Proceedings of the KSME Conference (대한기계학회:학술대회논문집)
- 2008.11b
- /
- Pages.2511-2514
- /
- 2008
Evaluate the Effect of Megasonic Cleaning on Pattern Damage
메가소닉 세정시 발생되는 패턴손상 최소화에 대한 연구
- Yu, Dong-Hyun ;
- Ahn, Young-Ki ;
- Ahn, Duk-Min ;
- Kim, Tae-Sung ;
- Lee, Hee-Myoung ;
- Kim, Jeong-In ;
- Lee, Yang-Lae ;
- Kim, Hyun-Se ;
- Lim, Eui-Su
- 유동현 (성균관대학교 기계공학부 대학원) ;
- 안영기 (성균관대학교 기계공학부 대학원) ;
- 안덕민 (성균관대학교 정보통신공학부 대학원) ;
- 김태성 (성균관대학교 기계공학부 & 나노과학기술원) ;
- 이희명 (주)듀라소닉) ;
- 김정인 (주)듀라소닉) ;
- 이양래 (한국기계연구원) ;
- 김현세 (한국기계연구원) ;
- 임의수 (한국기계연구원)
- Published : 2008.11.05
Abstract
As the minimum feature size decreases, techniques to avoid contamination and processes to maintain clean wafer surfaces have become very important. The deposition and detachment of nanoparticles from surfaces are major problem to integrated circuit fabrication. Therefore, cleaning technology which reduces nanoparticles is essential to increase yield. Previous megasonic cleaning technology has reached the limits to reduce nanoparticles. Megasonic cleaning is one of the efficiency method to reduce contamination nanoparticle. Two major mechanisms are active in a megasonic cleaning, namely, acoustic streaming and cavitation. Acoustic streaming does not lead to sufficiently strong force to cause damage to the substrates or patterns. Sonoluminescence is a phenomenon of light emission associated with the cavitation of a bubble under ultrasound. We studied a correlation between sonoluminescence and sound pressure distribution for the minimum of pattern damage in megasonic cleaning.
Keywords