• 반도체디스플레이기술학회지
• /
• 제22권3호
• /
• pp.21-27
• /
• 2023

In this article, a plate-type megasonic cleaning system with cooling pins is proposed for the sliced ingot, which is a raw material of silicon (Si) wafers. The megasonic system is operated with a lead zirconate titanate (PZT) actuator, which has high electric resistance, thus when it is being operated, it dissipates much heat. So this article proposes a megasonic system with cooling pins. In the design process, finite element analysis was performed and the results were used for the design of the waveguide. The frequency with the maximum impedance value was 998 kHz, which agreed well with the measured value of 997 kHz with 0.1 % error. Based on the results, the 1 MHz waveguide was fabricated. Acoustic pressures were measured, and analyzed. Finally, cleaning tests were performed, and 90 % particle removal efficiency (PRE) was achieved over 10 W power. These results imply that the developed 1 MHz megasonic will effectively clean sliced ingot wafer surfaces.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2008년도 추계학술대회B
• /
• pp.2511-2514
• /
• 2008

As the minimum feature size decreases, techniques to avoid contamination and processes to maintain clean wafer surfaces have become very important. The deposition and detachment of nanoparticles from surfaces are major problem to integrated circuit fabrication. Therefore, cleaning technology which reduces nanoparticles is essential to increase yield. Previous megasonic cleaning technology has reached the limits to reduce nanoparticles. Megasonic cleaning is one of the efficiency method to reduce contamination nanoparticle. Two major mechanisms are active in a megasonic cleaning, namely, acoustic streaming and cavitation. Acoustic streaming does not lead to sufficiently strong force to cause damage to the substrates or patterns. Sonoluminescence is a phenomenon of light emission associated with the cavitation of a bubble under ultrasound. We studied a correlation between sonoluminescence and sound pressure distribution for the minimum of pattern damage in megasonic cleaning.

• Journal of Electrical Engineering and Technology
• /
• 제3권2호
• /
• pp.271-275
• /
• 2008

The MAM(Megasonic Agitated Module) has been fabricated for improving the characteristics of wet etching. The characteristics of the MAM are investigated during the wet etching with and without megasonic agitation in this paper. The adoption of the MAM has improved the characteristics of wet etching, such as the etch rate, etch uniformity, and surface roughness. Especially, the etching uniformity on the entire wafer was less than ${\pm}1%$ in both cases of Si and glass. Generally, the initial root-mean-square roughness($R_{rms}$) of the single crystal silicon was 0.23nm. Roughnesses of 566nm and 66nm have been achieved with magnetic stirring and ultrasonic agitation, respectively, by some researchers. In this paper, the roughness of the etched Si surface is less than 60 nm. Wet etching of silicon with megasonic agitation can maintain nearly the original surface roughness during etching. The results verified that megasonic agitation is an effective way to improve etching characteristics of the etch rate, etch uniformity, and surface roughness and that the developed micromachining system is suitable for the fabrication of devices with complex structures.

• 마이크로전자및패키징학회지
• /
• 제11권4호
• /
• pp.81-86
• /
• 2004

메가소닉파을 이용하여 KOH 용액에서의 실리콘 이방성 습식 식각의 특성들을 개선하기 위한 새로운 방법에 관한 연구를 하였다. P형 6인치 실리콘 웨이퍼를 메가소닉파를 이용한 상태와 이용하지 않은 상태에서 식각 실험을 각각 수행하여 식각 특성들을 비교하였다. 메가소닉파는 식각균일도, 표면 조도 등과 같은 습식 식각의 특성들을 개선시키는 것으로 나타났다. 메가소닉파를 이용했을 때 식각 균일도는 전체 웨이퍼 표면의 ${\pm}1\%$ 이하이며, 메가소닉파를 이용하지 않았을 때는 ${\pm}20\%$이상이다. 식각 공정에 사용한 초기의 실리콘웨이퍼의 제곱 평균 표면 조도($R_{rms}$)는 0.23 nm이다. 자기 진동과 초음파 진동을 이용한 식각에서의 평균 표면 조도는 각각 566 nm, 66 nm로 보고 되었지만, 메가소닉파를 이용하여 $37{\mu}m$ 깊이로 식각한 경우 평균 표면 조도가 1.7nm임을 실험을 통하여 검증하였다. 이러한 결과는 메가소닉파를 이용한 식각 방법이 식각 균일도, 표면 평균 조도 등과 같은 식각 특성들을 개선시키는데 효과적인 방법임을 알 수 있다.

• 한국정밀공학회지
• /
• 제31권12호
• /
• pp.1107-1113
• /
• 2014

In this article, the megasonic cleaning system for cleaning micro/nano particles from flat panel display (FPD) surfaces was developed. A piezoelectric actuator and a waveguide were designed by finite element method (FEM) analysis. The calculated peak frequency value of the quartz waveguide was 1002 kHz, which agreed well with the measured value of 1003 kHz. The average acoustic pressure of the megasonic cleaning system was 43.1 kPa, which is three times greater than that of the conventional type of 13.9 kPa. Particle removal efficiency (PRE) tests were performed, and the cleaning efficiency of the developed system was proven to be 99%. The power consumption of the developed system was 64% lower than that of the commercial system. These results show that the developed megasonic cleaning system can be an effective solution in particle removing from FPD substrate with higher energy efficiency and lower chemical and ultra pure water (UPW) consumption.

• 제어로봇시스템학회:학술대회논문집
• /
• 제어로봇시스템학회 2001년도 ICCAS
• /
• pp.97.4-97
• /
• 2001

Recently, TFT LCD (thin film transistor liquid crystal display) manufacturing industry is more concerned with the ways of cleaning large TFT LCD´s with high pixed density than ever Ultrasonic cleaners with high frequencies like 1MHz (megasonic cleaners) are effective in removing very small particles without causing mechanical damage to the surface. In this study a megasonic cleaner for TFT LCD manufacturing process is developed and the performance is evaluated through experiments. The experimental results show that the developed magasonic cleaners is effective in removing very small particle from the LCD panel.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2008년도 추계학술대회A
• /
• pp.1810-1814
• /
• 2008

A small L-type megasonic module for nano-pattern cleaning was designed and manufactured. The impedance graph of the quartz waveguide with a piezoelectric actuator was predicted using finite element method (FEM). The peak value of the piezoelectric actuator alone was 3.373 MHz, which was the same as the experimentally measured value of 3.373 MHz (0.0% error). In addition, the maximum impedance value of the quartz waveguide with the actuator was 3.373 MHz, which agreed well with the measured value of 3.362 MHz (0.3% error). The acoustic pressures of a conventional megasonic system (3 MHz) and the developed system under similar conditions were measured and compared. The results showed that the maximum values and standard deviations of the developed system decreased by 29% and 18%, respectively, compared with the conventional type. This suggests that the small L-type would have higher particle removal efficiency with lower possibilities of pattern damages.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2013년도 춘계학술대회 논문집
• /
• pp.1305-1306
• /
• 2013

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2012년도 춘계학술대회 논문집
• /
• pp.487-488
• /
• 2012

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2012년도 추계학술대회 논문집
• /
• pp.845-846
• /
• 2012