• Title/Summary/Keyword: M-V plane

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Design and Manufacturing processes of Ti-6Al-4V profiled ring-products (Ti-6Al-4V 합금의 형상 링 압연공정 설계 및 제조기술)

  • Kim, K.J.;Kim, N.Y.;Lee, J.M.;Yeom, J.T.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.10a
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    • pp.72-75
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    • 2009
  • Design and Manufacturing processes of Ti-6Al-4V profiled ring-products were investigated with three-dimensional FEM simulation and experimental analyses. FEM simulation for the ring-rolling process was used to calculate the state variables such as strain, strain rate and temperature. In the simulation results of strain and temperature distributions for a plane ring rolling process, the strain level at the surface area is higher than that at the mid-plane, but the temperature level at the surface area is lower than that at mid-plane due to heat transfer between the workpiece and the work roll. These distributions showed a great influence on the evolution of microstructure in different positions. In order to induce the uniform deformation of the profile ring and reduce the applied load, the final blank was prepared by two-step processes. The mechanical properties of Ti-6Al-4V alloy ring products made in this work were investigated with tensile and impact tests and analyzed with the evolution of microstructures during the ring rolling process.

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SUBALGEBRAS OF A q-ANALOG FOR THE VIRASORO ALGEBRA

  • Nam, Ki-Bong;Wang, Moon-Ok
    • Bulletin of the Korean Mathematical Society
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    • v.40 no.4
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    • pp.545-551
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    • 2003
  • We define subalgebras ${V_q}^{mZ{\times}nZ}\;of\;V_q\;where\;V_q$ are in the paper [4]. We show that the Lie algebra ${V_q}^{mZ{\times}nZ}$ is simple and maximally abelian decomposing. We may define a Lie algebra is maximally abelian decomposing, if it has a maximally abelian decomposition of it. The F-algebra automorphism group of the Laurent extension of the quantum plane is found in the paper [4], so we find the Lie automorphism group of ${V_q}^{mZ{\times}nZ}$ in this paper.

Temperature and stress dependence of prism plane slip dislocation velocity in sapphire ($\alpha$-Al$_2$O$_3$) single crystals (사파이어($\alpha$-Al$_2$O$_3$) 단결성에 있어 prism plane slip 전위속도의 온도 및 응력의존성)

  • 윤석영;이종영
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.4
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    • pp.337-343
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    • 2000
  • Prism plane slip {11$\bar{2}$0}1/3{$\bar{1}$120} location velocity in sapphire ($\alpha$-Al$_2$O$_3$) single crystals was measured by etch-pit method. The dislocation velocities were measured as a function of temperature and stress between $1150^{\circ}C$ and $1400^{\circ}C$ for engineering stresses in the range 140 to 250 MPa. The dependence of temperature and stress in dislocation velocity was investigated. The activation energy for dislocation velocity was determined to be 4.2$\pm$0.4 eV. On the other hand, the stress exponent (m) describing the stress dependence of dislocation velocities was in the range of 4.5$\pm$0.8. Through this experiments, it was reconfirmed that the basal plane in sapphire single crystals has the 3-fold symmetry.

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Electron Transport Mechanisms in Ag Schottky Contacts Fabricated on O-polar and Nonpolar m-plane Bulk ZnO

  • Kim, Hogyoung
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.5
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    • pp.285-289
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    • 2015
  • We prepared silver Schottky contacts to O-polar and nonpolar m-plane bulk ZnO wafers. Then, by considering various transport models, we performed a comparative analysis of the current transport properties of Ag/bulk ZnO Schottky diodes, which were measured at 300, 200, and 100 K. The fitting of the forward bias current-voltage (I-V) characteristics revealed that the tunneling current is dominant as the transport component in both the samples. Compared to thermionic emission (TE), a stronger contribution of tunneling current was observed at low temperature. The reverse bias I-V characteristics were well fitted with the thermionic field emission (TFE) in both the samples. The presence of acceptor-like adsorbates, such as O2 and H2O, modulated the surface conductive state of ZnO, thereby affecting the tunneling effect. The degree of activation/passivation of acceptor-like adsorbates might be different in both the samples owing to their different surface morphologies and surface defects (e.g., oxygen vacancies).

Measurement of In-plane Piezoelectric Charge Constant of Electro-Active Paper (Electro-Active Paper의 면내압전상수 측정)

  • Li, Yuanxie;Yun, Gyu-Young;Kim, Heung-Soo;Kim, Jae-Hwan
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2007.05a
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    • pp.943-946
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    • 2007
  • In-plane piezoelectric charge constant of Electro-Active paper (EAPap) was investigated based on direct and converse piezoelectric effects. EAPap samples were made with cellulose film with very thin gold electrode coated on both sides of the film. To characterize direct piezoelectricity of EAPap, induced charge was measured when mechanical stress was applied to EAPap. In-plane piezoelectric charge constant was extracted from the relation between induced charge and applied in-plane normal stress. To investigate converse piezoelectricity, induced in-plane strain was measured when electric field was applied to EAPap. Piezoelectric charge constant was also extracted from the relation of induced in-plane strain and applied electric field. Piezoelectric charge constants obtained from direct and converse piezoelectricity are 31 pC/N and 178 x 10-12m/V for 45 degree sample, respectively. Measured piezoelectric charge constants of EAPap provide promising potential as a piezoelectric material.

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Effect of Isotropic Strain on Properties of Amorphous Magnetic films (아몰퍼스자성박막의 특성에 미치는 등방성 스트레인의 영향)

  • 신광호;김흥근;김영학;사공건
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.478-480
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    • 2001
  • Fe-base amorphous films exhibit large saturation magnetostriction and soft magnetic Properties, which make them suitable for strain sensor applications. Most important material properties for the performance of these elements are the superior soft magnetic properties, such as high permeability and small coercive force, as well as magnetoelastic properties. It is well known that the strain generated in film deposition and/or post-heat treatment processes is one of important material properties, which effects on the soft magnetic properties of the film via magnetoelastic coupling. In this study, the effect of an isotropic strain in plane of magnetic films have been performed experimently. Amorphous films with the composition of (F $e_{90}$ $Co_{10}$)$_{78}$S $i_{l2}$ $B_{10}$ were employed in this study. The film with 5${\mu}{\textrm}{m}$ thick was deposed onto the polyimide substrate with 50${\mu}{\textrm}{m}$ thick by virtue of RF sputtering. The film was subject to post annealing with a static magnetic field with 500Oe magnetic field intensity at 35$0^{\circ}C$ for 1 hour. The polyimide substrate with the film was bonded with an adhesive on PZT piezoelectric substrate with 600${\mu}{\textrm}{m}$ thick in applying voltage of 500V. The change in MH loops of films due to the isotropic strain was measured by using VSM. The coercive force was evaluated from MH loops. It has shown in the results that M-H loops of films are subject to change considerably with a dc voltage, resulting of the magnetization rotation from normal to plane direction as the applied voltage is changed from 500V to 250V.50V.V.

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HVPE growth of GaN/InGaN heterostructure on r-plane sapphire substrate (R-plane 사파이어 기판위의 GaN/InGaN 이종접합구조의 HVPE 성장)

  • Jeon, H.S.;Hwang, S.L.;Kim, K.H.;Jang, K.S.;Lee, C.H.;Yang, M.;Ahn, H.S.;Kim, S.W.;Jang, S.H.;Lee, S.M.;Park, G.H.;Koike, M.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.1
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    • pp.6-10
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    • 2007
  • The a-plane GaN layer on r-plane $Al_2O_3$ substrate is grown by mixed-source hydride vapor phase epitaxy (HVPE). The GaN/InGaN heterostructure is performed by selective area growth (SAG) method. The heterostructure consists of a flown over mixed-sourec are used as gallium (or indium) and nitrogen sources. The gas flow rates of HCl and $NH_3$ are maintained at 10 sccm and 500 sccm, respectively. The temperatures of GaN source zone is $650^{\circ}C$. In case of InGaN, the temperature of source zone is $900^{\circ}C$. The grown temperatures of GaN and InGaN layer are $820^{\circ}C\;and\;850^{\circ}C$, respectively. The EL (electroluminescence) peak of GaN/InGaN heterostructure is at nearly 460 nm and the FWHM (full width at half maximum) is 0.67 eV. These results are demonstrated that the heterostructure of III-nitrides on r-plane sapphire can be successfully grown by mixed-source HVPE with multi-sliding boat system.

Polynomial matrix decomposition in the digital domain and its application to MIMO LBR realizations (디지탈 영역에서의 다항식 행렬의 분해와 MIMO LBR 구현에의 응용)

  • 맹승주;임일택;이병기
    • Journal of the Korean Institute of Telematics and Electronics S
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    • v.34S no.1
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    • pp.115-123
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    • 1997
  • In this paper we present a polynomial matrix decomposition algorithm that determines a polynomial matix M(z) which satisfies the relation V(z)=M(z) for a given polynomial matrix V(z) which is paraconjugate hermitian matrix with normal rank r and is positive semidenfinite on the unit circle of z-plane. All the decomposition procedures in this proposed method are performed in the digitral domain. We also discuss how to apply the polynomial matirx decomposition in realizing MIMO LBR two-pairs.

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Analysis for Threshold-voltage of EPI MOSFET (EPI MOSFET의 문턱 전압 특성 분석)

  • 김재홍;고석웅;임규성;정학기;이종인
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2001.10a
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    • pp.665-668
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    • 2001
  • As reducing the physical size of devices, we can integrate more devices per the unit chip area and make its speed better. We have investigated MOSFET built on an epitaxial layer(EPI) of a heavily-doped ground plane. We compared and analyzed the characteristics of such device structure, i.e., impact ionization, electric field and I-V characteristics curve with lightly-doped drain(LDD) MOSFET. We simulated MOSFET with gate lengths from 0.10 to 0.06${\mu}{\textrm}{m}$ step 0.01${\mu}{\textrm}{m}$ in according to constant voltage scaling theory.

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Characterization of Non-polar 6H-SiC Substrates for Optoelectronic Device Applications (광전소자 응용을 위한 무극성 6H-SiC 기판의 특성)

  • Yeo, Im-Gyu;Lee, Tae-Woo;Choi, Jung-Woo;Seo, Jung-Doo;Ku, Kap-Ryeol;Lee, Won-Jae;Shin, Byung-Chul;Kim, Young-Hee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.390-396
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    • 2009
  • The present research was focused to investigate the quality of non-polar SiC substrates grown by a conventional PVT method for optoelectronic applications. The half part of the PVT-grown 6H-SiC crystal boules was sliced along a-direction and m-direction to extensively analyze non-polar planes and then remaining part of that was sliced along the basal plane to produce wafers. The non-polar SiC m-plane and a-plane exhibited apparent peaks around 2 theta=$120^{\circ}$((3-300) plane) and 2 theta=$60^{\circ}$ ((11-20) plane), respectively. FWHM values of m-plane measured along a-direction and c-direction were 60 arc see and 57 arcsec respectively, a-plane measured along m-direction and c-direction were 41 arcsec and 51 arcsec respectively. The typical absorption spectra of SiC crystals indicated that each of SiC crystals were the 6H-SiC with fundamental absorption energy of about 3.04 eV. Non-polar planes contained no micropipe on etched surface. The carrier concentration and mobility of non-polar SiC wafers have estimated by Raman spectrum. It was observed that the carrier mobility is low in the area far from seed crystal with compared to other places.