• Title/Summary/Keyword: Memory access

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The Study on Dielectric Property and Thermal Stability of $Ta_2O_{5}$ Thin-films ($Ta_2O_{5}$ 커패시터 박막의 유전 특성과 열 안정성에 관한 연구)

  • Kim, In-Seong;Lee, Dong-Yun;Song, Jae-Seong;Yun, Mu-Su;Park, Jeong-Hu
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.51 no.5
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    • pp.185-190
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    • 2002
  • Capacitor material utilized in the downsizing passive devices and dynamic random access memory(DRAM) requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. Common capacitor materials, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$,TaN and et al., used until recently have reached their physical limits in their application to several hundred angstrom scale capacitor. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25 ~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism, design and fabrication for $Ta_2O_{5}$ film capacitor. This study presents the structure-property relationship of reactive-sputtered $Ta_2O_{5}$ MIM capacitor structure processed by annealing in a vacuum. X-ray diffraction patterns skewed the existence of amorphous phase in as-deposited condition and the formation of preferentially oriented-$Ta_2O_{5}$ in 670, $700^{\circ}C$ annealing. On 670, $700^{\circ}C$ annealing under the vacuum, the leakage current decrease and the enhanced temperature-capacitance characteristic stability. and the leakage current behavior is stable irrespective of applied electric field. The results states that keeping $Ta_2O_{5}$ annealed at vacuum gives rise to improvement of electrical characteristics in the capacitor by reducing oxygen-vacancy and the broken bond between Ta and O.

Ferroelectric Properly of Bi3.75La0.25Ti3O12 Ceramic Sintered in the Ambient (분위기 소결공정에 의한 Bi3.75La0.25Ti3O12세라믹의 강유전특성)

  • 김응권;박춘배;박기엽;송준태
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.9
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    • pp.783-787
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    • 2002
  • In recent year, B $i_{4-}$x L $a_{x}$ $Ti_3$ $O_{12(BLT)}$ is one of promising substitute materials for the ferroelectric random access memory(FRAM) applications. But the systematic composition is still insufficient, so this experiment was carried out in ceramic ambient sintering process which has the very excellent ferroelectric property. Samples were prepared by a bulk and the purpose which was estimated with a suitability of thin films applications. The density of B $i_{3.75}$ L $a_{0.25}$ $Ti_3$ $O_{12}$ was high and the XRD pattern showed that the intensity of main peak (117) was increased at the argon ambient sintering. Controlling the quantity of oxygen, crystallization showed a thin, long plate like type, and we obtained the excellent dielectric and polarization properties at the argon atmosphere sintering. Also this sintering process was effective at the bulk sample. Argon ambient sintered sample produced higher permittivity of 154, the remanent polarization(2Pr) of 6.8 uC/$\textrm{cm}^2$ compared with that sintered in air and oxygen ambient. And this sintering process showed a possibility which could be applied to thin films process..

Architecture of Software Testing Tool for Railway Signalling through Actual Use Interface Channel (실사용 인터페이스를 이용한 열차제어 소프트웨어 테스팅 도구의 구조)

  • Hwang, Jong-Gyu;Baek, Jong-Hyun;Jo, Hyun-Jeong;Lee, Kang-Mi
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.39C no.9
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    • pp.880-886
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    • 2014
  • Many railway signalling functions have increasingly depended on computer software with recent development in computing technology, leading to evolution into more flexible and intelligent railway signalling system. Meanwhile, software programs are likely to have many errors and the cost incurred by such errors has increased. Especially, if fatal software error occurs during railway operation, it may result in loss of lives. So the software verification and validation have become more important. It is needed for software functional safety tool to support these, but most commercial tools depend on direct access to the system's memory, resulting in many difficulties in application. Owing to such difficulties and complexity, they are rarely used in railway signalling system software validation. In this study, a new testing tool for software functional testing through an external interface that can be easily used in functional testing of software was developed. Such testing tool allows development and analysis of test cases for black-box testing through analysis of actually used interface protocols, leading to increased user convenience.

Analysis of Random Variations and Variation-Robust Advanced Device Structures

  • Nam, Hyohyun;Lee, Gyo Sub;Lee, Hyunjae;Park, In Jun;Shin, Changhwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.1
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    • pp.8-22
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    • 2014
  • In the past few decades, CMOS logic technologies and devices have been successfully developed with the steady miniaturization of the feature size. At the sub-30-nm CMOS technology nodes, one of the main hurdles for continuously and successfully scaling down CMOS devices is the parametric failure caused by random variations such as line edge roughness (LER), random dopant fluctuation (RDF), and work-function variation (WFV). The characteristics of each random variation source and its effect on advanced device structures such as multigate and ultra-thin-body devices (vs. conventional planar bulk MOSFET) are discussed in detail. Further, suggested are suppression methods for the LER-, RDF-, and WFV-induced threshold voltage (VTH) variations in advanced CMOS logic technologies including the double-patterning and double-etching (2P2E) technique and in advanced device structures including the fully depleted silicon-on-insulator (FD-SOI) MOSFET and FinFET/tri-gate MOSFET at the sub-30-nm nodes. The segmented-channel MOSFET (SegFET) and junctionless transistor (JLT) that can suppress the random variations and the SegFET-/JLT-based static random access memory (SRAM) cell that enhance the read and write margins at a time, though generally with a trade-off between the read and the write margins, are introduced.

A Resource-Aware Mapping Algorithm for Coarse-Grained Reconfigurable Architecture Using List Scheduling (리스트 스케줄링을 통한 Coarse-Grained 재구성 구조의 맵핑 알고리즘 개발)

  • Kim, Hyun-Jin;Hong, Hye-Jeong;Kim, Hong-Sik;Kang, Sung-Ho
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.46 no.6
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    • pp.58-64
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    • 2009
  • For the success of the reconfigurable computing, the algorithm for mapping operations onto coarse-grained reconfigurable architecture is very important. This paper proposes a resource-aware mapping system for the coarse-grained reconfigurable architecture and its own underlying heuristic algorithm. The operation assignment and the routing path allocation are simultaneously performed with a cycle-accurate time-exclusive resource model. The proposed algorithm minimizes the communication resource usage and the global memory access with the list scheduling heuristic. The operation to be mapped are prioritized with general properties of data flow. The evaluations of the proposed algorithm show that the performance is significantly enhanced in several benchmark applications.

Effect of Random Dopant Fluctuation Depending on the Ion Implantation for the Metal-Oxide-Semiconductor Field Effect Transistor (금속-산화막-반도체 전계효과 트랜지스터의 불순물 분포 변동 효과에 미치는 이온주입 공정의 영향)

  • Park, Jae Hyun;Chang, Tae-sig;Kim, Minsuk;Woo, Sola;Kim, Sangsig
    • Journal of IKEEE
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    • v.21 no.1
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    • pp.96-99
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    • 2017
  • In this study the influence of the random dopant fluctuation (RDF) depending on the halo and LDD implantations for the metal-oxide-semiconductor field effect transistor is investigated through the 3D atomistic device simulation. For accuracy in calculation, the kinetic monte carlo method that models individual impurity atoms and defects in the device was applied to the atomistic simulation. It is found that halo implantation has the greater influence on RDF effects than LDD implantation; three-standard deviation of $V_{TH}$ and $I_{ON}$ induced by halo implantation is about 6.45 times and 2.46 times those of LDD implantation. The distributions of $V_{TH}$ and $I_{ON}$ are also displayed in the histograms with normal distribution curves.

Adaptive Intra Fast Algorithm of H.264 for Video Surveillance (보안 영상 시스템에 적합한 H.264의 적응적 인트라 고속 알고리즘)

  • Jang, Ki-Young;Kim, Eung-Tae
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.33 no.12C
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    • pp.1055-1061
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    • 2008
  • H.264 is the prominent video coding standard in various applications such as real-time streaming and digital multimedia broadcasting, since it provides enhanced compression performance, error resilience tools, and network adaptation. Compression efficiency of H.264 has been improved, however, it requires more computing and memory access than traditional methods. In this paper we proposed adaptive intra fast algorithm for real-time video surveillance system reducing the encoding complexity of H264/A VC. For this aim, temporal interrelationship between macroblock in the previous and the current frame is used to decide the encoding mode of macroblock fast. As a result, though video quality was deteriorated a little, less than 0.04dB, and bit rate was somewhat increased in suggested method, however, proposed method improved encoding time significantly and, in particular, encoding time of an image with little changes of neighboring background such as surveillance video was more shortened than traditional methods.

Effects of Lanthanides-Substitution on the Ferroelectric Properties of Bismuth Titanate Thin Films Prepared by MOCVD Process

  • Kim, Byong-Ho;Kang, Dong-Kyun
    • Journal of the Korean Ceramic Society
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    • v.43 no.11 s.294
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    • pp.688-692
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    • 2006
  • Ferroelectric lanthanides-substituted $Bi_4Ti_3O_{12}$ $(Bi_{4-x}Ln_xTi_3O_{12}, BLnT)$ thin films approximately 200 nm in thickness were deposited by metal organic chemical vapor deposition onto Pt(111)/Ti/SiO$_2$/Si(100) substrates. Many researchers reported that the lanthanides substitution for Bi in the pseudo-perovskite layer caused the distortion of TiO$_6$ octahedron in the a-b plane accompanied with a shift of the octahedron along the a-axis. In this study, the effect of lanthanides (Ln=Pr, Eu, Gd, Dy)-substitution and crystallization temperature on their ferroelectric properties of bismuth titanate $(Bi_4Ti_3O_{12}, BIT)$ thin films were investigated. As BLnT thin films were substituted to lanthanide elements (Pr, Eu, Gd, Dy) with a smaller ionic radius, the remnant polarization (2P$_r$) values had a tendency to increase and made an exception of the Eu-substituted case because $Bi_{4-x}Eu_xTi_3O_{12}$ (BET) thin films had the smaller grain sizes than the others. In this study, we confirmed that better ferroelectric properties can be expected for films composed of larger grains in bismuth layered peroskite materials. The crystallinity of the thin films was improved and the average grain size increased as the crystallization temperature,increased from 600 to 720$^{\circ}C$. Moreover, the BLnT thin film capacitor is characterized by well-saturated polarization-electric field (P-E) curves with an increase in annealing temperature. The BLnT thin films exhibited no significant degradation of switching charge for at least up to $1.0\times10^{11}$ switching cycles at a frequency of 1 MHz. From these results, we can suggest that the BLnT thin films are the suitable dielectric materials for ferroelectric random access memory applications.

Investiagtions on the Etching of Platinum Film using High Density Inductively Coupled Ar/Cl$_2$ HBr Plasmas

  • Kim, Nam-Hoon;Chang-Il kim;Chang, Eui-Goo;Kwon, Kwang-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.3
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    • pp.14-17
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    • 2000
  • Giga bit dynamic random access memory(DRAM) requires the capacitor of high dielectric films. Some metal oxides films have been proposed as the dielectric material . And Pt is one of the most promising electrode materials. However very little has been done in developing the etching technologoy Pt film. Therefore, it is the first priority to develop the technology for plasma etching of Pt film. In this study, the dry etching of Pt film was investigated in Inductively Coupled Plasma(ICP) etching system with Cl$_2$/Ar and HBr/Cl$_2$/Ar gas mixing. X-ray photoelectron spectroscopy (XPS) was used in analysis of sidewall residues for the understanding of etching mechanism. We found the etch residues on the pattern sidewall is mainly Pt-Pt, Pt-Cl and Pt-Br compounds, Etch profile was observed by Scanning Electron Spectroscopy(SEM) . The etch rate of Pt film at 10%, Cl$_2$/90% Ar gas mixing ration was higher than at 100%. Ar. Addition of HBr to Cl$_2$/Ar as an etching gas led to generally higher selectivity to SiO$_2$. And the etch residues were reduced at 5% HBr/5% Cl$_2$/90% Ar gas mixing ration. These pages provide you with an examples of the layout and style which we wish you to adopt during the preparation of your paper, Make the width of abstract to be 14cm.

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An Optimal Resource Configuration Method based on Probability Model for VBR Video Server (VBR 비디오 서버를 위한 확률 모델 기반의 최적 자원 구성)

  • Cho, Dae-Hyun;Son, Jin-Hyun;Kim, Myoung-Ho;Lee, Yoon-Joon
    • Journal of KIISE:Databases
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    • v.28 no.3
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    • pp.334-343
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    • 2001
  • Most of currently used videos have variable bit rate(VBR) characteristics. Since the display rate of VBR videos compared to CBR videos vary with time, it is not proper to configure resources of the VBR video server using the method proposed for the CBR video server. In this paper we propose an optimal resource configuration method for the VBR video server which is based on the probability model. The proposed method decides the amount of disk and memory, and the disk access cycle of the video server with the lowest hardware cost, while preserving the throughput of the video server. In addition, we show the usefulness of the method through the various experiments.

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