• Bulletin of the Korean Chemical Society
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• 제24권1호
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• pp.49-54
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• 2003

TiO₂nanoparticles were synthesized using the metallorganic chemical vapor deposition process. Particles with and without metal ion dopants were obtained. X-ray photoelectron and energy dispersive X-ray spectroscopic measurements confirmed the stoichiometry of the TiO₂nanoparticles. X-ray diffraction patterns showed a polycrystalline anatase structure of TiO₂. Transmission electron microscopy revealed that these particles are of nanoscale dimensions. Exact particle size and size distribution analyses were carried out by dynamic light scattering. The average particle size was determined to be 22 nm. The nanosize particles provided large surface area for photocatalysis and a large number of free surface-charge carriers, which are crucial for the enhancement of photocatalytic activity. To improve the photocatalytic activity, metal ions, including transition metal ions $(Pd^{2+},\;Pt^{4+},\;Fe^{3+})$ and lanthanide ion $(Nd^{3+})$ were added to pure TiO₂nanoparticles. The effects of dopants on photocatalytic kinetics were investigated by the degradation of 2-chlorophenol under an ultraviolet light source. The results showed that the TiO₂nanoparticles with the metal ion dopants have higher photocatalytic activity than undoped TiO₂. The $Nd^{3+}$ ion of these dopant metal ions showed the highest catalytic activity. The difference in the photocatalytic activity with different dopants is related to the different ionic radii of the dopants.

• 전자공학회논문지D
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• 제34D권5호
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• pp.45-51
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• 1997

Low temperature activation of dopants which were doped using ion mass doping system in amorphous silicon(a-Si) thin films was investigated. With a 20.angs.-thick Ni film on top of the a-Si thin film, the activation temperature of dopants lowered to 500.deg. C. When the doping was performaed after the deposition of Ni thin film on the a-Si thin films (post-doping), the activation time was shorter than that of dopants mass, the activation time of the dopants doped by pre-doping method increased. It turned NiSi2 formation, while the decrease of activation time was mainly due to the enhancement of the NiSi2 formation by mixing of Ni and a-Si at the interface of Ni and a -Si thin during the ion doping process.

• 전자공학회논문지D
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• 제35D권5호
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• pp.48-53
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• 1998

Poly-Si TFT's could be fabricated on glass substrates by metal induced lateral crystallization (MILC) method at 450.deg. C. Channel area of the poly-Si TFT's was laterally crystallized from source and drain areas, where a thn nickel film was deposited. Dopants activation for the formation of source and drain region could be achieved by thermal annealing at 450.deg. C after the ion mass doping of phosphorus. The field effect mobility of thus formed N-channel poly-Si TFT's was 76cm$^{2}$/Vs, and the on/off current ratio was higher than 7E6.

• 한국세라믹학회지
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• 제38권9호
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• pp.782-786
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• 2001

Cobalt silicide has been employed to Embedded DRAM (Dynamic Random Access Memory) and Logic (EDL) as contact material to improve its speed. We have investigated the influences of Ti and TiN capping layers on cobalt-silicided Complementary Metal-Oxide-Semiconductor (CMOS) device characteristics. TiN capping layer is shown to be superior to Ti capping layer with respect to high thermal stability and the current driving capability of pMOSFETs. Secondary Ion Mass Spectrometry (SIMS) showed that the Ti capping layer could not prevent the out-diffusion of boron dopants. The resulting operating current of MOS devices with Ti capping layer was degraded by more than 10%, compared with those with TiN.

• 한국세라믹학회지
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• 제52권5호
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• pp.331-337
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• 2015

$LaBO_3$ (B = Cr, Mn, Fe, Co, and Ni) perovskites, the most common perovskite-type mixed ionic-electronic conductors (MIECs), are promising candidates for intermediate-temperature solid oxide fuel cell (IT-SOFC) cathodes. The catalytic activity on MIEC-based cathodes is closely related to the bulk ionic conductivity. Doping B-site cations with other metals may be one way to enhance the ionic conductivity, which would also be sensitively influenced by the chemical composition of the dopants. Here, using density functional theory (DFT) calculations, we quantitatively assess the activation energies of bulk oxide ion diffusion in $LaBO_3$ perovskites with a wide range of combinations of B-site cations by calculating the oxygen vacancy formation and migration energies. Our results show that bulk oxide ion diffusion dominantly depends on oxygen vacancy formation energy rather than on the migration energy. As a result, we suggest that the late transition metal-based perovskites have relatively low oxygen vacancy formation energies, and thereby exhibit low activation energy barriers. Our results will provide useful insight into the design of new cathode materials with better performance.

• 전기화학회지
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• 제3권2호
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• pp.85-89
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• 2000

Lithium ion Battery(LIB)의 음극 활물질로써 리튬을 대체하기 위한 노력으로 phenol resin을 탄화시킨 탄소재료를 사용하였다. Phenol resin을 소성하면 축합반응을 일으키면서 탄화되어 무정형 탄소가 된다. 무정형 탄소는 층간거리가 넓어 리튬의 삽입과 탈리가 용이하지만 탄소간의 결합력이 약하여 구조적 붕괴가 일어난다. 이러한 문제를 해결하기 위해 세공형성제로서 $ZnCl_2$를 사용하였다. $ZnCl_2$는 생성된 물질에서 3차원적 망상구조로 성장하는 개방세공을 형성하는 세공형성제로서 뿐만 아니라, 벌크 첨가제가 도핑된 느슨한 구조를 형성하는 미세세공 형성제로서 작용하였다. SEM을 통해서 구조적 차이를 알 수 있었으며, XRD분석으로 층간의 거리를 알 수 있었다. CV측정을 통해 두 가지 샘플에 대한 산화와 환원 반응의 차이를 알아보았다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1995년도 추계학술대회 논문집
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• pp.77-80
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• 1995

GaSb crystals were grown by the vertical Bridgman method. P-type GaSb crystals were grown with Ga:Sb=1:1 at % ratio without dopants and with Te, respectively. Also, GaSb:Te crystals were investigated. Lattice constants were 6.117${\AA}$ for p-type. The carrier concentration, the resistivity, and the carrier mobility measured by the van der Pauw method were p≡8 x $10^{16}$$cm^{-3}$, p≡0.20$\Omega$-cm, ${\mu}$$_{n}$≡$400\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for p-type, n≡1 x $10^{17}$$cm^{-3}$, p≡0.15 $\Omega$-cm, ${\mu}$$_{n}$≡$500\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for n-type at 300K. In case of treating with metal ion of $Ru^{+3}$, $Pt^{+1}$, p≡2 x $10^{17}$$cm^{-3}$, p≡0.08$\Omega$-cm, ${\mu}$$_{n}$≡420$\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for p-type, n≡2.5 x $10^{17}$$cm^{-13}$, p≡0.07 $\Omega$-cm, ${\mu}$$_{n}$≡520$\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for n-type were obtained.

• 대한전자공학회논문지SD
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• 제47권10호
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• pp.14-22
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• 2010

기존의 n-type metal-oxide-semiconductor field effect transistor(NMOSFET)은 $n^+/p^{(+)}/n^+$ type의 이온 주입을 통하여 소스/채널/드레인 영역을 형성하게 된다. 30 nm 이하의 채널 길이를 갖는 초미세 소자를 제작함에 있어서 설계한 유효 채널 길이를 정확하게 얻기 위해서는 주입된 이온들을 완전히 activation하여 전류 수준을 향상시키면서도 diffusion을 최소화하기 위해 낮은 thermal budget을 갖도록 공정을 설계해야 한다. 실제 공정에서의 process margin을 완화할 수 있도록 오히려 p-type 채널을 형성하져 않으면서도 기존의 NMOSFET의 동작을 온전히 구현할 수 있는 junctionless(JL) MOSFET이 연구중이다. 본 논문에서는 3차원 소자 시뮬레이션을 통하여 silicon nanowire(SNW) 구조에 접목시킨 JL MOSFET을 최적 설계하고 그러한 조건의 소자에 대하여 conductance, maximum oscillation frequency($f_{max}$), current gain cut-off frequency($f_T$) 등의 기본적인 고주파 특성을 분석한다. 채널 길이는 30 nm이며 설계 변수는 채널 도핑 농도와 채널 SNW의 반지름이다. 최적 설계된 JL SNW NMOSFET에 대하여 동작 조건($V_{GS}$ = $V_{DS}$ = 1.0 V)에서 각각 367.5 GHz, 602.5 GHz의 $f_T$, $f_{max}$를 얻을 수 있었다.