• Title/Summary/Keyword: Line Scratch

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Improvement of Defect Density by Slurry Fitter Installation in the CMP Process (CMP 공정에서 슬러리 필터설치에 따른 결함 밀도 개선)

  • Kim, Chul-Bok;Seo, Yong-Jin;Seo, Sang-Yong;Lee, Woo-Sun;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05b
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    • pp.30-33
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    • 2001
  • Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter-level dielectrics (ILD). Especially, defects like micro-scratch lead to severe circuit failure, and affects yield. CMP slurries can contain particles exceeding $1{\mu}m$ size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particle agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectric(IMD)-CMP. The filter installation in CMP polisher could reduce defect after IMD-CMP. As a result of micro-scratches formation, it shows that slurry filter plays an important role in determining consumable pad lifetime.

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The effects of ATO-ALL on skin regeneration in human epidermal keratinocytes, HaCaT cells (ATO-ALL이 인간유래 피부 각질형성세포인 HaCaT 세포에서 피부재생에 미치는 효과)

  • Shin, Younmin;Lee, Won-Kil;Kim, Seung Hyung;Choi, Jeong June
    • Journal of Haehwa Medicine
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    • v.28 no.2
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    • pp.41-47
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    • 2019
  • Objectives : Atopic dermatitis is an irritable skin disease accompanying rash and itching leading to impaired skin barrier. ATO-ALL is an ethanol extract of natural products comprising 12 herbs and effective on atopic dermatitis. In this study, we aimed to propose that the effect of ATO-ALL on skin regeneration in human keratinocyte cell line, HaCaT cells. Methods : To evaluate the skin regenerating effects of ATO-ALL, scratch wound healing assay, bromodeoxyuridine (BrdU) assay, and propidum iodide (PI) assay were performed using cultured HaCaT cell line. Result : Scratch wound healing assay showed that ATO-ALL was able to enhance the gap filling activity more than 2-fold at 7 ppm concentration compared with control group. BrdU assay demonstrated that ATO-ALL treatment increased the de novo cell proliferation in a dose-dependent manner. Finally, PI assay indicated that the cell cycle of HaCaT cells was modulated by ATO-ALL treatment. Conclusions : These results suggested that ATO-ALL may have skin regenerating effects by increasing cell proliferation via cell cycle regulation. Taken together, ATO-ALL is supposed to have a potential on regeneration of damaged skin or functional disease including atopic dermatitis.

Surface Inspection Algorighm using Oriented Bounding Box (회전 윤곽 상자를 이용한 표면 검사 알고리즘)

  • Hwang, Myun Joong;Chung, Seong Youb
    • Journal of Institute of Convergence Technology
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    • v.6 no.1
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    • pp.23-26
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    • 2016
  • DC motor shafts have several defects such as double cut, deep scratch on surface, and defects in diameter and length. The deep scratches are due to collision among the other shafts. So the scratches are long and thin but their orientations are random. If the smallest enclosing box, i.e. oriented bounding box for a detective point group is found, then the size of the corresponding defect can be modeled as its diagonal length. This paper proposes an suface inspection algorithm for the DC motor shaft using the oriented bounding box. To evaluate the proposed algorithm, a test bed is made with a line scan CCD camera (4096 pixels/line) and two rollers mechanism to rotate the shaft. The experimental result on a pre-processed image with contrast streching algorithm, shows that the proposed algorithm sucessfully finds 150 surface defects and its computation time (0.291 msec) is enough fast for the requirement (4 seconds).

Development of On-line Judge System based on Block Programming Environment (블록 프로그래밍 환경 기반 온라인 평가 시스템 개발)

  • Shim, Jaekwoun;Chae, Jeong Min
    • The Journal of Korean Association of Computer Education
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    • v.21 no.4
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    • pp.1-10
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    • 2018
  • Block programming environment, which is represented by Scratch in elementary and middle school programming education, is suitable for learner's characteristics and cognitive level, and is recommended not only for beginners. Transference to the text programming environment after the block programming is essential for understanding the data processing process, understanding the accuracy and efficiency aspects of algorithms, and creating SW activity. In addition, it is presented step by step in the programming curriculum. In this study, developed WithBlock the online evaluation system for the purpose of transference from a block programming to a text programming environment. The developed system can solve the same algorithm problem in both block and text programming environment, and it can be used for elementary and secondary programming education by automatically scoring the written code and providing immediate feedback. In order to applicable to programming education in elementary and secondary surveyed the usability, learning possibility, interest and satisfaction of WithBlock. The results of the survey showed that it can be used for programming education.

3D Modeling of Ground Surface with Statistical Method (통계적방법을 이용한 연삭표면의 3차원모델링)

  • 김동길;김영태;이상조
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.2
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    • pp.211-219
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    • 2000
  • This paper simulated surface grinding process with statistically simulated grinding wheel topography, considering ridge formation phenomenon when grain scratch workpiece. Wheel grain is modeled as hybrid sphere and cone. Grinding wheel characteristic was evaluated with stylus by expanding the scanning region of the profilometer from a straight line to a plane. Each grain's diameter and semi-angle are assumed as normal distribution, each grain's protrusion height from wheel plane is assumed gamma distribution. So grinding wheel is simulated with grain's position randomly distributed without overlapping. Ground surface is 3-dimensionally simulated considering ridge formation of workpiece by each grain's cutting, and then surface profile and surface roughness parameters are compared with real ground workpiece.

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Digital film line scratch restoration based on Spatial Information (공간적인 정보 기반의 디지털 필름 스크래치 복원)

  • Kim, Kyung-Tai;Ko, Eun-Chung;Kim, Eun-Yi
    • Proceedings of the Korean Information Science Society Conference
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    • 2007.06c
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    • pp.454-459
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    • 2007
  • 최근 다양한 형태의 멀티미디어의 확산과 영상에 대한 관심이 높아짐에 따라 필름 복원은 많은 사람들로부터 관심을 받고 있는 연구 분야다. 본 논문에서는 스크래치 텍스처 및 형태 특성을 이용하여 모든 종류의 스크래치를 자동으로 검출하고 복원 할 수 있는 방법을 제안한다. 제안된 방법은 손상된 필름에서 자주 발생되는 스크래치의 공간적인 정보를 이용하여 텍스처 분류기와 형태 필터링을 통해 스크래치를 검출 하고, 양선형 보간법을 사용하여 손상된 필름 영역을 주변 픽셀 값을 이용하여 스크래치를 제거 함으로써 영상을 복원한다. 본 논문에서 제안된 방법은 Kokaram의 논문에 제안된 방법보다 다양한 종류의 스크래치를 정확하게 인식하며, 적은 계산 비용임에도 불구하고 양선형 보간법은 스크래치 영역을 제거한다.

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Tungsten CMP using Fixed Abrasive Pad with Self-Conditioning (Self-Conditioning을 이용한 고정입자패드의 텅스텐 CMP)

  • Park, Boum-Young;Kim, Ho-Youn;Seo, Heon-Deok;Jeong, Hae-Do
    • Proceedings of the KSME Conference
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    • 2003.04a
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    • pp.1296-1301
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    • 2003
  • The chemical mechanical polishing(CMP) is necessarily applied to manufacturing the dielectric layer and metal line in the semiconductor device. The conditioning of polishing pad in CMP process additionally operates for maintaining the removal rate, within wafer non-uniformity, and wafer to wafer non-uniformity. But the fixed abrasive pad(FAP) using the hydrophilic polymer with abrasive that has the swelling characteristic by water owns the self-conditioning advantage as compared with the general CMP. FAP also takes advantage of planarity, resulting from decreasing pattern selectivity and defects such as dishing due to the reduction of abrasive concentration. This paper introduces the manufacturing technique of FAP. And the tungsten CMP using FAP achieved the good conclusion in point of the removal rate, non-uniformity, surface roughness, material selectivity, micro-scratch free contemporary with the pad life-time.

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A Study on the PD Signal Analysis with Applied Fuzzy Algorithm (부분방전 신호 분석을 위한 퍼지 알고리즘 적용 및 평가에 관한 연구)

  • Kim, Yong-K.;Kim, Jin-Su
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.4
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    • pp.166-171
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    • 2006
  • In this paper, we have studied for analysis of the partial discharge(PD) signal in underground transmission line. The PD signal has estimated as detected signal accumulation of a PRPDA method by using Labview, and analyzed with fuzzy algorithm. In our algorithm, we developed system configuration that detected accumulating PD signal using by Labview and programmed fuzzy algorithm can be analyzed the PD signal using with Matlab. With practical PD logic implementation of theoretical detected system and hardware implementation, the device for Hipotronics Company's 50kV setup has generated and then has applied with $15k{\sim}17kV$ with 1:1 time probe. It's also used the LDPE 0.27mmt (scratch error 0.05mmt) to sample for making PD. In conclusion, Our new class of PD detected algorithm has also compared with previous PRPDA or Fuzzy algorithm. which has diagnose more conveniently by adding numerical values.

Observation of Growth Behavior of Induced Hillock for Nano/Micro Patterning on Surface of Borosilicate with Etching Time and Load (보로실리케이트 표면의 나노/마이크로 패터닝을 위한 식각 시간, 하중에 따른 유기 힐록의 성장거동 관찰)

  • Cho S. H.;Youn S. W.;Kang C. G.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.10a
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    • pp.182-185
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    • 2005
  • Indentation pattern and line pattern were machined on borosilicate(Pyrex 7740 glass) surface using the combination of mechanical machining by $Nanoi-indenter\circledR$ XP and HF wet etching, and a etch-mask effect of the affected layer of the nano-scratched and indented Pyrex 7740 glass surface was investigated. In this study, effects of indentation and scratch process with etching time on the morphologies of the indented and scratched surfaces after isotropic etching were investigated from an angle of deformation energies.

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Film line scratch detection using neural networks (신경망을 이용한 오래된 필름에서의 스크래치 검출)

  • Kim Kyung-tai;Kim Eun-yi
    • Proceedings of the Korean Information Science Society Conference
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    • 2005.11b
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    • pp.868-870
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    • 2005
  • 스크래치는 오래된 필름에서 가장 많이 나타나는 손상 요인이다. 고화질의 멀티미디어 서비스를 제공하기 위해서는 이러한 스크래치들은 반드시 검출 및 복원되어야 한다. 이러한 중요성 때문에 지금까지 많은 복원 알고리즘이 개발되어 왔으나, 스크래치 영역의 자동검출에 대한 연구는 거의 이루어지지 않은 실정이다. 따라서 본 논문에서는 자동으로 스크래치영역을 추출할 수 있는 신경망 기반의 검출 방법을 제안한다. 다층 퍼셉트론 (Multi-layer perceptron: MLP)을 이용하여 스크래치영역과 비 스크래치영역을 구분하는데, 이 MLP는 다양한 크기의 스크래치를 검출하기 위해 다양한 크기의 입력 영상에 대해 적용된다. 제안된 방법의 평가를 위해 principal/ secondary 스크래치, alone/not-alone 스크래치, moving/static 스크래치등의 다양한 종류의 스크래치를 가진 영상에 대해 실험이 이루어졌고, 그 결과 제안된 방법의 강건함과 효율성을 입증되었다.

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