• Title/Summary/Keyword: Length of a channel

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Capacitance - Voltage 방법을 이용한 MOSFET의 유효 채널 길이 추출 (Extracting the Effective Channel Length of MOSFET by Capacitance - Voltage Method.)

  • 김용구;지희환;박성형;이희덕
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2003년도 하계종합학술대회 논문집 II
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    • pp.679-682
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    • 2003
  • Improvement in MOS fabrication technology have led to high-density high-performance integrated circuits with MOSFET channel lengths in the sub-micron range. For devices of the size, transistor characteristics become highly sensitive to effective channel length. We propose a new approach to extract the effective channel length of MOSFET by Capacitance-Voltage (C-V) method. Gate-to-Source, Drain capacitance ( $C_{gsd}$) are measured and the effective channel length can be extracted. In addition, compared to l/$\beta$ method and Terada method, which has been point out that it fails to extract the accurate effective channel length of the devices, we prove that our approach still works well for the devices with down to sub-micron regime.e.

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CuPc 두께 변화 및 채널 길이 변화에 따른 전계 효과 트랜지스터의 전기적 특성 연구 (Electrical Properties with Varying CuPc Thickness and Channel Length of the Field-effect Transistor)

  • 이호식
    • 한국전기전자재료학회논문지
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    • 제20권1호
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    • pp.47-52
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    • 2007
  • Organic field-effect transistors (OFETS) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with varying channel length. The CuPc FET device was made a top-contact type and the channel length was a $100\;{\mu}m,\;50\;{\mu}m,\;40\;{\mu}m,\;and\;30\;{\mu}m$ and the channel width was a fixed at 3 mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET with varying channel length (L) and we calculated the effective mobility. Also, we measured a capacitance-voltage (C-V) by applied bias voltage with varying frequency at 43, 100, 1000 Hz.

Effect of Channel Variation on Switching Characteristics of LDMOSFET

  • Lee, Chan-Soo;Cui, Zhi-Yuan;Kim, Kyoung-Won
    • Journal of Semiconductor Engineering
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    • 제3권2호
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    • pp.161-167
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    • 2022
  • Electrical characteristics of LDMOS power device with LDD(Lightly Doped Drain) structure is studied with variation of the region of channel and LDD. The channel in LDMOSFET encloses a junction-type source and is believed to be an important parameter for determining the circuit operation of CMOS inverter. Two-dimensional TCAD MEDICI simulation is used to study hot-carrier effect, on-resistance Ron, breakdown voltage, and transient switching characteristic. The voltage-transfer characteristics and on-off switching properties are studied as a function of the channel length and doping levels. The digital logic levels of the output and input voltages are analyzed from the transfer curves and circuit operation. Study indicates that drain current significantly depends on the channel length rather than the LDD region, while the switching transient time is almost independent of the channel length. The high and low logic levels of the input voltage showed a strong dependency on the channel length, while the lateral substrate resistance from a latch-up path in the CMOS inverter was comparable to that of a typical CMOS inverter with a guard ring.

Performance Optimization of LDMOS Transistor with Dual Gate Oxide for Mixed-Signal Applications

  • Baek, Ki-Ju;Kim, Yeong-Seuk;Na, Kee-Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제16권5호
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    • pp.254-259
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    • 2015
  • This paper reports the optimized mixed-signal performance of a high-voltage (HV) laterally double-diffused metaloxide-semiconductor (LDMOS) field-effect transistor (FET) with a dual gate oxide (DGOX). The fabricated device is based on the split-gate FET concept. In addition, the gate oxide on the source-side channel is thicker than that on the drain-side channel. The experiment results showed that the electrical characteristics are strongly dependent on the source-side channel length with a thick gate oxide. The digital and analog performances according to the source-side channel length of the DGOX LDMOS device were examined for circuit applications. The HV DGOX device with various source-side channel lengths showed reduced by maximum 37% on-resistance (RON) and 50% drain conductance (gds). Therefore, the optimized mixed-signal performance of the HV DGOX device can be obtained when the source-side channel length with a thick gate oxide is shorter than half of the channel length.

비대칭 DGMOSFET에서 터널링 전류가 채널길이에 따른 문턱전압이동에 미치는 영향 (Influence of Tunneling Current on Threshold voltage Shift by Channel Length for Asymmetric Double Gate MOSFET)

  • 정학기
    • 한국정보통신학회논문지
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    • 제20권7호
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    • pp.1311-1316
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    • 2016
  • 본 연구에서는 단채널 비대칭 이중게이트 MOSFET의 채널길이에 따른 문턱전압이동에 터널링전류가 미치는 영향을 분석하고자 한다. 채널길이가 10 nm 이하로 감소하면 터널링 전류는 급격히 증가하여 문턱전압이동 등 2차효과가 발생한다. 단채널 효과를 감소시키기 위하여 개발된 비대칭 이중게이트 MOSFET의 경우에도 터널링 전류에 의한 문턱전압이동은 무시할 수 없게 된다. 차단전류는 열방사전류와 터널링 전류로 구성되어 있으며 채널길이가 작아질수록 터널링전류의 비율은 증가한다. 본 연구에서는 터널링 전류를 분석하기 위하여 WKB(Wentzel-Kramers-Brillouin) 근사를 이용하였으며 채널 내 전위분포를 해석학적으로 유도하였다. 결과적으로 단채널 비대칭 이중게이트 MOSFET에서는 채널길이 가 작아질수록 터널링 전류의 영향에 의한 문턱전압이동이 크게 나타나고 있다는 것을 알 수 있었다. 특히 하단게이트 전압 등에 따라 터널링 전류에 의한 문턱전압 값은 변할지라도 문턱전압이동은 거의 일정하였다.

초음속 흡입구의 통로길이와 받음각에 따른 유동장 변화 연구 (A NUMERICAL STUDY OF FLOWFIELD AT A SUPERSONIC INLET BY CHANGING ANGLES OF ATTACK AND CHANNEL LENGTH)

  • 류경진;임설;김상덕;송동주
    • 한국전산유체공학회:학술대회논문집
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    • 한국전산유체공학회 2010년 춘계학술대회논문집
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    • pp.21-27
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    • 2010
  • The flow characteristics on a supersonic inlet with bleeding system by changing angles of attack and channel length conditions are studied by computational 3D turbulent flow analysis. A compressible upwind flux difference splitting Navier-Stokes method with $k-{\omega}$ turbulence model is used to analysis the inlet flowfield. More non-uniform flowfields are shown at the AIP when angle of attack becomes bigger and bigger. These non-uniform flowfield works the performance aggravating factors of the supersonic engine. Non-uniform flowfield by changing channel length at the various angle of attack are investigated.

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Iterative Symbol Decoding of Variable-Length Codes with Convolutional Codes

  • Wu, Hung-Tsai;Wu, Chun-Feng;Chang, Wen-Whei
    • Journal of Communications and Networks
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    • 제18권1호
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    • pp.40-49
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    • 2016
  • In this paper, we present a symbol-level iterative source-channel decoding (ISCD) algorithm for reliable transmission of variable-length codes (VLCs). Firstly, an improved source a posteriori probability (APP) decoding approach is proposed for packetized variable-length encoded Markov sources. Also proposed is a recursive implementation based on a three-dimensional joint trellis for symbol decoding of binary convolutional codes. APP channel decoding on this joint trellis is realized by modification of the Bahl-Cocke-Jelinek-Raviv algorithm and adaptation to the non-stationary VLC trellis. Simulation results indicate that the proposed ISCD scheme allows to exchange between its constituent decoders the symbol-level extrinsic information and achieves high robustness against channel noises.

A New Approach to Estimating the MIMO Channel in Wireless Networks

  • Kim, Jee-Hoon;Song, Hyoung-Kyu
    • Journal of information and communication convergence engineering
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    • 제5권3호
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    • pp.229-232
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    • 2007
  • This paper investigates on the use of constant-amplitude zero-autocorrelation (CAZAC) sequence for channel estimation in multiple-input multiple-output (MIMO) system over indoor wireless channel. Since the symbol-length of the conventional 4-phase CAZAC sequence is short, there is a limitation to use it for MIMO system in multipath environments. An algorithm which generates longer CAZAC sequences is proposed to overcome that problem. Flexible symbol-length of 4-phase CAZAC sequences can be made by the proposed algorithm. Therefore appropriate symbol-length of CAZAC sequences could be utilized as preambles in accordance with the number of transmit antennas and channel condition. The effect of the number of CAZAC sequences for channel estimation is presented in terms of mean square error (MSE).

채널길이 변화를 이용한 GaAs MESFET의 모델 (A Model of GaAs MESFET with Channel Length Modulation)

  • 임재완;윤현로;이기준
    • 대한전자공학회논문지
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    • 제27권4호
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    • pp.547-554
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    • 1990
  • Considering channel length modulation, we proposed a GaAs MESFET model for circuit simulator. In existing M.S. Shur's model, two different models are used according to pinch-off voltage of devices. One model for both type of devices was proposed. In this model we introduced weighted switching function(WSF) based on channel length modulation. This proposed model showed better accuracy comparing with existing single law model and complete velocity saturation model.

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Two-Bit/Cell NFGM Devices for High-Density NOR Flash Memory

  • Lee, Jong-Ho
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제8권1호
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    • pp.11-20
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    • 2008
  • The structure of 2-bit/cell flash memory device was characterized for sub-50 nm non-volatile memory (NVM) technology. The memory cell has spacer-type storage nodes on both sidewalls in a recessed channel region, and is erased (or programmed) by using band-to-band tunneling hot-hole injection (or channel hot-electron injection). It was shown that counter channel doping near the bottom of the recessed channel is very important and can improve the $V_{th}$ margin for 2-bit/cell operation by ${\sim}2.5$ times. By controlling doping profiles of the channel doping and the counter channel doping in the recessed channel region, we could obtain the $V_{th}$ margin more than ${\sim}1.5V$. For a bit-programmed cell, reasonable bit-erasing characteristics were shown with the bias and stress pulse time condition for 2-bit/cell operation. The length effect of the spacer-type storage node is also characterized. Device which has the charge storage length of 40 nm shown better ${\Delta}V_{th}$ and $V_{th}$ margin for 2-bit/cell than those of the device with the length of 84 nm at a fixed recess depth of 100 nm. It was shown that peak of trapped charge density was observed near ${\sim}10nm$ below the source/drain junction.