eng., 34, 44 (2021). [DOI: https://doi.org/10.4313/JKEM.2021.34.1.44]
  10. K. M. Yoo, J. H. Son, H. M. Jo, S. H. Kang, S. S. Kang, and S. J. Park, J. Korean Soc. Ind. Conv., 23, 701 (2020). [DOI: https://doi.org/10.21289/KSIC.2020.23.4.701]
  11. H. W. Park and C. H. Oh, J. Korean Photodyn. Assoc., 4, 36 (2007).
  12. H. Yuan, C. Liu, H. Wang, L. Wang, and L. Dai, Spectrochim. Acta, Part A: Mol. Biomol. Spectrosc., 264, 120251 (2022). [DOI: https://doi.org/10.1016/j.saa.2021.120251]
  13. H. M. Lee, H. R. Kim, W. B. Yoon, Y. J. Kim, K. G. Kim, S. K. Kim, H. Yoo, S. H. Lee, M. S. Shin, and K. C. Kwon, Korean J. Opt. Photon., 26, 23 (2015). [DOI: https://doi.org/10.3807/KJOP.2015.26.1.023]
  14. M. C. Park, G. C. Go, and H. J. Lee, J. Korean Oph. Opt. Soc., 16, 357 (2011).
  15. Y. G. Chung and H. S. Park, J. Korean Acad.-Ind. Coop. Soc., 16, 4121 (2015). [DOI: https://doi.org/10.5762/KAIS.2015.16.6.4121]