• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.6
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• pp.602-607
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• 2004

This paper describes the characteristics of Ru-Zr alloy gate electrodes deposited by co-sputtering. The various atomic composition was made possible by controlling sputtering power of Ru and Zr. Thermal stability was examined through 600 and 700 $^{\circ}C$ RTA annealing. Variation of oxide thickness and X-ray diffraction(XRD) pattern after annealing were employed to determine the reaction at interface. Low and relatively stable sheet resistances were observed for Ru-Zr alloy after annealing. Electrical properties of alloy film were measured from MOS capacitor and specific atomic composition of Zr and Ru was found to yield compatible work function for nMOS. Ru-Zr alloy was stable up to $700^{\circ}C$ while maintaining appropriate work function and oxide thickness.

• Korean Journal of Metals and Materials
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• v.49 no.4
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• pp.304-312
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• 2011

In this study, MOSFET type micro hydrogen gas sensors with platinum catalytic metal gates were designed, fabricated, and their electrical characteristics were analyzed. The devised MOSFET Hydrogen Sensors, called MHS-1 and -2, were designed with a platinum gate for hydrogen gas adsorption, and an additional sensing part for higher gas sensitivity and with a micro heater for operation temperature control. In the electrical characterization of the fabricated Pt-gate MOSFET (MHS-1), the saturated drain current was 3.07 mA at 3.0 V of gate voltage, which value in calculation was most similar to measurement data. The amount of threshold voltage shift and saturated drain current increase to variation of hydrogen gas concentration were calculated and the hydrogen gas sensing properties were anticipated and analyzed.

• Transactions of Materials Processing
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• v.10 no.3
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• pp.223-234
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• 2001

The characteristics of thixoforming process can decrease liquid segregation because of the improvement in fluidity in a globular microstructure state and utilizes flow without an air entrapment. Therefore, in order to obtain the sound parts of metal matrix composites by using thixoforming process which has co-existing solidus-liquidus phase, it is very important to design a die shape property and to obtain the fabrication conditions which affect the unifomity of the solid fraction on unfilling state and various defects throughout the fabricated parts. The die designs and fabrication conditions to obtain the good piston part are proposed for thixoforging process of metal matrix composites. When reheated metal matrix composites billets were transferred to the closed die gate, thixoforging were carried out under the various pressure(60, 80, 100MPa) with controled forging speed. The mechanical properties such as hardness and tensile strength for thixoforged parts have been investigated after T6 heat treatment.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.1
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• pp.206-221
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• 1995

Metal-Metal Matrix(M$^{3}$) layout is a recently proposed layout style which uses minimum amount of poly wires for high speed operation. In this paper we propose a method of generating functional modules in M$^{3}$ layout style. In the proposed method the transistors and the input/output lines of the given circuit are first placed in M$^{3}$ layout style and then they are interconnected using two metal layers. We develop a new placement method by simulated annealing, and we modify the well known channel routing method for the interconnections. When we applied our method to several logic circuits, the area of the generated layout is smaller than the ones by the previously known method. Our results also compares favorably to the other layout styles like gate matrix layout.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.219-220
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• 2009

이번 실험에서는 TiN의 건식 식각 특성을 연구하기 위해 $BCl_3/Ar/N_2$ 유도 결합플라즈마를 이용하였다. BCl3와 Ar의 가스 비율이 $BCl_3$ (5 sccm)/Ar (15 sccm)/N (4 sccm) 인 상황에서 RF power와 DC bias, 그리고 process pressure을 식각변수로 설정하였다. TiN의 식각률은 Alpha-step 500으로 측정하였고 표면의 식각 후 화학반응은 XPS로 측정하였다.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.16 no.6
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• pp.63-68
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• 2017

The purpose of this study is to improve the whitening phenomenon around the PET preform gate for blow molding. CAE analysis of plastic injection molding has been applied to design of preform shape and select the injection molding conditions. A ceramic insulation gate with lower thermal conductivity than metal is applied to improve the whitening phenomenon created around the gate in the injection molding process. According to the results of CAE analysis, the warpage deformation at the square corner was estimated to be about 0.34 mm at the bottom. From the results of the temperature history analysis, it was confirmed that the resin near the gate cooled more rapidly than the cavity. Ceramic insulated gates were fabricated to reduce the cooling rate and experiments were conducted to confirm the effectiveness of the whitening phenomenon improvement. As a result of the ceramic insulation gate experiment, it was confirmed that the whitening phenomenon was significantly reduced around the gate.

• JSTS:Journal of Semiconductor Technology and Science
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• v.13 no.3
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• pp.245-251
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• 2013

The effect of band-to-band tunneling (BTBT) leads to an obvious increase of the leakage current of junctionless (JL) transistors in the OFF state. In this paper, we propose an effective method to decline the influence of BTBT with the example of n-type double gate (DG) JL metal-oxide-semiconductor field-effect transistors (MOSFETs). The leakage current is restrained by changing the geometrical shape and the physical dimension of the gate of the device. The optimal design of the JL MOSFET is indicated for reducing the effect of BTBT through simulation and analysis.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.6
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• pp.41-50
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• 1995

A state-of-the-arts GaAs power metal semiconductor field effect transistor (MESFET) for 3.3V operation digital hand-held phone at 900 MHz has been developed for the first time, The FET was fabricated using a low-high doped structures grown by molecular beam epitaxy (MBE). The fabricated MESFETs with a gate width of 16 mm and a gate length of 0.8 .mu.m shows a saturated drain current (Idss) of 4.2A and a transconductance (Gm) of around 1700mS at a gate bias of -2.1V, corresponding to 10% Idss. The gate-to-drain breakdown voltage is measured to be 28 V. The rf characteristics of the MESFET tested at a drain bias of 3.3 V and a frequencyof 900 MHz are the output power of 32.3 dBm, the power added efficiency of 68%, and the third-ordr intercept point of 49.5 dBm. The power MESFET developed in this work is expected to be useful as a power amplifying device for digital hand-held phone because the high linear gain can deliver a high power added efficiency in the linear operation region of output power and the high third-order intercept point can reduce the third-order inter modulation.

• Carbon letters
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• v.21
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• pp.8-15
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• 2017

The thermoelectric Seebeck and Peltier effects of a single walled carbon nanotube (SWCNT) quantum dot nanodevice are investigated, taking into consideration a certain value of applied tensile strain and induced ac-field with frequency in the terahertz (THz) range. This device is modeled as a SWCNT quantum dot connected to metallic leads. These two metallic leads operate as a source and a drain. In this three-terminal device, the conducting substance is the gate electrode. Another metallic gate is used to govern the electrostatics and the switching of the carbon nanotube channel. The substances at the carbon nanotube quantum dot/metal contact are controlled by the back gate. Results show that both the Seebeck and Peltier coefficients have random oscillation as a function of gate voltage in the Coulomb blockade regime for all types of SWCNT quantum dots. Also, the values of both the Seebeck and Peltier coefficients are enhanced, mainly due to the induced tensile strain. Results show that the three types of SWCNT quantum dot are good thermoelectric nanodevices for energy harvesting (Seebeck effect) and good coolers for nanoelectronic devices (Peltier effect).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.36 no.2
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• pp.129-135
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• 2023

An analytical threshold voltage model is presented to observe the change in threshold voltage shift ΔV_th of a junctionless double gate MOSFET using ferroelectric-metal-SiO₂ as a gate oxide film. The negative capacitance transistors using ferroelectric have the characteristics of increasing on-current and lowering off-current. The change in the threshold voltage of the transistor affects the power dissipation. Therefore, the change in the threshold voltage as a function of theferroelectric thickness is analyzed. The presented threshold voltage model is in a good agreement with the results of TCAD. As a results of our analysis using this analytical threshold voltage model, the change in the threshold voltage with respect to the change in the ferroelectric thickness showed that the threshold voltage increased with the increase of the absolute value of charges in the employed ferroelectric. This suggests that it is possible to obtain an optimum ferroelectric thickness at which the threshold voltage shift becomes 0 V by the voltage across the ferroelectric even when the channel length is reduced. It was also found that the ferroelectric thickness increased as the silicon thickness increased when the channel length was less than 30 nm, but the ferroelectric thickness decreased as the silicon thickness increased when the channel length was 30 nm or more in order to satisfy ΔV_th=0.